NO133321B - - Google Patents
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- Publication number
- NO133321B NO133321B NO3221/72A NO322172A NO133321B NO 133321 B NO133321 B NO 133321B NO 3221/72 A NO3221/72 A NO 3221/72A NO 322172 A NO322172 A NO 322172A NO 133321 B NO133321 B NO 133321B
- Authority
- NO
- Norway
- Prior art keywords
- chlorosilane
- liquid
- separator
- chloride
- gas
- Prior art date
Links
- 238000000034 method Methods 0.000 claims abstract description 27
- 239000000203 mixture Substances 0.000 claims abstract description 20
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000005049 silicon tetrachloride Substances 0.000 claims abstract description 17
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims abstract description 5
- YPFNIPKMNMDDDB-UHFFFAOYSA-K 2-[2-[bis(carboxylatomethyl)amino]ethyl-(2-hydroxyethyl)amino]acetate;iron(3+) Chemical compound [Fe+3].OCCN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O YPFNIPKMNMDDDB-UHFFFAOYSA-K 0.000 claims abstract description 4
- PPDADIYYMSXQJK-UHFFFAOYSA-N trichlorosilicon Chemical compound Cl[Si](Cl)Cl PPDADIYYMSXQJK-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000005046 Chlorosilane Substances 0.000 claims description 47
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 47
- 239000007788 liquid Substances 0.000 claims description 32
- 239000007789 gas Substances 0.000 claims description 24
- 239000007787 solid Substances 0.000 claims description 24
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 20
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 19
- 229910000519 Ferrosilicon Inorganic materials 0.000 claims description 18
- 238000005406 washing Methods 0.000 claims description 13
- 239000012495 reaction gas Substances 0.000 claims description 12
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 11
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 10
- 238000006243 chemical reaction Methods 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- 230000007062 hydrolysis Effects 0.000 claims description 8
- 238000006460 hydrolysis reaction Methods 0.000 claims description 8
- 238000003860 storage Methods 0.000 claims description 8
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 7
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 7
- 239000013049 sediment Substances 0.000 claims description 7
- 238000004821 distillation Methods 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 238000000926 separation method Methods 0.000 claims description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
- 239000003513 alkali Substances 0.000 claims description 5
- 239000000460 chlorine Substances 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 238000001704 evaporation Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 5
- 150000004820 halides Chemical class 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 230000002140 halogenating effect Effects 0.000 claims description 4
- 238000005096 rolling process Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 3
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000000859 sublimation Methods 0.000 claims description 3
- 230000008022 sublimation Effects 0.000 claims description 3
- 238000010521 absorption reaction Methods 0.000 claims description 2
- 239000003039 volatile agent Substances 0.000 claims 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 26
- 238000001816 cooling Methods 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 239000000428 dust Substances 0.000 description 7
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000010802 sludge Substances 0.000 description 4
- 229910005347 FeSi Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000012320 chlorinating reagent Substances 0.000 description 2
- 238000005660 chlorination reaction Methods 0.000 description 2
- 238000004508 fractional distillation Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- 229910003818 SiH2Cl2 Inorganic materials 0.000 description 1
