NO303280B1 - FremgangsmÕte for fremstilling av et belegg omfattende et pyrolytisk tildannet oksydsjikt pÕ et varmt glass-substrat - Google Patents
FremgangsmÕte for fremstilling av et belegg omfattende et pyrolytisk tildannet oksydsjikt pÕ et varmt glass-substrat Download PDFInfo
- Publication number
- NO303280B1 NO303280B1 NO912905A NO912905A NO303280B1 NO 303280 B1 NO303280 B1 NO 303280B1 NO 912905 A NO912905 A NO 912905A NO 912905 A NO912905 A NO 912905A NO 303280 B1 NO303280 B1 NO 303280B1
- Authority
- NO
- Norway
- Prior art keywords
- undercoating
- coating
- glass
- chamber
- precursor material
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims description 114
- 239000011248 coating agent Substances 0.000 title claims description 102
- 239000011521 glass Substances 0.000 title claims description 79
- 239000000758 substrate Substances 0.000 title claims description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000000463 material Substances 0.000 claims description 64
- 239000002243 precursor Substances 0.000 claims description 52
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 39
- 239000001301 oxygen Substances 0.000 claims description 39
- 229910052760 oxygen Inorganic materials 0.000 claims description 39
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 32
- 239000010410 layer Substances 0.000 claims description 32
- 229910000077 silane Inorganic materials 0.000 claims description 29
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 27
- 239000012159 carrier gas Substances 0.000 claims description 22
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 19
- 239000011247 coating layer Substances 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 230000015572 biosynthetic process Effects 0.000 claims description 7
- 238000002156 mixing Methods 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 239000005329 float glass Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 4
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- 239000005357 flat glass Substances 0.000 claims description 3
- 230000033001 locomotion Effects 0.000 claims description 3
- 239000012808 vapor phase Substances 0.000 claims description 3
- 238000009498 subcoating Methods 0.000 claims description 2
- 150000004756 silanes Chemical class 0.000 claims 1
- 230000003647 oxidation Effects 0.000 description 16
- 238000007254 oxidation reaction Methods 0.000 description 16
- 230000000694 effects Effects 0.000 description 13
- 238000000137 annealing Methods 0.000 description 10
- 239000003153 chemical reaction reagent Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 8
- 230000001590 oxidative effect Effects 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000000377 silicon dioxide Substances 0.000 description 7
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- 239000007795 chemical reaction product Substances 0.000 description 6
- 230000005855 radiation Effects 0.000 description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- 229910001887 tin oxide Inorganic materials 0.000 description 6
- 239000000047 product Substances 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000000197 pyrolysis Methods 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- GRUMUEUJTSXQOI-UHFFFAOYSA-N vanadium dioxide Chemical compound O=[V]=O GRUMUEUJTSXQOI-UHFFFAOYSA-N 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229910021542 Vanadium(IV) oxide Inorganic materials 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 3
- 239000003570 air Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 2
- 229910007667 ZnOx Inorganic materials 0.000 description 2
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 231100000572 poisoning Toxicity 0.000 description 2
- 230000000607 poisoning effect Effects 0.000 description 2
- 238000010944 pre-mature reactiony Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000001119 stannous chloride Substances 0.000 description 2
- 235000011150 stannous chloride Nutrition 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- 239000004246 zinc acetate Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910021551 Vanadium(III) chloride Inorganic materials 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 description 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical class [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000009970 fire resistant effect Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- HQYCOEXWFMFWLR-UHFFFAOYSA-K vanadium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[V+3] HQYCOEXWFMFWLR-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3423—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings comprising a suboxide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9019069A GB2247691B (en) | 1990-08-31 | 1990-08-31 | Method of coating glass |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| NO912905D0 NO912905D0 (no) | 1991-07-25 |
