ES2002217A6 - Mejoras en los dispositivos sensibles a la radiacion - Google Patents

Mejoras en los dispositivos sensibles a la radiacion

Info

Publication number
ES2002217A6
ES2002217A6 ES8603291A ES8603291A ES2002217A6 ES 2002217 A6 ES2002217 A6 ES 2002217A6 ES 8603291 A ES8603291 A ES 8603291A ES 8603291 A ES8603291 A ES 8603291A ES 2002217 A6 ES2002217 A6 ES 2002217A6
Authority
ES
Spain
Prior art keywords
radiation sensitive
sensitive device
layer
exposure
covering layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES8603291A
Other languages
English (en)
Inventor
Graham Philip Cooper
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
Vickers PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vickers PLC filed Critical Vickers PLC
Publication of ES2002217A6 publication Critical patent/ES2002217A6/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Abstract

DISPOSITIVO SENSIBLE A LA RADIACION QUE COMPRENDE UN SUBSTRATO PORTADOR DE UNA CAPA SENSIBLE A LA RADIACION QUE SE RECUBRE CON UNA CAPA DE CUBRICION DISCONTINUA QUE ES MAS SENSIBLE A LA RADIACION. LA CAPA DE CUBRICION ESTA FORMADA POR ROCIADO Y AYUDA A MEJORAR LA COLOCACION POR VACIO DURANTE LA EXPOSICION A LA IMAGEN DEL DISPOSITIVO SIN TENER EFECTOS PERJUDICIALES EN LAS CARACTERISTICAS DE EXPOSICION Y REVELADO DEL DISPOSITIVO.
ES8603291A 1985-12-05 1986-12-05 Mejoras en los dispositivos sensibles a la radiacion Expired ES2002217A6 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB858529958A GB8529958D0 (en) 1985-12-05 1985-12-05 Radiation sensitive devices

Publications (1)

Publication Number Publication Date
ES2002217A6 true ES2002217A6 (es) 1988-07-16

Family

ID=10589280

Family Applications (1)

Application Number Title Priority Date Filing Date
ES8603291A Expired ES2002217A6 (es) 1985-12-05 1986-12-05 Mejoras en los dispositivos sensibles a la radiacion

Country Status (14)

Country Link
EP (1) EP0248872B1 (es)
JP (1) JP2573274B2 (es)
AT (1) ATE66306T1 (es)
AU (1) AU583698B2 (es)
CA (1) CA1317147C (es)
DE (1) DE3680914D1 (es)
DK (1) DK405987D0 (es)
ES (1) ES2002217A6 (es)
FI (1) FI873397A0 (es)
GB (2) GB8529958D0 (es)
NO (1) NO873262L (es)
NZ (1) NZ218519A (es)
WO (1) WO1987003706A2 (es)
ZA (1) ZA869241B (es)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8813154D0 (en) * 1988-06-03 1988-07-06 Vickers Plc Improvements in/relating to radiation sensitive devices
US5362597A (en) * 1991-05-30 1994-11-08 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester
JPH10171124A (ja) * 1996-12-11 1998-06-26 Konica Corp 感光性印刷版の製造方法
JP2000347397A (ja) 1999-06-04 2000-12-15 Jsr Corp 感放射線性樹脂組成物およびその層間絶縁膜への使用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE627691C (de) * 1931-03-06 1936-03-21 Amira Trust Fa Verfahren zur Herstellung eines photographischen Materials, bei dem die Schicht durch Tiefdruck aufgebracht wird
US2080965A (en) * 1932-02-25 1937-05-18 Funck Harry Process of photoengraving
AT296345B (de) * 1968-12-09 1972-02-10 Kalle Ag Lichtempfindliches Kopiermaterial zum Herstellen einer Druckform
JPS5229302A (en) * 1975-08-28 1977-03-05 Fuji Photo Film Co Ltd Photoosensitive printing plate
JPS5921540B2 (ja) * 1977-10-26 1984-05-21 セイコーエプソン株式会社 フオトレジストパタ−ンの形成方法
JPS5646230A (en) * 1979-09-21 1981-04-27 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing method
JPS5785048A (en) * 1980-11-17 1982-05-27 Daicel Chem Ind Ltd Exposed photosensitive diazo film for making screen plate
JPS5811943A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd スクリ−ンレス平版印刷原版
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung

Also Published As

Publication number Publication date
GB2184857B (en) 1989-10-11
CA1317147C (en) 1993-05-04
NO873262L (no) 1987-10-05
EP0248872A1 (en) 1987-12-16
DK405987A (da) 1987-08-04
AU583698B2 (en) 1989-05-04
DK405987D0 (da) 1987-08-04
ATE66306T1 (de) 1991-08-15
ZA869241B (en) 1987-07-29
GB8629131D0 (en) 1987-01-14
NO873262D0 (no) 1987-08-04
EP0248872B1 (en) 1991-08-14
NZ218519A (en) 1989-03-29
FI873397A (fi) 1987-08-05
GB8529958D0 (en) 1986-01-15
AU6727487A (en) 1987-06-30
GB2184857A (en) 1987-07-01
JPS63502141A (ja) 1988-08-18
DE3680914D1 (de) 1991-09-19
JP2573274B2 (ja) 1997-01-22
FI873397A0 (fi) 1987-08-05
WO1987003706A3 (en) 1987-09-11
WO1987003706A2 (en) 1987-06-18

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Legal Events

Date Code Title Description
SA6 Expiration date (snapshot 920101)

Free format text: 2006-12-05

PC1A Transfer granted

Owner name: E.I. DU PONT DE NEMOURS AND COMPANY

FD1A Patent lapsed

Effective date: 20010301