NO873262L - Straalingsfoelsomme anordninger. - Google Patents

Straalingsfoelsomme anordninger.

Info

Publication number
NO873262L
NO873262L NO873262A NO873262A NO873262L NO 873262 L NO873262 L NO 873262L NO 873262 A NO873262 A NO 873262A NO 873262 A NO873262 A NO 873262A NO 873262 L NO873262 L NO 873262L
Authority
NO
Norway
Prior art keywords
radiation sensitive
sensitive devices
layer
radio sensitive
exposure
Prior art date
Application number
NO873262A
Other languages
English (en)
Norwegian (no)
Other versions
NO873262D0 (no
Inventor
Graham Philip Cooper
Original Assignee
Vickers Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers Plc filed Critical Vickers Plc
Publication of NO873262D0 publication Critical patent/NO873262D0/no
Publication of NO873262L publication Critical patent/NO873262L/no

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Light Receiving Elements (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Thermistors And Varistors (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Luminescent Compositions (AREA)
NO873262A 1985-12-05 1987-08-04 Straalingsfoelsomme anordninger. NO873262L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB858529958A GB8529958D0 (en) 1985-12-05 1985-12-05 Radiation sensitive devices
PCT/GB1986/000743 WO1987003706A2 (en) 1985-12-05 1986-12-05 Improvements in or relating to radiation sensitive devices

Publications (2)

Publication Number Publication Date
NO873262D0 NO873262D0 (no) 1987-08-04
NO873262L true NO873262L (no) 1987-10-05

Family

ID=10589280

Family Applications (1)

Application Number Title Priority Date Filing Date
NO873262A NO873262L (no) 1985-12-05 1987-08-04 Straalingsfoelsomme anordninger.

Country Status (14)

Country Link
EP (1) EP0248872B1 (de)
JP (1) JP2573274B2 (de)
AT (1) ATE66306T1 (de)
AU (1) AU583698B2 (de)
CA (1) CA1317147C (de)
DE (1) DE3680914D1 (de)
DK (1) DK405987A (de)
ES (1) ES2002217A6 (de)
FI (1) FI873397A0 (de)
GB (2) GB8529958D0 (de)
NO (1) NO873262L (de)
NZ (1) NZ218519A (de)
WO (1) WO1987003706A2 (de)
ZA (1) ZA869241B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8813154D0 (en) * 1988-06-03 1988-07-06 Vickers Plc Improvements in/relating to radiation sensitive devices
US5362597A (en) * 1991-05-30 1994-11-08 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester
JPH10171124A (ja) * 1996-12-11 1998-06-26 Konica Corp 感光性印刷版の製造方法
JP2000347397A (ja) 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE627691C (de) * 1931-03-06 1936-03-21 Amira Trust Fa Verfahren zur Herstellung eines photographischen Materials, bei dem die Schicht durch Tiefdruck aufgebracht wird
US2080965A (en) * 1932-02-25 1937-05-18 Funck Harry Process of photoengraving
AT296345B (de) * 1968-12-09 1972-02-10 Kalle Ag Lichtempfindliches Kopiermaterial zum Herstellen einer Druckform
JPS5229302A (en) * 1975-08-28 1977-03-05 Fuji Photo Film Co Ltd Photoosensitive printing plate
JPS5921540B2 (ja) * 1977-10-26 1984-05-21 セイコーエプソン株式会社 フオトレジストパタ−ンの形成方法
JPS5646230A (en) * 1979-09-21 1981-04-27 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing method
JPS5785048A (en) * 1980-11-17 1982-05-27 Daicel Chem Ind Ltd Exposed photosensitive diazo film for making screen plate
JPS5811943A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd スクリ−ンレス平版印刷原版
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung

Also Published As

Publication number Publication date
WO1987003706A2 (en) 1987-06-18
JP2573274B2 (ja) 1997-01-22
GB8629131D0 (en) 1987-01-14
CA1317147C (en) 1993-05-04
FI873397L (fi) 1987-08-05
ES2002217A6 (es) 1988-07-16
GB2184857A (en) 1987-07-01
NO873262D0 (no) 1987-08-04
AU6727487A (en) 1987-06-30
DK405987D0 (da) 1987-08-04
EP0248872B1 (de) 1991-08-14
WO1987003706A3 (en) 1987-09-11
GB8529958D0 (en) 1986-01-15
JPS63502141A (ja) 1988-08-18
GB2184857B (en) 1989-10-11
FI873397A7 (fi) 1987-08-05
NZ218519A (en) 1989-03-29
AU583698B2 (en) 1989-05-04
DK405987A (da) 1987-08-04
ZA869241B (en) 1987-07-29
FI873397A0 (fi) 1987-08-05
ATE66306T1 (de) 1991-08-15
EP0248872A1 (de) 1987-12-16
DE3680914D1 (de) 1991-09-19

Similar Documents

Publication Publication Date Title
NO155146C (no) Fremgangsmaate for belegning av et substrat med et straalings- og fuktighetsherdbart belegningsmiddel.
DE3068974D1 (en) Unsubbed organic film coated with an opaque antistatic backing layer, and method of manufacturing
KR970006534B1 (en) Semiconductor integrated circuit package and its manufacture and its mounting method
CA2097310A1 (en) Two-sided susceptor structure
MY108386A (en) A surface-protection method during etching
KR890015346A (ko) 웨이퍼기판 및 화합물 반도체층으로 구성된 반도체기판
IT1096523B (it) Corpo composto con substrato di beta-allumina e rivestimento di vetro su di esso
DE3889396D1 (de) Staubgeschützter Film.
NO873262D0 (no) Straalingsfoelsomme anordninger.
ES2101049T3 (es) Estructura de pelicula metalizada y metodo.
JPS55121669A (en) Method of forming inactive layer on integrated circuit device having substrate of semiconductor material
EP0181737A3 (en) Method of fabricating integrated circuits incorporating steps to detect presence of gettering sites
JPS54118175A (en) Method of exposing radiation sensitive layer with xxray
KR910005101A (ko) 레지스트패턴 형성방법
EP0003155A3 (en) Method of manufacturing a device using a gold layer masking against a proton bombardment and device manufactured by means of the method
ATA13988A (de) Belichtungseinrichtung fuer lichtempfindlich gemachte substrate
JPS54107290A (en) Semiconductor photo sensing unit
JPS5633874A (en) Semiconductor device builtin with photocell
DE69329603D1 (de) Halbleitervorrichtung mit einer ITO-Schicht
JPS6479743A (en) Pattern forming method by dry developing
JPS5746327A (en) Magnetic tape
KR890018232U (ko) WSi₂필름층이 형성된 쌍극성 반도체 소자
JPS57176749A (en) Semiconductor integrated circuit device
JPS57186329A (en) Exposing method
KR920005319U (ko) 기판이 수납되는 카세트의 위치고정장치