- 229910010062 TiCl3 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002956 ash Substances 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- -1 compound sodium aluminum chloride Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010411 cooking Methods 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 230000029142 excretion Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000010881 fly ash Substances 0.000 description 1
- 238000007038 hydrochlorination reaction Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2161641A DE2161641C3 (de) | 1971-12-11 | 1971-12-11 | Verfahren zur Herstellung von eisen-, aluminium- und titanfreiem Chlorsilan bei der Chlorierung oder Hydroborierung von Ferrosilicium |
Publications (2)
Publication Number | Publication Date |
---|---|
NO133321B true NO133321B (ja) | 1976-01-05 |
NO133321C NO133321C (ja) | 1976-04-12 |
Family
ID=5827746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO3221/72A NO133321C (ja) | 1971-12-11 | 1972-09-11 |
Country Status (15)
Country | Link |
---|---|
US (1) | US3878291A (ja) |
JP (1) | JPS5238518B2 (ja) |
BE (1) | BE792542A (ja) |
CA (1) | CA979620A (ja) |
CH (1) | CH584655A5 (ja) |
DE (1) | DE2161641C3 (ja) |
FR (1) | FR2162364B1 (ja) |
GB (1) | GB1407020A (ja) |
IT (1) | IT975490B (ja) |
NL (1) | NL165436C (ja) |
NO (1) | NO133321C (ja) |
RO (1) | RO64682A (ja) |
SE (1) | SE379032B (ja) |
SU (1) | SU988184A3 (ja) |
YU (1) | YU39163B (ja) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4043758A (en) * | 1973-03-06 | 1977-08-23 | Larco Societe Miniere Et Metallurgique De Larymna S.A. | Apparatus for the manufacture of metallic chlorides |
US4066424A (en) * | 1976-10-13 | 1978-01-03 | E. I. Du Pont De Nemours And Company | Selectively recovering metal chlorides from gaseous effluent |
DE3303903A1 (de) * | 1982-02-16 | 1983-08-25 | General Electric Co., Schenectady, N.Y. | Verfahren zum herstellen von trichlorsilan aus silizium |
US4743344A (en) * | 1986-03-26 | 1988-05-10 | Union Carbide Corporation | Treatment of wastes from high purity silicon process |
DE3642285C1 (de) * | 1986-12-11 | 1988-06-01 | Huels Troisdorf | Verfahren zur Aufarbeitung von Rueckstaenden einer Chlorsilan-Destillation |
US5182095A (en) * | 1987-12-16 | 1993-01-26 | Huls Troisdorf Aktiengesellschaft | Method for processing residues from the distillation of chlorosilanes |
DE3828344C1 (ja) * | 1988-08-20 | 1989-07-06 | Huels Ag, 4370 Marl, De | |
DE4033611A1 (de) * | 1990-10-23 | 1992-04-30 | Huels Chemische Werke Ag | Verfahren zur gewinnung von chloridarmer ofenasche bei der umsetzung von rohsilicium zu chlorsilanen |
DE4126670A1 (de) * | 1991-08-13 | 1993-02-18 | Huels Chemische Werke Ag | Verfahren zur abwasserfreien aufarbeitung von rueckstaenden einer chlorsilandestillation mit salzsaeure |
TW223109B (ja) * | 1991-09-17 | 1994-05-01 | Huels Chemische Werke Ag | |
DE10030251A1 (de) * | 2000-06-20 | 2002-01-03 | Degussa | Abtrennung von Metallchloriden aus gasförmigen Reaktionsgemischen der Chlorsilan-Synthese |
DE10057483B4 (de) * | 2000-11-20 | 2013-02-21 | Evonik Degussa Gmbh | Verfahren zur Entfernung von Aluminiumtrichlorid aus Chlorsilanen |
DE10061682A1 (de) | 2000-12-11 | 2002-07-04 | Solarworld Ag | Verfahren zur Herstellung von Reinstsilicium |
US20060183958A1 (en) * | 2003-04-01 | 2006-08-17 | Breneman William C | Process for the treatment of waste metal chlorides |
EP2105410B1 (en) * | 2008-03-24 | 2014-03-12 | Mitsubishi Materials Corporation | Chlorosilanes purifying apparatus and chlorosilanes purifying method |
US7736614B2 (en) * | 2008-04-07 | 2010-06-15 | Lord Ltd., Lp | Process for removing aluminum and other metal chlorides from chlorosilanes |
DE102008001577A1 (de) * | 2008-05-06 | 2009-11-12 | Wacker Chemie Ag | Verfahren zur Hydrolyse von festen Metallsalzen mit wässrigen Salzlösungen |
DE102008042936A1 (de) * | 2008-10-17 | 2010-04-22 | Wacker Chemie Ag | Verfahren zur Entfernung von Titan aus Hexachlordisilan |
