PL3093692T3 - Struktura przeciwodblaskowa oraz sposób jej projektowania - Google Patents

Struktura przeciwodblaskowa oraz sposób jej projektowania

Info

Publication number
PL3093692T3
PL3093692T3 PL15735604.9T PL15735604T PL3093692T3 PL 3093692 T3 PL3093692 T3 PL 3093692T3 PL 15735604 T PL15735604 T PL 15735604T PL 3093692 T3 PL3093692 T3 PL 3093692T3
Authority
PL
Poland
Prior art keywords
reflective structure
designing same
designing
same
reflective
Prior art date
Application number
PL15735604.9T
Other languages
English (en)
Inventor
Yutaka Wada
Mitsuo Arima
Original Assignee
Dexerials Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dexerials Corporation filed Critical Dexerials Corporation
Publication of PL3093692T3 publication Critical patent/PL3093692T3/pl

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B29C2059/023—Microembossing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Laminated Bodies (AREA)
PL15735604.9T 2014-01-10 2015-01-05 Struktura przeciwodblaskowa oraz sposób jej projektowania PL3093692T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014003483A JP6343937B2 (ja) 2014-01-10 2014-01-10 反射防止構造体及びその設計方法
PCT/JP2015/050049 WO2015105071A1 (ja) 2014-01-10 2015-01-05 反射防止構造体及びその設計方法

Publications (1)

Publication Number Publication Date
PL3093692T3 true PL3093692T3 (pl) 2025-07-14

Family

ID=53523898

Family Applications (1)

Application Number Title Priority Date Filing Date
PL15735604.9T PL3093692T3 (pl) 2014-01-10 2015-01-05 Struktura przeciwodblaskowa oraz sposób jej projektowania

Country Status (6)

Country Link
US (1) US10139524B2 (pl)
EP (1) EP3093692B1 (pl)
JP (1) JP6343937B2 (pl)
HU (1) HUE071857T2 (pl)
PL (1) PL3093692T3 (pl)
WO (1) WO2015105071A1 (pl)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6343937B2 (ja) * 2014-01-10 2018-06-20 デクセリアルズ株式会社 反射防止構造体及びその設計方法
JP6953109B2 (ja) * 2015-09-24 2021-10-27 ウシオ電機株式会社 基板上構造体の製造方法
TWI694133B (zh) * 2016-02-12 2020-05-21 美商萬騰榮公司 藉由使用表面奈米結構來強化光泵磷光體的輸出
JPWO2018151097A1 (ja) * 2017-02-15 2019-02-21 ナルックス株式会社 拡散素子
CN107976728A (zh) * 2017-12-28 2018-05-01 武汉华星光电技术有限公司 微结构、显示装置及其显示面板
US12382748B2 (en) * 2021-01-04 2025-08-05 Saudi Arabian Oil Company Nanostructures to reduce optical losses

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3070942B2 (ja) * 1990-10-18 2000-07-31 サカタインクス株式会社 着色剤の調整方法
TWI230002B (en) * 2000-10-17 2005-03-21 Nissha Printing Antireflective molded product and its manufacture method, mold for antireflective molded product
JP5187495B2 (ja) * 2007-12-10 2013-04-24 株式会社豊田中央研究所 反射防止膜、反射防止膜の製造方法、反射防止膜用鋳型、反射防止膜用鋳型を用いて得られた反射防止膜及びレプリカ膜を用いて得られた反射防止
JP5075234B2 (ja) * 2009-09-02 2012-11-21 ソニー株式会社 光学素子、および表示装置
JP2011053495A (ja) * 2009-09-02 2011-03-17 Sony Corp 光学素子、およびその製造方法
JP2011053496A (ja) * 2009-09-02 2011-03-17 Sony Corp 光学素子およびその製造方法、ならびに原盤の製造方法
JP4626721B1 (ja) * 2009-09-02 2011-02-09 ソニー株式会社 透明導電性電極、タッチパネル、情報入力装置、および表示装置
JP4796217B2 (ja) 2009-10-09 2011-10-19 シャープ株式会社 型および型の製造方法ならびに反射防止膜
US8747683B2 (en) * 2009-11-27 2014-06-10 Sharp Kabushiki Kaisha Die for moth-eye, and method for producing die for moth-eye and moth-eye structure
US20120070572A1 (en) * 2010-09-08 2012-03-22 Molecular Imprints, Inc. Vapor Delivery System For Use in Imprint Lithography
JP5782719B2 (ja) * 2011-01-19 2015-09-24 デクセリアルズ株式会社 透明導電性素子、入力装置、および表示装置
JO3415B1 (ar) 2011-03-30 2019-10-20 Crystal Lagoons Tech Inc نظام لمعالجة الماء المستخدم لأغراض صناعية
KR20140020274A (ko) * 2011-03-31 2014-02-18 소니 주식회사 인쇄물 및 인화물
JP2013142821A (ja) * 2012-01-11 2013-07-22 Dainippon Printing Co Ltd 反射防止フィルム
US9890466B2 (en) * 2013-08-14 2018-02-13 Mitsubishi Chemical Corporation Method for producing mold for nanoimprinting and anti-reflective article
JP6343937B2 (ja) * 2014-01-10 2018-06-20 デクセリアルズ株式会社 反射防止構造体及びその設計方法

Also Published As

Publication number Publication date
HUE071857T2 (hu) 2025-09-28
JP6343937B2 (ja) 2018-06-20
EP3093692A1 (en) 2016-11-16
JP2015132689A (ja) 2015-07-23
EP3093692B1 (en) 2025-04-16
EP3093692A4 (en) 2017-09-13
US20160313474A1 (en) 2016-10-27
WO2015105071A1 (ja) 2015-07-16
US10139524B2 (en) 2018-11-27

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