NO20023087L - Fremgangsmåte for fremstilling av kvartsdigler - Google Patents
Fremgangsmåte for fremstilling av kvartsdigler Download PDFInfo
- Publication number
- NO20023087L NO20023087L NO20023087A NO20023087A NO20023087L NO 20023087 L NO20023087 L NO 20023087L NO 20023087 A NO20023087 A NO 20023087A NO 20023087 A NO20023087 A NO 20023087A NO 20023087 L NO20023087 L NO 20023087L
- Authority
- NO
- Norway
- Prior art keywords
- gas
- atmosphere
- crucible
- mold
- desired gases
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 51
- 238000000034 method Methods 0.000 title claims description 40
- 239000010453 quartz Substances 0.000 title claims description 25
- 230000008569 process Effects 0.000 title description 6
- 239000007789 gas Substances 0.000 claims description 113
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 30
- 238000002844 melting Methods 0.000 claims description 28
- 230000008018 melting Effects 0.000 claims description 28
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 24
- 229910052757 nitrogen Inorganic materials 0.000 claims description 15
- 229910052786 argon Inorganic materials 0.000 claims description 13
- 239000001307 helium Substances 0.000 claims description 13
- 229910052734 helium Inorganic materials 0.000 claims description 13
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 13
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 10
- 239000001301 oxygen Substances 0.000 claims description 10
- 229910052760 oxygen Inorganic materials 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 9
- 238000012544 monitoring process Methods 0.000 claims description 8
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 6
- 238000010891 electric arc Methods 0.000 claims description 5
- 229910052754 neon Inorganic materials 0.000 claims description 5
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 5
- 239000012080 ambient air Substances 0.000 claims description 4
- 238000004320 controlled atmosphere Methods 0.000 claims description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 3
- 239000001569 carbon dioxide Substances 0.000 claims description 3
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 3
- 229910052743 krypton Inorganic materials 0.000 claims description 3
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052704 radon Inorganic materials 0.000 claims description 3
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052724 xenon Inorganic materials 0.000 claims description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 3
- 239000004576 sand Substances 0.000 description 19
- 239000013078 crystal Substances 0.000 description 17
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 239000003570 air Substances 0.000 description 9
- 239000000155 melt Substances 0.000 description 6
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 239000012634 fragment Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000002231 Czochralski process Methods 0.000 description 1
- 239000006004 Quartz sand Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000001932 seasonal effect Effects 0.000 description 1
- -1 silicon nitrides Chemical class 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
- C03B19/095—Other methods of shaping glass by fusing powdered glass in a shaping mould by centrifuging, e.g. arc discharge in rotating mould
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/697,904 US6502422B1 (en) | 2000-10-27 | 2000-10-27 | Method for quartz crucible fabrication |
| PCT/US2001/050770 WO2002060827A2 (fr) | 2000-10-27 | 2001-10-24 | Procede de fabrication de creuset en quartz |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NO20023087D0 NO20023087D0 (no) | 2002-06-26 |
| NO20023087L true NO20023087L (no) | 2002-08-26 |
Family
ID=24803067
