RU2013137749A - Системы осаждения наночастиц - Google Patents

Системы осаждения наночастиц Download PDF

Info

Publication number
RU2013137749A
RU2013137749A RU2013137749/02A RU2013137749A RU2013137749A RU 2013137749 A RU2013137749 A RU 2013137749A RU 2013137749/02 A RU2013137749/02 A RU 2013137749/02A RU 2013137749 A RU2013137749 A RU 2013137749A RU 2013137749 A RU2013137749 A RU 2013137749A
Authority
RU
Russia
Prior art keywords
nanoparticles
target
hollow
magnet
nanoparticle
Prior art date
Application number
RU2013137749/02A
Other languages
English (en)
Russian (ru)
Inventor
Цзянь-пин ВАН
Шихай ХЕ
Original Assignee
Риджентс Оф Дзе Юниверсити Оф Миннесота
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Риджентс Оф Дзе Юниверсити Оф Миннесота filed Critical Риджентс Оф Дзе Юниверсити Оф Миннесота
Publication of RU2013137749A publication Critical patent/RU2013137749A/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455—Movable magnets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
RU2013137749/02A 2011-01-13 2012-01-13 Системы осаждения наночастиц RU2013137749A (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201161432421P 2011-01-13 2011-01-13
US61/432,421 2011-01-13
PCT/US2012/021269 WO2012097268A2 (en) 2011-01-13 2012-01-13 Nanoparticle deposition systems

Publications (1)

Publication Number Publication Date
RU2013137749A true RU2013137749A (ru) 2015-02-20

Family

ID=46489954

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2013137749/02A RU2013137749A (ru) 2011-01-13 2012-01-13 Системы осаждения наночастиц

Country Status (6)

Country Link
US (2) US20120181171A1 (enExample)
EP (1) EP2663666A4 (enExample)
CN (1) CN103459658B (enExample)
IN (1) IN2013CN05221A (enExample)
RU (1) RU2013137749A (enExample)
WO (1) WO2012097268A2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105121068A (zh) * 2013-02-15 2015-12-02 明尼苏达大学董事会 颗粒功能化
KR101772686B1 (ko) 2016-02-02 2017-08-29 연세대학교 원주산학협력단 나노입자 약물 전달 장치 및 그의 제어 방법
WO2017169029A1 (ja) * 2016-03-30 2017-10-05 京浜ラムテック株式会社 スパッタリングカソード、スパッタリング装置および成膜体の製造方法
JP6807246B2 (ja) * 2017-02-23 2021-01-06 東京エレクトロン株式会社 基板処理装置、および、処理システム
GB2560008B (en) * 2017-02-24 2020-03-25 Binns David An appratus and method related to core shell magnetic nanoparticles and structured nanoparticles
GB2566995B (en) 2017-09-29 2023-01-18 Cotton Mouton Diagnostics Ltd A method of detection
CN110578127B (zh) * 2019-10-31 2024-05-24 浙江工业大学 一种提升磁控溅射镀膜沉积速率装置
CN113564553A (zh) * 2021-08-06 2021-10-29 昆山祁御新材料科技有限公司 一种旋转靶材的制作工艺及设备

