NO873262L - Straalingsfoelsomme anordninger. - Google Patents
Straalingsfoelsomme anordninger.Info
- Publication number
- NO873262L NO873262L NO873262A NO873262A NO873262L NO 873262 L NO873262 L NO 873262L NO 873262 A NO873262 A NO 873262A NO 873262 A NO873262 A NO 873262A NO 873262 L NO873262 L NO 873262L
- Authority
- NO
- Norway
- Prior art keywords
- radiation sensitive
- sensitive devices
- layer
- radio sensitive
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB858529958A GB8529958D0 (en) | 1985-12-05 | 1985-12-05 | Radiation sensitive devices |
PCT/GB1986/000743 WO1987003706A2 (en) | 1985-12-05 | 1986-12-05 | Improvements in or relating to radiation sensitive devices |
Publications (2)
Publication Number | Publication Date |
---|---|
NO873262D0 NO873262D0 (no) | 1987-08-04 |
NO873262L true NO873262L (no) | 1987-10-05 |
Family
ID=10589280
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO873262A NO873262L (no) | 1985-12-05 | 1987-08-04 | Straalingsfoelsomme anordninger. |
Country Status (14)
Country | Link |
---|---|
EP (1) | EP0248872B1 (no) |
JP (1) | JP2573274B2 (no) |
AT (1) | ATE66306T1 (no) |
AU (1) | AU583698B2 (no) |
CA (1) | CA1317147C (no) |
DE (1) | DE3680914D1 (no) |
DK (1) | DK405987D0 (no) |
ES (1) | ES2002217A6 (no) |
FI (1) | FI873397A0 (no) |
GB (2) | GB8529958D0 (no) |
NO (1) | NO873262L (no) |
NZ (1) | NZ218519A (no) |
WO (1) | WO1987003706A2 (no) |
ZA (1) | ZA869241B (no) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8813154D0 (en) * | 1988-06-03 | 1988-07-06 | Vickers Plc | Improvements in/relating to radiation sensitive devices |
US5362597A (en) * | 1991-05-30 | 1994-11-08 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition comprising an epoxy-containing alkali-soluble resin and a naphthoquinone diazide sulfonic acid ester |
JPH10171124A (ja) * | 1996-12-11 | 1998-06-26 | Konica Corp | 感光性印刷版の製造方法 |
JP2000347397A (ja) | 1999-06-04 | 2000-12-15 | Jsr Corp | 感放射線性樹脂組成物およびその層間絶縁膜への使用 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE627691C (de) * | 1931-03-06 | 1936-03-21 | Amira Trust Fa | Verfahren zur Herstellung eines photographischen Materials, bei dem die Schicht durch Tiefdruck aufgebracht wird |
US2080965A (en) * | 1932-02-25 | 1937-05-18 | Funck Harry | Process of photoengraving |
AT296345B (de) * | 1968-12-09 | 1972-02-10 | Kalle Ag | Lichtempfindliches Kopiermaterial zum Herstellen einer Druckform |
JPS5229302A (en) * | 1975-08-28 | 1977-03-05 | Fuji Photo Film Co Ltd | Photoosensitive printing plate |
JPS5921540B2 (ja) * | 1977-10-26 | 1984-05-21 | セイコーエプソン株式会社 | フオトレジストパタ−ンの形成方法 |
JPS5646230A (en) * | 1979-09-21 | 1981-04-27 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Exposing method |
JPS5785048A (en) * | 1980-11-17 | 1982-05-27 | Daicel Chem Ind Ltd | Exposed photosensitive diazo film for making screen plate |
JPS5811943A (ja) * | 1981-07-16 | 1983-01-22 | Ricoh Co Ltd | スクリ−ンレス平版印刷原版 |
DE3433247A1 (de) * | 1984-09-11 | 1986-03-20 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung |
-
1985
- 1985-12-05 GB GB858529958A patent/GB8529958D0/en active Pending
-
1986
- 1986-12-02 CA CA000524379A patent/CA1317147C/en not_active Expired - Fee Related
- 1986-12-04 NZ NZ218519A patent/NZ218519A/xx unknown
- 1986-12-05 AU AU67274/87A patent/AU583698B2/en not_active Ceased
- 1986-12-05 ES ES8603291A patent/ES2002217A6/es not_active Expired
- 1986-12-05 ZA ZA869241A patent/ZA869241B/xx unknown
