CN103469165B - 基于分布式电磁铁的矩形平面阴极电弧靶 - Google Patents
基于分布式电磁铁的矩形平面阴极电弧靶 Download PDFInfo
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- CN103469165B CN103469165B CN201310468970.XA CN201310468970A CN103469165B CN 103469165 B CN103469165 B CN 103469165B CN 201310468970 A CN201310468970 A CN 201310468970A CN 103469165 B CN103469165 B CN 103469165B
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- 239000013077 target material Substances 0.000 claims abstract description 19
- 238000010891 electric arc Methods 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 8
- 238000001816 cooling Methods 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 7
- 238000007733 ion plating Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 230000001154 acute effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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- Physical Vapour Deposition (AREA)
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CN201310468970.XA CN103469165B (zh) | 2013-10-10 | 2013-10-10 | 基于分布式电磁铁的矩形平面阴极电弧靶 |
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CN103469165A CN103469165A (zh) | 2013-12-25 |
CN103469165B true CN103469165B (zh) | 2016-06-08 |
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CN109182985B (zh) * | 2018-10-16 | 2021-05-07 | 深圳精匠云创科技有限公司 | 弧源装置及弧源磁场调节方法 |
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JP2009191340A (ja) * | 2008-02-18 | 2009-08-27 | Seiko Epson Corp | 成膜装置及び成膜方法 |
WO2010023878A1 (ja) * | 2008-08-28 | 2010-03-04 | 株式会社イー・エム・ディー | スパッタリング薄膜形成装置 |
CN101698934B (zh) * | 2009-10-23 | 2011-06-15 | 武汉大学 | 一种中空阴极电弧离子镀涂层系统 |
CN101935822A (zh) * | 2010-05-11 | 2011-01-05 | 赫得纳米科技(昆山)有限公司 | 具有交替电磁场的矩形平面磁控靶 |
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