RO76120A - Dispozitiv semiconductor de memorie - Google Patents

Dispozitiv semiconductor de memorie

Info

Publication number
RO76120A
RO76120A RO7893100A RO9310078A RO76120A RO 76120 A RO76120 A RO 76120A RO 7893100 A RO7893100 A RO 7893100A RO 9310078 A RO9310078 A RO 9310078A RO 76120 A RO76120 A RO 76120A
Authority
RO
Romania
Prior art keywords
semiconductor device
memory semiconductor
memory
semiconductor
Prior art date
Application number
RO7893100A
Other languages
English (en)
French (fr)
Other versions
RO76120B (ro
Original Assignee
N.V.Philips Glocilampenfabrieken,Nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by N.V.Philips Glocilampenfabrieken,Nl filed Critical N.V.Philips Glocilampenfabrieken,Nl
Publication of RO76120B publication Critical patent/RO76120B/ro
Publication of RO76120A publication Critical patent/RO76120A/ro

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/35Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices with charge storage in a depletion layer, e.g. charge coupled devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices
    • G11C11/40Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors
    • G11C11/401Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells
    • G11C11/403Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh
    • G11C11/404Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices using transistors forming cells needing refreshing or charge regeneration, i.e. dynamic cells with charge regeneration common to a multiplicity of memory cells, i.e. external refresh with one charge-transfer gate, e.g. MOS transistor, per cell
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/711Insulated-gate field-effect transistors [IGFET] having floating bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
  • Read Only Memory (AREA)
RO7893100A 1977-02-04 1978-02-04 Dispozitiv semiconductor de memorie RO76120A (ro)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7701172A NL7701172A (nl) 1977-02-04 1977-02-04 Halfgeleidergeheugeninrichting.

Publications (2)

Publication Number Publication Date
RO76120B RO76120B (ro) 1983-05-30
RO76120A true RO76120A (ro) 1983-06-01

Family

ID=19827917

Family Applications (1)

Application Number Title Priority Date Filing Date
RO7893100A RO76120A (ro) 1977-02-04 1978-02-04 Dispozitiv semiconductor de memorie

Country Status (14)

Country Link
US (1) US4161741A (ro)
JP (1) JPS5846064B2 (ro)
AU (1) AU512104B2 (ro)
BE (1) BE863591A (ro)
BR (1) BR7800627A (ro)
DD (1) DD137161A5 (ro)
DE (1) DE2804412C3 (ro)
ES (1) ES466564A1 (ro)
FR (1) FR2379877B1 (ro)
GB (1) GB1594562A (ro)
IT (1) IT1092499B (ro)
NL (1) NL7701172A (ro)
RO (1) RO76120A (ro)
SE (1) SE7801169L (ro)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1602361A (en) * 1977-02-21 1981-11-11 Zaidan Hojin Handotai Kenkyu Semiconductor memory devices
WO1979000474A1 (en) * 1978-01-03 1979-07-26 D Erb A stratified charge memory device
JPS6037620B2 (ja) * 1979-12-11 1985-08-27 株式会社東芝 半導体記憶装置
US4335450A (en) * 1980-01-30 1982-06-15 International Business Machines Corporation Non-destructive read out field effect transistor memory cell system
CA1164562A (en) * 1980-10-08 1984-03-27 Manabu Itsumi Semiconductor memory device
US4593453A (en) * 1982-06-01 1986-06-10 Rockwell International Corporation Two-level transistor structures and method utilizing minimal area therefor
US4609429A (en) * 1984-07-02 1986-09-02 International Business Machines Corporation Process for making a small dynamic memory cell structure
US4908688A (en) * 1986-03-14 1990-03-13 Motorola, Inc. Means and method for providing contact separation in silicided devices
US4753897A (en) * 1986-03-14 1988-06-28 Motorola Inc. Method for providing contact separation in silicided devices using false gate
GB9115699D0 (en) * 1991-07-19 1991-09-04 Philips Electronic Associated An overvoltage protected semiconductor switch
US7729149B2 (en) * 2007-05-01 2010-06-01 Suvolta, Inc. Content addressable memory cell including a junction field effect transistor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4075045A (en) * 1976-02-09 1978-02-21 International Business Machines Corporation Method for fabricating FET one-device memory cells with two layers of polycrystalline silicon and fabrication of integrated circuits containing arrays of the memory cells charge storage capacitors utilizing five basic pattern deliberating steps
US4063274A (en) * 1976-12-10 1977-12-13 Rca Corporation Integrated circuit device including both N-channel and P-channel insulated gate field effect transistors

Also Published As

Publication number Publication date
AU3294578A (en) 1979-08-09
NL7701172A (nl) 1978-08-08
DD137161A5 (de) 1979-08-15
IT7819890A0 (it) 1978-02-01
FR2379877B1 (fr) 1986-02-14
DE2804412C3 (de) 1982-03-18
IT1092499B (it) 1985-07-12
US4161741A (en) 1979-07-17
SE7801169L (sv) 1978-08-05
ES466564A1 (es) 1979-01-16
BE863591A (fr) 1978-08-02
BR7800627A (pt) 1978-10-10
DE2804412A1 (de) 1978-08-10
JPS5846064B2 (ja) 1983-10-14
DE2804412B2 (de) 1981-06-19
FR2379877A1 (fr) 1978-09-01
GB1594562A (en) 1981-07-30
AU512104B2 (en) 1980-09-25
RO76120B (ro) 1983-05-30
JPS5397384A (en) 1978-08-25

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