NL9201211A - Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. - Google Patents
Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. Download PDFInfo
- Publication number
- NL9201211A NL9201211A NL9201211A NL9201211A NL9201211A NL 9201211 A NL9201211 A NL 9201211A NL 9201211 A NL9201211 A NL 9201211A NL 9201211 A NL9201211 A NL 9201211A NL 9201211 A NL9201211 A NL 9201211A
- Authority
- NL
- Netherlands
- Prior art keywords
- semiconductor material
- gas
- treatment space
- wafer
- table part
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Constitution Of High-Frequency Heating (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL9201211A NL9201211A (nl) | 1992-07-07 | 1992-07-07 | Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. |
JP6502966A JPH07502381A (ja) | 1992-07-07 | 1993-07-07 | 半導体材料のウェハを処理するための装置および方法 |
AT93915843T ATE159056T1 (de) | 1992-07-07 | 1993-07-07 | Vorrichtung und verfahren zur behandlung eines wafers aus halbleiter-werkstoff |
ES93915843T ES2107672T3 (es) | 1992-07-07 | 1993-07-07 | Aparato y metodo para tratar una oblea de material semiconductor. |
DE69314465T DE69314465T2 (de) | 1992-07-07 | 1993-07-07 | Vorrichtung und verfahren zur behandlung eines wafers aus halbleiter-werkstoff |
EP93915843A EP0614497B1 (en) | 1992-07-07 | 1993-07-07 | Apparatus and method for treating a wafer of semiconductor material |
DK93915843.2T DK0614497T3 (da) | 1992-07-07 | 1993-07-07 | Apparat og fremgangsmåde til behandling af en wafer af halvledermateriale |
PCT/EP1993/001779 WO1994001597A1 (en) | 1992-07-07 | 1993-07-07 | Apparatus and method for treating a wafer of semiconductor material |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL9201211A NL9201211A (nl) | 1992-07-07 | 1992-07-07 | Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. |
NL9201211 | 1992-07-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL9201211A true NL9201211A (nl) | 1994-02-01 |
Family
ID=19861026
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL9201211A NL9201211A (nl) | 1992-07-07 | 1992-07-07 | Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0614497B1 (es) |
JP (1) | JPH07502381A (es) |
AT (1) | ATE159056T1 (es) |
DE (1) | DE69314465T2 (es) |
DK (1) | DK0614497T3 (es) |
ES (1) | ES2107672T3 (es) |
NL (1) | NL9201211A (es) |
WO (1) | WO1994001597A1 (es) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5800686A (en) * | 1993-04-05 | 1998-09-01 | Applied Materials, Inc. | Chemical vapor deposition chamber with substrate edge protection |
EP0746874A1 (en) * | 1994-02-23 | 1996-12-11 | Applied Materials, Inc. | Chemical vapor deposition chamber |
US6210483B1 (en) | 1997-12-02 | 2001-04-03 | Applied Materials, Inc. | Anti-notch thinning heater |
US6222161B1 (en) | 1998-01-12 | 2001-04-24 | Tokyo Electron Limited | Heat treatment apparatus |
JP3555734B2 (ja) * | 1998-03-24 | 2004-08-18 | 大日本スクリーン製造株式会社 | 基板加熱処理装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57110665A (en) * | 1980-12-26 | 1982-07-09 | Seiko Epson Corp | Heating mechanism for vacuum apparatus |
US5060354A (en) * | 1990-07-02 | 1991-10-29 | George Chizinsky | Heated plate rapid thermal processor |
US5133284A (en) * | 1990-07-16 | 1992-07-28 | National Semiconductor Corp. | Gas-based backside protection during substrate processing |
-
1992
- 1992-07-07 NL NL9201211A patent/NL9201211A/nl active Search and Examination
-
1993
- 1993-07-07 AT AT93915843T patent/ATE159056T1/de not_active IP Right Cessation
- 1993-07-07 ES ES93915843T patent/ES2107672T3/es not_active Expired - Lifetime
- 1993-07-07 EP EP93915843A patent/EP0614497B1/en not_active Expired - Lifetime
- 1993-07-07 DK DK93915843.2T patent/DK0614497T3/da active
- 1993-07-07 WO PCT/EP1993/001779 patent/WO1994001597A1/en active IP Right Grant
- 1993-07-07 DE DE69314465T patent/DE69314465T2/de not_active Expired - Fee Related
- 1993-07-07 JP JP6502966A patent/JPH07502381A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
WO1994001597A1 (en) | 1994-01-20 |
EP0614497B1 (en) | 1997-10-08 |
ATE159056T1 (de) | 1997-10-15 |
EP0614497A1 (en) | 1994-09-14 |
ES2107672T3 (es) | 1997-12-01 |
DE69314465T2 (de) | 1998-02-12 |
DK0614497T3 (da) | 1998-05-18 |
DE69314465D1 (de) | 1997-11-13 |
JPH07502381A (ja) | 1995-03-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A1B | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
BN | A decision not to publish the application has become irrevocable |