RU2010117521A - Новое изделие и способ его изготовления при обработке материала - Google Patents
Новое изделие и способ его изготовления при обработке материала Download PDFInfo
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- RU2010117521A RU2010117521A RU2010117521/02A RU2010117521A RU2010117521A RU 2010117521 A RU2010117521 A RU 2010117521A RU 2010117521/02 A RU2010117521/02 A RU 2010117521/02A RU 2010117521 A RU2010117521 A RU 2010117521A RU 2010117521 A RU2010117521 A RU 2010117521A
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- Prior art keywords
- layer
- deposition
- carbon
- metal
- technology
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- 239000000463 material Substances 0.000 title claims abstract 11
- 238000000034 method Methods 0.000 title claims 18
- 238000004519 manufacturing process Methods 0.000 title claims 3
- 238000013016 damping Methods 0.000 claims abstract 11
- 229910052751 metal Inorganic materials 0.000 claims abstract 8
- 239000002184 metal Substances 0.000 claims abstract 8
- 229910010293 ceramic material Inorganic materials 0.000 claims abstract 6
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 claims abstract 6
- 239000002131 composite material Substances 0.000 claims abstract 4
- 150000002736 metal compounds Chemical class 0.000 claims abstract 4
- 238000005520 cutting process Methods 0.000 claims abstract 3
- 238000000227 grinding Methods 0.000 claims abstract 3
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract 2
- 150000004706 metal oxides Chemical class 0.000 claims abstract 2
- 238000003801 milling Methods 0.000 claims abstract 2
- 150000004767 nitrides Chemical class 0.000 claims abstract 2
- 239000007789 gas Substances 0.000 claims 18
- 238000005516 engineering process Methods 0.000 claims 12
- 238000000151 deposition Methods 0.000 claims 11
- 230000008021 deposition Effects 0.000 claims 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 8
- 229910052757 nitrogen Inorganic materials 0.000 claims 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 4
- 229910052799 carbon Inorganic materials 0.000 claims 4
- 238000000354 decomposition reaction Methods 0.000 claims 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 4
- 238000005229 chemical vapour deposition Methods 0.000 claims 3
- 238000005240 physical vapour deposition Methods 0.000 claims 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims 2
- 229910002091 carbon monoxide Inorganic materials 0.000 claims 2
- 239000003575 carbonaceous material Substances 0.000 claims 2
- 230000005611 electricity Effects 0.000 claims 2
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims 2
- -1 CH 4 or C 2 H 2 Inorganic materials 0.000 claims 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 229910002092 carbon dioxide Inorganic materials 0.000 claims 1
- 239000001569 carbon dioxide Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000005553 drilling Methods 0.000 claims 1
- 230000000694 effects Effects 0.000 claims 1
- 238000010891 electric arc Methods 0.000 claims 1
- 238000001755 magnetron sputter deposition Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
- C23C14/0658—Carbon nitride
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/002—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor with vibration damping means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/007—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor for internal turning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B29/00—Holders for non-rotary cutting tools; Boring bars or boring heads; Accessories for tool holders
- B23B29/02—Boring bars
- B23B29/022—Boring bars with vibration reducing means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B29/00—Holders for non-rotary cutting tools; Boring bars or boring heads; Accessories for tool holders
- B23B29/04—Tool holders for a single cutting tool
- B23B29/043—Tool holders for a single cutting tool with cutting-off, grooving or profile cutting tools, i.e. blade- or disc-like main cutting parts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B31/00—Chucks; Expansion mandrels; Adaptations thereof for remote control
- B23B31/005—Cylindrical shanks of tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q11/00—Accessories fitted to machine tools for keeping tools or parts of the machine in good working condition or for cooling work; Safety devices specially combined with or arranged in, or specially adapted for use in connection with, machine tools
- B23Q11/0032—Arrangements for preventing or isolating vibrations in parts of the machine
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/347—Carbon nitride
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
- C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2226/00—Materials of tools or workpieces not comprising a metal
- B23B2226/18—Ceramic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/10—Coatings