| NO912905L NO912905L (no) | 1992-03-02 |
| NO303280B1 true NO303280B1 (no) | 1998-06-22 |
Family
ID=10681474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO912905A NO303280B1 (no) | 1990-08-31 | 1991-07-25 | FremgangsmÕte for fremstilling av et belegg omfattende et pyrolytisk tildannet oksydsjikt pÕ et varmt glass-substrat |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US5203903A (it) |
| JP (1) | JP3214713B2 (it) |
| AT (1) | AT404935B (it) |
| BE (1) | BE1005317A5 (it) |
| CA (1) | CA2049441C (it) |
| CH (1) | CH682745A5 (it) |
| DE (1) | DE4128600A1 (it) |
| ES (1) | ES2049135B1 (it) |
| FR (1) | FR2666325B1 (it) |
| GB (1) | GB2247691B (it) |
| IT (1) | IT1249989B (it) |
| LU (1) | LU87997A1 (it) |
| NL (1) | NL194963C (it) |
| NO (1) | NO303280B1 (it) |
| SE (1) | SE501632C2 (it) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU655119B2 (en) * | 1992-07-11 | 1994-12-01 | Pilkington Glass Limited | Coatings on glass |
| US5580364A (en) * | 1992-07-11 | 1996-12-03 | Libbey-Owens-Ford Co. | Method of producing a coated glass substrate exhibiting reflected color |
| DE4237921A1 (de) * | 1992-10-23 | 1994-04-28 | Flachglas Ag | Verfahren und Vorrichtung zum Modifizieren der Oberflächenaktivität eines Silikatglassubstrates |
| GB9300400D0 (en) * | 1993-01-11 | 1993-03-03 | Glaverbel | A device and method for forming a coating by pyrolysis |
| GB9400323D0 (en) * | 1994-01-10 | 1994-03-09 | Pilkington Glass Ltd | Coatings on glass |
| GB9400319D0 (en) * | 1994-01-10 | 1994-03-09 | Pilkington Glass Ltd | Coatings on glass |
| GB9400320D0 (en) * | 1994-01-10 | 1994-03-09 | Pilkington Glass Ltd | Coating on glass |
| GB9408359D0 (en) * | 1994-04-27 | 1994-06-15 | Glaverbel | Glazing panel and process for forming the same |
| US5721054A (en) * | 1994-04-27 | 1998-02-24 | Glaverbel | Glazing panel and process for forming the same |
| US5729323A (en) * | 1994-07-29 | 1998-03-17 | Baush & Lomb Incorporated | Light-absorbing and anti-reflective coating for sunglasses |
| CA2159296C (en) * | 1994-10-14 | 2007-01-30 | Michel J. Soubeyrand | Glass coating method and glass coated thereby |
| CA2178032A1 (en) * | 1995-06-09 | 1996-12-10 | Robert Terneu | Glazing panel having solar screening properties |
| US6231971B1 (en) * | 1995-06-09 | 2001-05-15 | Glaverbel | Glazing panel having solar screening properties |
| GB9806030D0 (en) * | 1998-03-20 | 1998-05-20 | Glaverbel | Solar control coated substrate with high reflectance |
| GB2355273A (en) * | 1999-10-12 | 2001-04-18 | Pilkington Plc | Coating glass |
| DE10016108C2 (de) * | 2000-03-31 | 2002-09-26 | Schott Glas | Heißformgebungsverfahren und Vorrichtung zur Herstellung eines Glaskörpers sowie dessen Verwendung |
| CN100340512C (zh) * | 2005-11-08 | 2007-10-03 | 浙江大学蓝星新材料技术有限公司 | 浮法玻璃在线镀膜装置 |
| FI20060288A0 (fi) * | 2006-03-27 | 2006-03-27 | Abr Innova Oy | Pinnoitusmenetelmä |
| WO2008044179A1 (en) * | 2006-10-12 | 2008-04-17 | Koninklijke Philips Electronics N.V. | Biosensors and preparation thereof |
| CN101618952B (zh) * | 2009-07-30 | 2011-08-17 | 杭州蓝星新材料技术有限公司 | 浮法在线生产透明导电膜玻璃的方法 |
| BE1019988A3 (fr) | 2011-05-24 | 2013-03-05 | Agc Glass Europe | Substrat verrier transparent portant un revetement de couches successives. |
| DE102011076830A1 (de) * | 2011-05-31 | 2012-12-06 | Innovent E.V. | Verfahren und Vorrichtung zum Beschichten eines Floatglasbandes |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1136218A (en) * | 1965-12-14 | 1968-12-11 | Standard Telephones Cables Ltd | Improvements in or relating to the manufacture of semiconductor optical devices |
| FR1596613A (it) * | 1967-11-20 | 1970-06-22 | ||
| US4129434A (en) * | 1971-07-08 | 1978-12-12 | Glaverbell | Process for forming a metal oxide coating |
| GB1524326A (en) * | 1976-04-13 | 1978-09-13 | Bfg Glassgroup | Coating of glass |
| DE2646513C2 (de) * | 1976-10-15 | 1984-10-04 | Bfg Glassgroup, Paris | Verfahren zur Herstellung einer wärmereflektierenden Natron-Kalk-Silikatglasscheibe |
| US4100330A (en) * | 1977-03-28 | 1978-07-11 | Ppg Industries, Inc. | Method for coating glass with silicon and a metal oxide and resulting product |