DE102009020143A1 (de) * | 2009-05-04 | 2010-11-11 | Pv Silicon Forschungs- Und Produktionsgesellschaft Mbh | Verfahren zur Aufbereitung von Sägeabfällen zur Rückgewinnung von Silizium für die Herstellung von Solarsilizium |
EP2530052A1 (de) * | 2011-06-01 | 2012-12-05 | HEI Eco Technology | Verfahren zur Herstellung von Siliziumtetrachlorid und Verfahren zur Herstellung von Solarsilizium |
DE102012103755A1 (de) * | 2012-04-27 | 2013-10-31 | Centrotherm Sitec Gmbh | Verfahren zur Synthese von Trichlorsilan und Vorrichtung zur Durchführung dieses Verfahrens |
DE102012103756A1 (de) * | 2012-04-27 | 2013-10-31 | Centrotherm Sitec Gmbh | Verfahren zur Absenkung einer in einem Trichlorsilansynthesereaktor vorherrschenden Temperatur sowie Vorrichtung zur Durchführung dieses Verfahrens |
DE112014002024T5 (de) * | 2013-04-19 | 2016-01-14 | Rec Silicon Inc | Verringerung von Korrosion und von Fouling bei der Herstellung von Hydrochlorosilanen |
CN109231217B (zh) * | 2018-10-17 | 2023-10-31 | 中国恩菲工程技术有限公司 | 氯硅烷残液急冷除金属氯化物的系统和方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2594370A (en) * | 1947-05-14 | 1952-04-29 | Diamond Alkali Co | Method of separating metal halides |
US2718279A (en) * | 1952-12-18 | 1955-09-20 | Du Pont | Process for condensing vaporized metal halides |
US2849083A (en) * | 1957-01-31 | 1958-08-26 | American Cyanamid Co | Separation of iron chloride from gaseous iron chloride-titanium tetrachloride mixtures |
GB963745A (en) * | 1961-01-05 | 1964-07-15 | British Titan Products | Halogenation of silicon-containing materials |
CH412345A (de) * | 1961-01-31 | 1966-04-30 | Weisse Ernst Ing Dr | Verfahren und Vorrichtung zum Abscheiden schädlicher Bestandteile aus den bei der Behandlung von Leichtmetallschmelzen mit Chlor oder chlorhaltigen Gasen entstehenden Abgasen |
DE1567469B1 (de) * | 1966-12-02 | 1970-08-27 | Degussa | Verfahren zur gleichzeitigen Abtrennung von Aluminiumchlorid und Titantetrachlorid aus den bei der Chlorierung oder Hydrochlorierung von Silicium anfallenden Reaktionsgasen |
DE1667195C3 (de) * | 1968-01-31 | 1979-09-27 | Metallgesellschaft Ag, 6000 Frankfurt | Verfahren zur Herstellung von Halogenwasserstoffsäuren und von Metalloxiden |
-
0
- BE BE792542D patent/BE792542A/xx not_active IP Right Cessation
-
1971
- 1971-12-11 DE DE2161641A patent/DE2161641C3/de not_active Expired
-
1972
- 1972-09-11 NO NO3221/72A patent/NO133321C/no unknown
- 1972-09-11 SU SU721826746A patent/SU988184A3/ru active
- 1972-09-20 NL NL7212721.A patent/NL165436C/xx not_active IP Right Cessation
- 1972-10-04 US US294924A patent/US3878291A/en not_active Expired - Lifetime
- 1972-10-06 YU YU02504/72A patent/YU39163B/xx unknown
- 1972-10-30 FR FR7238456A patent/FR2162364B1/fr not_active Expired
- 1972-11-08 IT IT70507/72A patent/IT975490B/it active
- 1972-12-08 SE SE7216069A patent/SE379032B/xx unknown
- 1972-12-11 GB GB5708472A patent/GB1407020A/en not_active Expired
- 1972-12-11 JP JP47124232A patent/JPS5238518B2/ja not_active Expired
- 1972-12-11 CA CA158,563A patent/CA979620A/en not_active Expired
- 1972-12-11 RO RO7273110A patent/RO64682A/ro unknown
- 1972-12-11 CH CH1795372A patent/CH584655A5/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
NL7212721A (ja) | 1973-06-13 |
DE2161641C3 (de) | 1974-05-16 |
BE792542A (fr) | 1973-03-30 |
NO133321C (ja) | 1976-04-12 |
DE2161641A1 (de) | 1973-06-28 |
NL165436C (nl) | 1981-04-15 |
GB1407020A (en) | 1975-09-24 |
YU250472A (en) | 1982-05-31 |
US3878291A (en) | 1975-04-15 |
YU39163B (en) | 1984-08-31 |
NL165436B (nl) | 1980-11-17 |
RO64682A (ro) | 1980-06-15 |
CH584655A5 (ja) | 1977-02-15 |
CA979620A (en) | 1975-12-16 |
DE2161641B2 (de) | 1973-10-04 |
SE379032B (ja) | 1975-09-22 |
FR2162364A1 (ja) | 1973-07-20 |
FR2162364B1 (ja) | 1979-04-06 |
JPS4866097A (ja) | 1973-09-11 |
IT975490B (it) | 1974-07-20 |
SU988184A3 (ru) | 1983-01-07 |
JPS5238518B2 (ja) | 1977-09-29 |
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