NO20073497L - Vannfrie, rustfrie mikroelektroniske rengjoringssammensetninger med polymere korrosjonsinhibitorer - Google Patents
Vannfrie, rustfrie mikroelektroniske rengjoringssammensetninger med polymere korrosjonsinhibitorerInfo
- Publication number
- NO20073497L NO20073497L NO20073497A NO20073497A NO20073497L NO 20073497 L NO20073497 L NO 20073497L NO 20073497 A NO20073497 A NO 20073497A NO 20073497 A NO20073497 A NO 20073497A NO 20073497 L NO20073497 L NO 20073497L
- Authority
- NO
- Norway
- Prior art keywords
- cleaning compositions
- anhydrous
- stainless steel
- corrosion inhibitors
- microelectronic cleaning
- Prior art date
Links
- 238000004140 cleaning Methods 0.000 title abstract 3
- 239000000203 mixture Substances 0.000 title abstract 3
- 230000007797 corrosion Effects 0.000 title abstract 2
- 238000005260 corrosion Methods 0.000 title abstract 2
- 239000003112 inhibitor Substances 0.000 title 1
- 238000004377 microelectronic Methods 0.000 title 1
- 229910001220 stainless steel Inorganic materials 0.000 title 1
- 239000010935 stainless steel Substances 0.000 title 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 150000001412 amines Chemical class 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 125000000524 functional group Chemical group 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 239000003495 polar organic solvent Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/26—Organic compounds containing nitrogen
- C11D3/30—Amines; Substituted amines ; Quaternized amines
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/0005—Other compounding ingredients characterised by their effect
- C11D3/0073—Anticorrosion compositions
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/37—Polymers
- C11D3/3703—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C11D3/3723—Polyamines or polyalkyleneimines
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/37—Polymers
- C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C11D3/3753—Polyvinylalcohol; Ethers or esters thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US63494504P | 2004-12-10 | 2004-12-10 | |
PCT/US2005/002940 WO2006065256A1 (en) | 2004-12-10 | 2005-02-01 | Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors |
Publications (1)
Publication Number | Publication Date |
---|---|
NO20073497L true NO20073497L (no) | 2007-07-06 |
Family
ID=34960534
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20073497A NO20073497L (no) | 2004-12-10 | 2007-07-06 | Vannfrie, rustfrie mikroelektroniske rengjoringssammensetninger med polymere korrosjonsinhibitorer |
Country Status (17)
Country | Link |
---|---|
US (2) | US7947639B2 (zh) |
EP (1) | EP1828848B1 (zh) |
JP (1) | JP4272677B2 (zh) |
KR (1) | KR100744223B1 (zh) |
CN (1) | CN101076760B (zh) |
AT (1) | ATE463763T1 (zh) |
BR (1) | BRPI0518420A2 (zh) |
CA (1) | CA2591477A1 (zh) |
DE (1) | DE602005020499D1 (zh) |
IL (1) | IL183699A (zh) |
MY (1) | MY143658A (zh) |
NO (1) | NO20073497L (zh) |