| BE879189A (fr) * | 1978-10-19 | 1980-04-04 | Bfg Glassgroup | Procede de formation d'un revetement d'oxyde d'etain sur un support de verre chaud et produits ainsi obtenus |
| JPS5826052A (ja) * | 1981-08-06 | 1983-02-16 | Asahi Glass Co Ltd | アルカリ拡散防止酸化ケイ素膜付ガラス体 |
| DE3300589A1 (de) * | 1983-01-11 | 1984-07-12 | Schott Glaswerke, 6500 Mainz | Verfahren zur herstellung von indiumoxid-zinnoxid-schichten |
| GB8420534D0 (en) * | 1984-08-13 | 1984-09-19 | Pilkington Brothers Plc | Coated products |
| FR2581056B1 (fr) * | 1985-04-24 | 1987-06-05 | Saint Gobain Vitrage | Revetement du verre fabrique dans une installation de flottage par des composes pyrolisables en poudre |
| GB8630918D0 (en) * | 1986-12-24 | 1987-02-04 | Pilkington Brothers Plc | Coatings on glass |
| GB8814922D0 (en) * | 1988-06-23 | 1988-07-27 | Pilkington Plc | Coatings on glass |
| GB8824104D0 (en) * | 1988-10-14 | 1988-11-23 | Pilkington Plc | Process for coating glass |
| GB8914047D0 (en) * | 1989-06-19 | 1989-08-09 | Glaverbel | Method of and apparatus for pyrolytically forming an oxide coating on a hot glass substrate |
-
1990
- 1990-08-31 GB GB9019069A patent/GB2247691B/en not_active Expired - Lifetime
-
1991
- 1991-07-25 NO NO912905A patent/NO303280B1/no not_active IP Right Cessation
- 1991-08-13 ES ES09101876A patent/ES2049135B1/es not_active Expired - Fee Related
- 1991-08-19 US US07/746,728 patent/US5203903A/en not_active Expired - Lifetime
- 1991-08-19 IT ITTO910651A patent/IT1249989B/it active IP Right Grant
- 1991-08-19 CA CA002049441A patent/CA2049441C/en not_active Expired - Fee Related
- 1991-08-21 FR FR9110545A patent/FR2666325B1/fr not_active Expired - Lifetime
- 1991-08-22 BE BE9100774A patent/BE1005317A5/fr not_active IP Right Cessation
- 1991-08-26 AT AT0167891A patent/AT404935B/de not_active IP Right Cessation
- 1991-08-27 JP JP24262891A patent/JP3214713B2/ja not_active Expired - Lifetime
- 1991-08-27 NL NL9101446A patent/NL194963C/nl not_active IP Right Cessation
- 1991-08-28 DE DE4128600A patent/DE4128600A1/de not_active Ceased
- 1991-08-28 CH CH2520/91A patent/CH682745A5/fr not_active IP Right Cessation
- 1991-08-28 LU LU87997A patent/LU87997A1/fr unknown
- 1991-08-30 SE SE9102490A patent/SE501632C2/sv not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE4128600A1 (de) | 1992-03-05 |
| ES2049135B1 (es) | 1994-10-16 |
| NL9101446A (nl) | 1992-03-16 |
| CA2049441C (en) | 2002-10-15 |
| NL194963B (nl) | 2003-05-01 |
| ATA167891A (de) | 1998-08-15 |
| CH682745A5 (fr) | 1993-11-15 |
| JPH04270144A (ja) | 1992-09-25 |
| NO912905L (no) | 1992-03-02 |
| NL194963C (nl) | 2003-09-02 |
| FR2666325B1 (fr) | 1993-12-31 |
| ES2049135A1 (es) | 1994-04-01 |
| ITTO910651A0 (it) | 1991-08-19 |
| LU87997A1 (fr) | 1992-03-03 |
| GB2247691B (en) | 1994-11-23 |
| CA2049441A1 (en) | 1992-03-01 |
| GB9019069D0 (en) | 1990-10-17 |
| SE9102490L (sv) | 1992-03-01 |
| BE1005317A5 (fr) | 1993-06-29 |
| FR2666325A1 (fr) | 1992-03-06 |
| GB2247691A (en) | 1992-03-11 |
| IT1249989B (it) | 1995-03-30 |
| JP3214713B2 (ja) | 2001-10-02 |
| ITTO910651A1 (it) | 1993-02-19 |
| US5203903A (en) | 1993-04-20 |
| AT404935B (de) | 1999-03-25 |
| NO912905D0 (no) | 1991-07-25 |
| SE501632C2 (sv) | 1995-04-03 |
| SE9102490D0 (sv) | 1991-08-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| NO303280B1 (no) | FremgangsmÕte for fremstilling av et belegg omfattende et pyrolytisk tildannet oksydsjikt pÕ et varmt glass-substrat | |
| NO303981B1 (no) | Fremgangsmåte og apparatur for pyrolyttisk tildanning av et silisiumdioksydbelegg på et varmt glassubstrat. | |
| EP0309902B1 (en) | Chemical vapor deposition of tin oxide on float glass in the tin bath | |
| KR101746245B1 (ko) | 박막 침착 방법 | |
| JPS6210943B2 (it) | ||
| US3689304A (en) | Treating glass | |
| JPH02504612A (ja) | ガラス被覆方法と被覆ガラス | |
| JPH05124837A (ja) | ガラス基材へ被覆を付着させる方法 | |
| CN1016604B (zh) | 生产涂层玻璃的方法及其制品 | |
| US5221352A (en) | Apparatus for pyrolytically forming an oxide coating on a hot glass substrate | |
| US3498819A (en) | Glass container coating | |
| JP3059758B2 (ja) | 被覆ガラス製品 | |
| JP2017532281A (ja) | ガラス処理 | |
| SE452977B (sv) | Sett och anordning for bildning av en beleggning av en metall eller metallforening pa en yta av ett just format band av varmt glas | |
| PL179769B1 (pl) | S zyba do oszklen o wlasnosciach przeciwslonecznych i sposób wytwarzania szyby do oszklen o wlasnosciach przeciwslonecznych PL PL PL PL PL | |
| US20230202912A1 (en) | Method of making a reflective coated glass article |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM1K | Lapsed by not paying the annual fees |