- 1986-12-05 AT AT87900185T patent/ATE66306T1/de not_active IP Right Cessation
- 1986-12-05 DE DE8787900185T patent/DE3680914D1/de not_active Expired - Lifetime
- 1986-12-05 EP EP87900185A patent/EP0248872B1/en not_active Expired - Lifetime
- 1986-12-05 GB GB8629131A patent/GB2184857B/en not_active Expired
- 1986-12-05 WO PCT/GB1986/000743 patent/WO1987003706A2/en active IP Right Grant
- 1986-12-05 JP JP62500049A patent/JP2573274B2/ja not_active Expired - Lifetime
-
1987
- 1987-08-04 DK DK405987A patent/DK405987D0/da not_active Application Discontinuation
- 1987-08-04 NO NO873262A patent/NO873262L/no unknown
- 1987-08-05 FI FI873397A patent/FI873397A0/fi not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
GB2184857B (en) | 1989-10-11 |
CA1317147C (en) | 1993-05-04 |
EP0248872A1 (en) | 1987-12-16 |
DK405987A (da) | 1987-08-04 |
AU583698B2 (en) | 1989-05-04 |
DK405987D0 (da) | 1987-08-04 |
ATE66306T1 (de) | 1991-08-15 |
ZA869241B (en) | 1987-07-29 |
GB8629131D0 (en) | 1987-01-14 |
NO873262D0 (no) | 1987-08-04 |
EP0248872B1 (en) | 1991-08-14 |
ES2002217A6 (es) | 1988-07-16 |
NZ218519A (en) | 1989-03-29 |
FI873397A (fi) | 1987-08-05 |
GB8529958D0 (en) | 1986-01-15 |
AU6727487A (en) | 1987-06-30 |
GB2184857A (en) | 1987-07-01 |
JPS63502141A (ja) | 1988-08-18 |
DE3680914D1 (de) | 1991-09-19 |
JP2573274B2 (ja) | 1997-01-22 |
FI873397A0 (fi) | 1987-08-05 |
WO1987003706A3 (en) | 1987-09-11 |
WO1987003706A2 (en) | 1987-06-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69122030T2 (de) | Herstellungsverfahren und Struktur einer elektrolumineszenten Dünnfilmvorrichtung | |
DE3068974D1 (en) | Unsubbed organic film coated with an opaque antistatic backing layer, and method of manufacturing | |
KR970006534B1 (en) | Semiconductor integrated circuit package and its manufacture and its mounting method | |
CA2097310A1 (en) | Two-sided susceptor structure | |
DE68919485T2 (de) | Halbleitersubstrat mit Substratscheibe und Verbindungshalbleiterschicht. | |
MY108386A (en) | A surface-protection method during etching | |
IT1096523B (it) | Corpo composto con substrato di beta-allumina e rivestimento di vetro su di esso | |
DE3889396T2 (de) | Staubgeschützter Film. | |
NO873262D0 (no) | Straalingsfoelsomme anordninger. | |
JPS55121669A (en) | Method of forming inactive layer on integrated circuit device having substrate of semiconductor material | |
EP0181737A3 (en) | Method of fabricating integrated circuits incorporating steps to detect presence of gettering sites | |
JPS54118175A (en) | Method of exposing radiation sensitive layer with xxray | |
EP0003155A3 (en) | Method of manufacturing a device using a gold layer masking against a proton bombardment and device manufactured by means of the method | |
ATA13988A (de) | Belichtungseinrichtung fuer lichtempfindlich gemachte substrate | |
JPS54107290A (en) | Semiconductor photo sensing unit | |
JPS5633874A (en) | Semiconductor device builtin with photocell | |
DE69329603T2 (de) | Halbleitervorrichtung mit einer ITO-Schicht | |
JPS6479743A (en) | Pattern forming method by dry developing | |
JPS5373978A (en) | Manufacture for semiconductor device | |
JPS5746327A (en) | Magnetic tape | |
JPS57176749A (en) | Semiconductor integrated circuit device | |
KR920005319U (ko) | 기판이 수납되는 카세트의 위치고정장치 | |
JPS56162836A (en) | Mask for integrated circuit | |
UA2071A1 (uk) | Носій інформації | |
JPS635643U (no) |