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO20023087A NO20023087L (no) | 2000-10-27 | 2002-06-26 | Fremgangsmåte for fremstilling av kvartsdigler |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6502422B1 (fr) |
| EP (1) | EP1347945B1 (fr) |
| JP (1) | JP4133329B2 (fr) |
| KR (1) | KR100815656B1 (fr) |
| NO (1) | NO20023087L (fr) |
| TW (1) | TWI244467B (fr) |
| WO (1) | WO2002060827A2 (fr) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030226376A1 (en) * | 2002-06-10 | 2003-12-11 | General Electric Company | Fabrication of heavy walled silica tubing |
| US20060281623A1 (en) * | 2005-06-10 | 2006-12-14 | General Electric Company | Free-formed quartz glass ingots and method for making the same |
| US7625197B2 (en) | 2005-09-12 | 2009-12-01 | Johnson & Johnson Vision Care, Inc. | Devices and processes for performing degassing operations |
| EP2172432A4 (fr) * | 2007-07-28 | 2014-04-16 | Japan Super Quartz Corp | Procédé de fabrication d'un creuset en verre quartzeux et appareil de fabrication du creuset en verre quartzeux |
| DE102008026890B3 (de) * | 2008-06-05 | 2009-06-04 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren und Vorrichtung zur Herstellung eines Tiegels aus Quarzglas |
| US8272234B2 (en) * | 2008-12-19 | 2012-09-25 | Heraeus Shin-Etsu America, Inc. | Silica crucible with pure and bubble free inner crucible layer and method of making the same |
| GB0903017D0 (en) * | 2009-02-23 | 2009-04-08 | Ceravision Ltd | Plasma crucible sealing |
| US9003832B2 (en) * | 2009-11-20 | 2015-04-14 | Heraeus Shin-Etsu America, Inc. | Method of making a silica crucible in a controlled atmosphere |
| CN116081928A (zh) * | 2023-01-31 | 2023-05-09 | 宁夏鑫晶新材料科技有限公司 | 一种石英坩埚制备方法及石英坩埚 |
| CN116969669A (zh) * | 2023-08-07 | 2023-10-31 | 江苏亨芯石英科技有限公司 | 一种大尺寸红外合成石英材料的制备装置及方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3014311C2 (de) * | 1980-04-15 | 1982-06-16 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Verfahren zur Herstellung von Quarzglastiegeln und Vorrichtung zur Durchführung dieses Verfahrens |
| US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
| JP2561105B2 (ja) | 1987-12-15 | 1996-12-04 | 東芝セラミックス株式会社 | 石英ガラスルツボの製造方法 |
| US4897100A (en) * | 1989-01-13 | 1990-01-30 | Owens-Corning Fiberglas Corporation | Apparatus and process for fiberizing fluoride glasses using a double crucible and the compositions produced thereby |
| JP2866115B2 (ja) | 1989-09-25 | 1999-03-08 | 東芝セラミックス株式会社 | 石英ガラス容器の製造装置 |
| JP2830987B2 (ja) | 1994-07-19 | 1998-12-02 | 信越石英株式会社 | 石英ガラスルツボ及びその製造方法 |
| JP4285788B2 (ja) * | 1996-03-14 | 2009-06-24 | 信越石英株式会社 | 単結晶引き上げ用大口径石英るつぼの製造方法 |
| JP3625636B2 (ja) | 1998-01-08 | 2005-03-02 | 東芝セラミックス株式会社 | シリコン単結晶引上げ用石英ガラスルツボの製造方法 |
| US5913975A (en) | 1998-02-03 | 1999-06-22 | Memc Electronic Materials, Inc. | Crucible and method of preparation thereof |
-
2000
- 2000-10-27 US US09/697,904 patent/US6502422B1/en not_active Expired - Lifetime
-
2001
- 2001-10-23 TW TW090126174A patent/TWI244467B/zh not_active IP Right Cessation
- 2001-10-24 EP EP01994498A patent/EP1347945B1/fr not_active Expired - Lifetime
- 2001-10-24 JP JP2002560984A patent/JP4133329B2/ja not_active Expired - Lifetime
- 2001-10-24 KR KR1020027008317A patent/KR100815656B1/ko active IP Right Grant
- 2001-10-24 WO PCT/US2001/050770 patent/WO2002060827A2/fr active Application Filing
-
2002
- 2002-06-26 NO NO20023087A patent/NO20023087L/no not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| KR100815656B1 (ko) | 2008-03-20 |
| NO20023087D0 (no) | 2002-06-26 |
| EP1347945A2 (fr) | 2003-10-01 |
| TWI244467B (en) | 2005-12-01 |
| JP4133329B2 (ja) | 2008-08-13 |
| JP2004518601A (ja) | 2004-06-24 |
| WO2002060827A2 (fr) | 2002-08-08 |
| US6502422B1 (en) | 2003-01-07 |
| EP1347945B1 (fr) | 2013-03-27 |
| WO2002060827A3 (fr) | 2002-10-03 |
| KR20020081235A (ko) | 2002-10-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FC2A | Withdrawal, rejection or dismissal of laid open patent application |