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/9088—Wear-resistant layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T407/00—Cutters, for shaping
- Y10T407/19—Rotary cutting tool
- Y10T407/1906—Rotary cutting tool including holder [i.e., head] having seat for inserted tool
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T407/22—Cutters, for shaping including holder having seat for inserted tool
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T408/00—Cutting by use of rotating axially moving tool
- Y10T408/76—Tool-carrier with vibration-damping means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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- Y10T409/30—Milling
- Y10T409/304312—Milling with means to dampen vibration
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- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
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- Y10T428/12576—Boride, carbide or nitride component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/31678—Of metal
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Vibration Prevention Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Drilling Tools (AREA)
- Milling Processes (AREA)
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Abstract
1. Устройство, предназначенное для удаления стружки, содержащее вибродемпфирующий материал, представляющий керамический материал, содержащий CNx, расположенный в виде наномерного кластера. ! 2. Устройство по п.1, в котором керамический материал присутствует в виде слоя на поверхности устройства, при этом слой составляет от 1 мкм до 1 см, предпочтительно от 1 мкм до 1000 мкм, и наиболее предпочтительно от 50 мкм до 500 мкм. ! 3. Устройство по п.1 или 2, в котором нанесенный демпфирующий материал представляет собой композитный материал, сформированный в виде многослойной структуры, которая состоит из чередующихся слоев металла или соединений металла одного вида и металла или соединений металла другого вида, причем чередующиеся слои металла состоят из нитрида металла или оксида металла. ! 4. Устройство по п.1, в котором нанесенный демпфирующий материал представляет собой композитный материал, сформированный в виде двухслойной структуры, которая состоит из вязкоэластичного слоя и слоя нитрида углерода, причем предпочтительно, чтобы слой нитрида углерода являлся ограничивающим слоем. ! 5. Устройство по п.1, в котором устройство представляет собой держатель инструмента (1), такой как держатель инструмента, режущая пластина, сверло, зачистной круг, фрезер-расширитель, цанга, фреза, пазовая фреза, концевая фреза или крепежное устройство, содержащее ! - вал (2), выполненный с возможностью установки в обрабатывающей машине или в держателе инструмента обрабатывающей машины; ! - головку (3), на которой устанавливается резец; и ! - вибродемпфирующий материал (4), установленный таким образом, чтобы резец находился в контакте с обрабатывающе�
Claims (15)
1. Устройство, предназначенное для удаления стружки, содержащее вибродемпфирующий материал, представляющий керамический материал, содержащий CNx, расположенный в виде наномерного кластера.
2. Устройство по п.1, в котором керамический материал присутствует в виде слоя на поверхности устройства, при этом слой составляет от 1 мкм до 1 см, предпочтительно от 1 мкм до 1000 мкм, и наиболее предпочтительно от 50 мкм до 500 мкм.
3. Устройство по п.1 или 2, в котором нанесенный демпфирующий материал представляет собой композитный материал, сформированный в виде многослойной структуры, которая состоит из чередующихся слоев металла или соединений металла одного вида и металла или соединений металла другого вида, причем чередующиеся слои металла состоят из нитрида металла или оксида металла.
4. Устройство по п.1, в котором нанесенный демпфирующий материал представляет собой композитный материал, сформированный в виде двухслойной структуры, которая состоит из вязкоэластичного слоя и слоя нитрида углерода, причем предпочтительно, чтобы слой нитрида углерода являлся ограничивающим слоем.
5. Устройство по п.1, в котором устройство представляет собой держатель инструмента (1), такой как держатель инструмента, режущая пластина, сверло, зачистной круг, фрезер-расширитель, цанга, фреза, пазовая фреза, концевая фреза или крепежное устройство, содержащее
- вал (2), выполненный с возможностью установки в обрабатывающей машине или в держателе инструмента обрабатывающей машины;
- головку (3), на которой устанавливается резец; и
- вибродемпфирующий материал (4), установленный таким образом, чтобы резец находился в контакте с обрабатывающей машиной исключительно через вибродемпфирующий материал (4).
6. Устройство по п.1, в котором вся поверхность держателя инструмента или по меньшей мере, те части поверхности (5) вала (2), которые должны находиться в контакте с обрабатывающей машиной или с держателем инструмента обрабатывающей машины, удерживающей держатель инструмента, снабжены вибродемпфирующим материалом.