PL (1) | PL1828848T3 (zh) |
PT (1) | PT1828848E (zh) |
TW (1) | TWI353380B (zh) |
WO (1) | WO2006065256A1 (zh) |
ZA (1) | ZA200704704B (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060064441A (ko) * | 2004-12-08 | 2006-06-13 | 말린크로트 베이커, 인코포레이티드 | 비수성 비부식성 마이크로전자 세정 조성물 |
JP4272677B2 (ja) * | 2004-12-10 | 2009-06-03 | マリンクロッド・ベイカー・インコーポレイテッド | ポリマー腐食阻害剤含有、非水性非腐食性マイクロエレクトロニクス洗浄組成物 |
KR101088568B1 (ko) * | 2005-04-19 | 2011-12-05 | 아반토르 퍼포먼스 머티리얼스, 인크. | 갈바닉 부식을 억제하는 비수성 포토레지스트 스트립퍼 |
CN101126053A (zh) * | 2006-08-17 | 2008-02-20 | 安集微电子(上海)有限公司 | 用于半导体工业中等离子刻蚀残留物的清洗液组合物 |
CN101959977B (zh) * | 2008-02-29 | 2013-12-04 | 安万托特性材料股份有限公司 | 微电子基底清洁组合物 |
SG188848A1 (en) * | 2008-03-07 | 2013-04-30 | Advanced Tech Materials | Non-selective oxide etch wet clean composition and method of use |
JP5305803B2 (ja) * | 2008-09-19 | 2013-10-02 | 株式会社カネカ | ポリエーテル類の製造方法 |
KR101579846B1 (ko) * | 2008-12-24 | 2015-12-24 | 주식회사 이엔에프테크놀로지 | 포토레지스트 패턴 제거용 조성물 및 이를 이용한 금속 패턴의 형성 방법 |
CA2753399A1 (en) * | 2009-02-25 | 2010-09-02 | Avantor Performance Materials, Inc. | Multipurpose acidic, organic solvent based microelectronic cleaning composition |
SG11201400840UA (en) | 2011-10-05 | 2014-04-28 | Avantor Performance Mat Inc | Microelectronic substrate cleaning compositions having copper/azole polymer inhibition |
CN102618900B (zh) * | 2012-04-14 | 2016-12-14 | 烟台恒迪克能源科技有限公司 | 一种三极管表面处理液及其制备方法 |
CN109971565B (zh) * | 2017-12-27 | 2021-10-22 | 安集微电子(上海)有限公司 | 一种含氟清洗液 |
JP2020094152A (ja) * | 2018-12-14 | 2020-06-18 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | 基板洗浄液、これを用いる洗浄された基板の製造方法およびデバイスの製造方法 |
WO2022093752A1 (en) * | 2020-10-26 | 2022-05-05 | Lsp Technologies, Inc. | System and method for in-process corrosion inhibition in laser peening |
CN113201743B (zh) * | 2021-04-08 | 2022-06-21 | 浙江工业大学 | 一种适用于电子器件的除锈剂及其制备方法 |
CN113921383B (zh) | 2021-09-14 | 2022-06-03 | 浙江奥首材料科技有限公司 | 一种铜表面钝化组合物、其用途及包含其的光刻胶剥离液 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60208752A (ja) | 1984-04-03 | 1985-10-21 | Asahi Glass Co Ltd | ホトレジスト剥離用組成物 |
IE59971B1 (en) | 1986-11-10 | 1994-05-04 | Baker J T Inc | Stripping compositions and their use for stripping resists from substrates |
CA2059867A1 (en) * | 1991-02-13 | 1992-08-14 | Miles Inc. | Binder and vehicle for inks and other color formulations |
US5561105A (en) | 1995-05-08 | 1996-10-01 | Ocg Microelectronic Materials, Inc. | Chelating reagent containing photoresist stripper composition |
JPH08311492A (ja) * | 1995-05-19 | 1996-11-26 | Yushiro Chem Ind Co Ltd | 水系洗浄剤組成物 |
JPH0934117A (ja) | 1995-07-21 | 1997-02-07 | Fuji Photo Film Co Ltd | 光重合性平版印刷版 |
US6268323B1 (en) * | 1997-05-05 | 2001-07-31 | Arch Specialty Chemicals, Inc. | Non-corrosive stripping and cleaning composition |
US6136714A (en) | 1998-12-17 | 2000-10-24 | Siemens Aktiengesellschaft | Methods for enhancing the metal removal rate during the chemical-mechanical polishing process of a semiconductor |