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3669860A (en) * 1970-04-01 1972-06-13 Zenith Radio Corp Method and apparatus for applying a film to a substrate surface by diode sputtering
JP3034076B2 (ja) * 1991-04-18 2000-04-17 日本真空技術株式会社 金属イオン源
US5228963A (en) * 1991-07-01 1993-07-20 Himont Incorporated Hollow-cathode magnetron and method of making thin films
US5482611A (en) * 1991-09-30 1996-01-09 Helmer; John C. Physical vapor deposition employing ion extraction from a plasma
US5334302A (en) * 1991-11-15 1994-08-02 Tokyo Electron Limited Magnetron sputtering apparatus and sputtering gun for use in the same
US7144627B2 (en) * 1997-03-12 2006-12-05 William Marsh Rice University Multi-layer nanoshells comprising a metallic or conducting shell
JPH111770A (ja) * 1997-06-06 1999-01-06 Anelva Corp スパッタリング装置及びスパッタリング方法
US6217716B1 (en) * 1998-05-06 2001-04-17 Novellus Systems, Inc. Apparatus and method for improving target erosion in hollow cathode magnetron sputter source
SE521904C2 (sv) * 1999-11-26 2003-12-16 Ladislav Bardos Anordning för hybridplasmabehandling
US20040000478A1 (en) * 2002-06-26 2004-01-01 Guenzer Charles S. Rotating hollow cathode magnetron
US20060081467A1 (en) * 2004-10-15 2006-04-20 Makoto Nagashima Systems and methods for magnetron deposition
WO2007051105A2 (en) * 2005-10-24 2007-05-03 Soleras Ltd. Cathode incorporating fixed or rotating target in combination with a moving magnet assembly and applications thereof
CN101375366B (zh) * 2005-12-13 2011-04-27 欧瑞康太阳Ip股份公司 改良溅射靶应用
US7951276B2 (en) * 2006-06-08 2011-05-31 The Board Of Trustees Of The University Of Illinois Cluster generator
EP2017367A1 (en) * 2007-07-18 2009-01-21 Applied Materials, Inc. Sputter coating device and method of depositing a layer on a substrate
WO2009149563A1 (en) * 2008-06-13 2009-12-17 Fablab Inc. A system and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith
GB2461094B (en) * 2008-06-20 2012-08-22 Mantis Deposition Ltd Deposition of materials
CN201545907U (zh) * 2009-11-17 2010-08-11 深圳市振恒昌实业有限公司 一种新型靶管旋转磁控溅射圆柱靶
WO2011159834A1 (en) * 2010-06-15 2011-12-22 Superdimension, Ltd. Locatable expandable working channel and method

Also Published As

Publication number Publication date
CN103459658B (zh) 2015-09-23
EP2663666A2 (en) 2013-11-20
EP2663666A4 (en) 2014-08-20
WO2012097268A2 (en) 2012-07-19
IN2013CN05221A (enExample) 2015-08-07
US20120181171A1 (en) 2012-07-19
WO2012097268A3 (en) 2013-01-17
CN103459658A (zh) 2013-12-18
US20180127865A1 (en) 2018-05-10

Similar Documents

Publication Publication Date Title
RU2013137749A (ru) Системы осаждения наночастиц
CN103953517B (zh) 霍尔推进器改进装置
CN100560793C (zh) 一种纳米复合类金刚石涂层制备方法
JP2014515831A5 (enExample)
CN106637097A (zh) 内衬锥形管和多孔挡板复合型的多级磁场电弧离子镀方法
CN102497721B (zh) 双空心阴极以及双空心阴极等离子体装置和应用
AR089157A1 (es) Sistema y metodo para procesar mineral
TW201107511A (en) Film formation equipment and film formation method
CN106756824A (zh) 内衬正偏压阶梯形管的多级磁场电弧离子镀方法
US6756596B2 (en) Filtered ion source
US20150376772A1 (en) Multi-surface nanoparticle sources and deposition systems
RU2013101299A (ru) Способ получения металлических и керамических порошков и устройство для его осуществления
KR102169507B1 (ko) 필터링 기능을 구비하는 아크 이온 플레이팅장치
KR20150057978A (ko) 3차원 나노 스케일 구조물 제작 장치 및 이를 이용한 3차원 나노 스케일 구조물 제조방법
EP2811507B1 (en) Magnetic configuration for a magnetron sputter deposition system
EP2136388A3 (en) Deposition of Materials
JP2021505776A (ja) 金属およびセラミック材料の付着のための付加製造のためのシステムおよび方法
GB2471102A (en) Apparatus for producing cored nanoparticles
RU2453628C1 (ru) Устройство для нанесения покрытий на диэлектрики в разряде
RU2595266C2 (ru) Устройство ионного распыления (варианты)
RU2015108566A (ru) Способ напыления тонкопленочных покрытий на поверхность полупроводниковых гетероэпитаксиальных структур методом магнетронного распыления
CN105039915A (zh) 一种放电弧斑满布靶面的真空阴极电弧源
EP3336217A1 (en) Machine for the deposition of material by the cathodic sputtering technique
KR200487382Y1 (ko) 음극 아크 플라즈마 증착 시스템에 사용되는 아크 이온 증발기용 필터 장치
CN103469165B (zh) 基于分布式电磁铁的矩形平面阴极电弧靶

Legal Events

Date Code Title Description
FA92 Acknowledgement of application withdrawn (lack of supplementary materials submitted)

Effective date: 20160523