7. Способ изготовления устройства для удаления стружки по любому из пп.1-6, включающий следующие этапы:
a) обеспечивают способ изготовления устройства для применения при удалении стружки; и
b) осаждают на упомянутое устройство керамический материал, содержащий CNx в форме наномерного кластера, что, таким образом, приводит к вибродемпфирующему эффекту в упомянутом устройстве.
8. Способ по п.7, в котором керамический материал осаждают в виде тонкого слоя на поверхность упомянутого устройства, причем упомянутый слой составляет от 1 мкм до 1 см, предпочтительно от 1 мкм до 1000 мкм, и наиболее предпочтительно от 50 мкм до 500 мкм.
9. Способ по п.7, в котором осаждение согласно этапу b) осуществляют путем использования технологии осаждения магнетронным распылением, такой как технология постоянного тока, радиочастотная технология, импульсная технология, технология импульсов высокой мощности, технология нанесения химически активного покрытия или электродуговая технология, такая как технология управляемой или неуправляемой дуги, или технология химического осаждения из паровой фазы (CVD), например радиочастотного осаждения, осаждения при постоянном токе, осаждения при низком давлении, осаждения при высоком давлении, осаждения в плазменной среде, или технология физического осаждения из паровой фазы (PVD), или технология плазменной струи, или сочетание упомянутых технологий; предпочтительно используют технологии PVD и CVD.
10. Способ по п.7, в котором осаждение согласно этапу b) осуществляют с использованием газообразных Ar, N, CH4 или С2Н2, или СО, или CO2, или их сочетания.
11. Способ по п.7, в котором осаждение согласно этапу b) осуществляют в реакторе, снабженном необязательно мишенью на магнетронном катоде в реакторе; содержащем катод и анод, разделенные магнитным полем, и путем
(a) обеспечения катодом магнетроноподобного магнитного поля в реакторе;
(b) помещения устройства в камеру;
(c) введения одного или нескольких углеродсодержащих технологических газов и химически активного газа в камеру;
(d) подачи электроэнергии к технологическому газу и химически активному газу с образованием плазмы для разложения технологического газа на радикалы и дальнейшего осаждения углеродного материала на устройство и ионизации химически активного газа с повышением скорости хемосорбции азота в углерод; и
(е) выпуска газов из камеры после разложения и хемосорбции.
12. Способ по п.7, в котором устройство вращают при скорости примерно 0,25 оборотов в минуту.
13. Способ по п.1, в котором технологические газы представляют собой ацетилен, и/или метан, и/или оксид углерода, и/или диоксид углерода, а химически активный газ представляет собой азот, причем предпочтительным является, чтобы соотношение между технологическим газом и химически активным газом составляло примерно 1/10-10/1, а наиболее предпочтительным является, чтобы соотношение между ацетиленом и/или метаном и азотом составляло примерно 50/50.
14. Способ по п.7, в котором давление в реакторе составляет 10-4-1000 торр, предпочтительно 10-3-10 торр.
15. Применение обрабатываемой детали или изделия, полученного способом для осаждения нитрида углерода на обрабатываемой детали или изделии в реакторе, содержащем магнетронный катод, причем является предпочтительным, чтобы упомянутый нитрид углерода при его нанесении состоял из нано- и/или субнаномерных кластеров/агрегатов, причем в способе
(a) обеспечивают катод, обладающий магнитным полем (предпочтительно, магнетроноподобным магнитным полем) в реакторе;
(b) помещают обрабатываемую деталь или изделие в реактор;
(c) осуществляют ввод одного или нескольких углеродсодержащих технологических газов и химически активного газа в реактор;
(d) подают электроэнергию к технологическому газу и химически активному газу с образованием плазмы для разложения технологического газа на радикалы и дальнейшего разложения углеродного материала на подложке обрабатываемой детали или изделия, и ионизации химически активного газа, для повышения скорости хемосорбции азота в углерод; и
(е) выпускают газы из камеры после их разложения и хемосорбции
в устройстве, предназначенном для удаления стружки предпочтительно в режущих пластинах, наиболее предпочтительно в инструментах, которые отвечают за токарную обработку, расточку, сверление, раззенковывание, резьбонарезание, размалывание, вычерчивание диаграмм, удаление заусенцев, проходку и/или протяжку.
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