JP3891768B2 (ja) * | 1999-12-28 | 2007-03-14 | 株式会社トクヤマ | 残さ洗浄液 |
KR100522845B1 (ko) | 2000-09-01 | 2005-10-20 | 가부시끼가이샤 도꾸야마 | 잔류물 제거용 세정액 |
US6599370B2 (en) * | 2000-10-16 | 2003-07-29 | Mallinckrodt Inc. | Stabilized alkaline compositions for cleaning microelectronic substrates |
KR200241834Y1 (ko) * | 2001-05-14 | 2001-10-15 | 김경철 | 농업용 열풍보일러 |
CN100403169C (zh) * | 2001-07-13 | 2008-07-16 | Ekc技术公司 | 亚砜吡咯烷酮链烷醇胺剥离和清洗组合物 |
JP4639567B2 (ja) | 2001-09-28 | 2011-02-23 | 三菱瓦斯化学株式会社 | フォトレジスト剥離液組成物 |
JP2004101849A (ja) * | 2002-09-09 | 2004-04-02 | Mitsubishi Gas Chem Co Inc | 洗浄剤組成物 |
JP4272677B2 (ja) * | 2004-12-10 | 2009-06-03 | マリンクロッド・ベイカー・インコーポレイテッド | ポリマー腐食阻害剤含有、非水性非腐食性マイクロエレクトロニクス洗浄組成物 |
-
2005
- 2005-02-01 JP JP2006549713A patent/JP4272677B2/ja active Active
- 2005-02-01 US US11/719,690 patent/US7947639B2/en not_active Expired - Fee Related
- 2005-02-01 AT AT05712395T patent/ATE463763T1/de not_active IP Right Cessation
- 2005-02-01 PL PL05712395T patent/PL1828848T3/pl unknown
- 2005-02-01 CN CN200580042541XA patent/CN101076760B/zh not_active Expired - Fee Related
- 2005-02-01 DE DE602005020499T patent/DE602005020499D1/de active Active
- 2005-02-01 WO PCT/US2005/002940 patent/WO2006065256A1/en active Application Filing
- 2005-02-01 PT PT05712395T patent/PT1828848E/pt unknown
- 2005-02-01 BR BRPI0518420-7A patent/BRPI0518420A2/pt not_active IP Right Cessation
- 2005-02-01 EP EP05712395A patent/EP1828848B1/en not_active Not-in-force
- 2005-02-01 CA CA002591477A patent/CA2591477A1/en not_active Abandoned
- 2005-02-21 KR KR1020050014179A patent/KR100744223B1/ko not_active IP Right Cessation
- 2005-02-25 MY MYPI20050739A patent/MY143658A/en unknown
- 2005-03-23 TW TW094108992A patent/TWI353380B/zh not_active IP Right Cessation
-
2007
- 2007-06-05 IL IL183699A patent/IL183699A/en not_active IP Right Cessation
- 2007-06-08 ZA ZA200704704A patent/ZA200704704B/xx unknown
- 2007-07-06 NO NO20073497A patent/NO20073497L/no not_active Application Discontinuation
-
2011
- 2011-04-27 US US13/066,889 patent/US20110207645A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
ZA200704704B (en) | 2008-09-25 |
KR20060065412A (ko) | 2006-06-14 |
PT1828848E (pt) | 2010-05-21 |
KR100744223B1 (ko) | 2007-07-30 |
CN101076760B (zh) | 2010-12-22 |
WO2006065256A1 (en) | 2006-06-22 |
PL1828848T3 (pl) | 2010-09-30 |
CA2591477A1 (en) | 2006-06-22 |
US20090156453A1 (en) | 2009-06-18 |
TW200619379A (en) | 2006-06-16 |
DE602005020499D1 (de) | 2010-05-20 |
EP1828848A1 (en) | 2007-09-05 |
IL183699A (en) | 2012-10-31 |
BRPI0518420A2 (pt) | 2008-11-25 |
EP1828848B1 (en) | 2010-04-07 |
IL183699A0 (en) | 2007-09-20 |
US7947639B2 (en) | 2011-05-24 |
ATE463763T1 (de) | 2010-04-15 |
TWI353380B (en) | 2011-12-01 |
CN101076760A (zh) | 2007-11-21 |
JP2007514984A (ja) | 2007-06-07 |
MY143658A (en) | 2011-06-30 |
US20110207645A1 (en) | 2011-08-25 |
JP4272677B2 (ja) | 2009-06-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC2A | Withdrawal, rejection or dismissal of laid open patent application |