PL2882885T3 - Sposób powlekania plazmowego blachy naciskowej - Google Patents

Sposób powlekania plazmowego blachy naciskowej

Info

Publication number
PL2882885T3
PL2882885T3 PL13791714.2T PL13791714T PL2882885T3 PL 2882885 T3 PL2882885 T3 PL 2882885T3 PL 13791714 T PL13791714 T PL 13791714T PL 2882885 T3 PL2882885 T3 PL 2882885T3
Authority
PL
Poland
Prior art keywords
plasma coating
press platen
platen
press
plasma
Prior art date
Application number
PL13791714.2T
Other languages
English (en)
Polish (pl)
Inventor
Andreas Gebeshuber
Daniel Heim
Johann Laimer
Thomas Müller
Michael Proschek
Otto Stadler
Herbert Störi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of PL2882885T3 publication Critical patent/PL2882885T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B30—PRESSES
    • B30B—PRESSES IN GENERAL
    • B30B15/00—Details of, or accessories for, presses; Auxiliary measures in connection with pressing
    • B30B15/06—Platens or press rams
    • B30B15/062—Press plates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
PL13791714.2T 2012-08-08 2013-08-06 Sposób powlekania plazmowego blachy naciskowej PL2882885T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ATA877/2012A AT513190B9 (de) 2012-08-08 2012-08-08 Vorrichtung und Verfahren zur Plasmabeschichtung eines Substrats, insbesondere eines Pressblechs

Publications (1)

Publication Number Publication Date
PL2882885T3 true PL2882885T3 (pl) 2016-11-30

Family

ID=49584535

Family Applications (1)

Application Number Title Priority Date Filing Date
PL13791714.2T PL2882885T3 (pl) 2012-08-08 2013-08-06 Sposób powlekania plazmowego blachy naciskowej

Country Status (18)

Country Link
US (1) US9530624B2 (enExample)
EP (1) EP2882885B8 (enExample)
JP (1) JP6140286B2 (enExample)
KR (1) KR101742744B1 (enExample)
CN (1) CN104755653B (enExample)
AT (1) AT513190B9 (enExample)
AU (1) AU2013302202B2 (enExample)
BR (1) BR112015002657A8 (enExample)
CA (1) CA2881069C (enExample)
CL (1) CL2015000301A1 (enExample)
DK (1) DK2882885T3 (enExample)
ES (1) ES2587929T3 (enExample)
IN (1) IN2015DN01149A (enExample)
MY (1) MY176134A (enExample)
NZ (1) NZ704253A (enExample)
PL (1) PL2882885T3 (enExample)
RU (1) RU2615743C2 (enExample)
WO (1) WO2014022872A2 (enExample)

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JP2017025389A (ja) * 2015-07-24 2017-02-02 株式会社ユーテック プラズマｃｖｄ装置及び成膜方法
US11251019B2 (en) * 2016-12-15 2022-02-15 Toyota Jidosha Kabushiki Kaisha Plasma device
CN107283551B (zh) * 2017-08-21 2018-07-24 阜南盛原木业有限公司 一种具有良好防霉防虫性能的胶合板
JP6863199B2 (ja) * 2017-09-25 2021-04-21 トヨタ自動車株式会社 プラズマ処理装置
CN109055917B (zh) * 2018-09-07 2020-09-08 信阳师范学院 一种单室双面镀膜等离子体化学气相沉积系统
DE102019127659A1 (de) * 2019-10-15 2021-04-15 Hueck Rheinische Gmbh Presswerkzeug und Verfahren zum Herstellen eines Presswerkzeugs
US11884426B2 (en) 2020-07-08 2024-01-30 Hamilton Sundstrand Corporation Compression apparatus and methods of making and using the same

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US5273588A (en) * 1992-06-15 1993-12-28 Materials Research Corporation Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means
DE4443608C1 (de) * 1994-12-07 1996-03-21 Siemens Ag Plasmareaktor und Verfahren zu dessen Betrieb
DE19757141A1 (de) * 1997-12-20 1999-06-24 Philips Patentverwaltung Array aus Diamant/wasserstoffhaltigen Elektroden
US6190514B1 (en) 1997-12-30 2001-02-20 Premark Rwp Holdings, Inc. Method for high scan sputter coating to produce coated, abrasion resistant press plates with reduced built-in thermal stress
JP3595853B2 (ja) * 1999-03-18 2004-12-02 日本エー・エス・エム株式会社 プラズマｃｖｄ成膜装置
AU2001245938A1 (en) * 2000-03-28 2001-10-08 Tokyo Electron Limited Method and apparatus for controlling power delivered to a multiple segment electrode
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Also Published As

Publication number Publication date
MY176134A (en) 2020-07-24
KR101742744B1 (ko) 2017-06-01
BR112015002657A8 (pt) 2019-07-30
KR20150042817A (ko) 2015-04-21
WO2014022872A2 (de) 2014-02-13
EP2882885A2 (de) 2015-06-17
AU2013302202A1 (en) 2015-02-26
AT513190B9 (de) 2014-05-15
DK2882885T3 (en) 2016-09-05
BR112015002657A2 (pt) 2017-07-04
RU2015107784A (ru) 2016-09-27
AT513190A1 (de) 2014-02-15
JP2015531820A (ja) 2015-11-05
IN2015DN01149A (enExample) 2015-06-26
RU2615743C2 (ru) 2017-04-11
NZ704253A (en) 2016-08-26
US9530624B2 (en) 2016-12-27
EP2882885B8 (de) 2016-08-31
US20150255254A1 (en) 2015-09-10
CN104755653B (zh) 2017-09-19
WO2014022872A3 (de) 2014-05-15
AT513190B1 (de) 2014-03-15
ES2587929T3 (es) 2016-10-27
EP2882885B1 (de) 2016-05-25
AU2013302202B2 (en) 2015-12-03
CN104755653A (zh) 2015-07-01
JP6140286B2 (ja) 2017-05-31
CA2881069A1 (en) 2014-02-13
CL2015000301A1 (es) 2015-09-21
CA2881069C (en) 2017-11-07

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