SE444526B - Sett att i lege och plan placera en substratbricka - Google Patents

Sett att i lege och plan placera en substratbricka

Info

Publication number
SE444526B
SE444526B SE7900230A SE7900230A SE444526B SE 444526 B SE444526 B SE 444526B SE 7900230 A SE7900230 A SE 7900230A SE 7900230 A SE7900230 A SE 7900230A SE 444526 B SE444526 B SE 444526B
Authority
SE
Sweden
Prior art keywords
wafer
tray
place
forces
workpiece
Prior art date
Application number
SE7900230A
Other languages
English (en)
Swedish (sv)
Other versions
SE7900230L (sv
Inventor
V A Firtion
D R Herriott
M E Poulsen
L Rongved
T E Saunders
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/965,304 external-priority patent/US4213698A/en
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of SE7900230L publication Critical patent/SE7900230L/xx
Publication of SE444526B publication Critical patent/SE444526B/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005—Vacuum work holders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B28—WORKING CEMENT, CLAY, OR STONE
    • B28D—WORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B28D5/0094—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SE7900230A 1978-01-23 1979-01-10 Sett att i lege och plan placera en substratbricka SE444526B (sv)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US87147778A 1978-01-23 1978-01-23
US05/965,304 US4213698A (en) 1978-12-01 1978-12-01 Apparatus and method for holding and planarizing thin workpieces

Publications (2)

Publication Number Publication Date
SE7900230L SE7900230L (sv) 1979-07-24
SE444526B true SE444526B (sv) 1986-04-21

Family

ID=27128208

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7900230A SE444526B (sv) 1978-01-23 1979-01-10 Sett att i lege och plan placera en substratbricka

Country Status (7)

Country Link
JP (1) JPS6015147B2 (https=)
DE (1) DE2901968A1 (https=)
FR (1) FR2415368A1 (https=)
GB (1) GB2016166B (https=)
IT (1) IT1118308B (https=)
NL (1) NL7900497A (https=)
SE (1) SE444526B (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5754341A (en) * 1980-09-19 1982-03-31 Hitachi Ltd Thin plate holder
US4433835A (en) * 1981-11-30 1984-02-28 Tencor Instruments Wafer chuck with wafer cleaning feature
JPS58153344A (ja) * 1982-03-05 1983-09-12 Hitachi Ltd リテ−ナ式ウエハチヤツク
JPS59106118A (ja) * 1982-12-10 1984-06-19 Hitachi Ltd 薄板変形装置
JPS6099538A (ja) * 1983-11-01 1985-06-03 横河・ヒュ−レット・パッカ−ド株式会社 ピンチヤツク
US4656791A (en) * 1984-09-27 1987-04-14 Libbey-Owens-Ford Company Abrasive fluid jet cutting support
DE3706735A1 (de) * 1986-03-03 1987-09-10 Canon Kk Vorrichtung zum einstellen des optischen systems einer kamera
US4903681A (en) * 1987-02-24 1990-02-27 Tokyo Seimitus Co., Ltd. Method and apparatus for cutting a cylindrical material
NL8701603A (nl) * 1987-07-08 1989-02-01 Philips & Du Pont Optical Vacuuminrichting voor het vastzuigen van werkstukken.
US6228438B1 (en) * 1999-08-10 2001-05-08 Unakis Balzers Aktiengesellschaft Plasma reactor for the treatment of large size substrates
JP2003142566A (ja) * 2001-11-07 2003-05-16 New Creation Co Ltd 真空吸着器及びその製造方法
DE20206490U1 (de) * 2002-04-24 2002-07-18 J. Schmalz GmbH, 72293 Glatten Blocksauger
JP5810517B2 (ja) * 2010-12-02 2015-11-11 富士電機株式会社 吸着装置および吸着方法
DE102011001879A1 (de) 2011-04-07 2012-10-11 Jenoptik Automatisierungstechnik Gmbh Vorrichtung zum Spannen verformter Wafer
JP6178683B2 (ja) * 2013-09-25 2017-08-09 芝浦メカトロニクス株式会社 吸着ステージ、貼合装置、および貼合方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB280154A (en) * 1926-11-02 1928-03-28 Wesel Mfg Company F Improvements in photo-engravers' printing frame
FR1517154A (fr) * 1967-03-02 1968-03-15 Elektromat Veb Procédé et dispositif pour le prélèvement de petits corps à surfaces adhérentes
DE1646147A1 (de) * 1967-05-13 1971-01-07 Telefunken Patent Vorrichtung zur Halterung einer Halbleiterscheibe bei der UEbertragung eines Musters durch Kontaktkopie oder durch Projektionsmaskierung
US3627338A (en) * 1969-10-09 1971-12-14 Sheldon Thompson Vacuum chuck
US3747282A (en) * 1971-11-29 1973-07-24 E Katzke Apparatus for polishing wafers

Also Published As

Publication number Publication date
DE2901968A1 (de) 1979-07-26
SE7900230L (sv) 1979-07-24
GB2016166B (en) 1982-06-09
JPS6015147B2 (ja) 1985-04-17
JPS54120585A (en) 1979-09-19
NL7900497A (nl) 1979-07-25
FR2415368B1 (https=) 1984-05-04
DE2901968C2 (https=) 1988-08-11
IT7967112A0 (it) 1979-01-18
FR2415368A1 (fr) 1979-08-17
GB2016166A (en) 1979-09-19
IT1118308B (it) 1986-02-24

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