ES2107672T3 - Aparato y metodo para tratar una oblea de material semiconductor. - Google Patents
Aparato y metodo para tratar una oblea de material semiconductor.Info
- Publication number
- ES2107672T3 ES2107672T3 ES93915843T ES93915843T ES2107672T3 ES 2107672 T3 ES2107672 T3 ES 2107672T3 ES 93915843 T ES93915843 T ES 93915843T ES 93915843 T ES93915843 T ES 93915843T ES 2107672 T3 ES2107672 T3 ES 2107672T3
- Authority
- ES
- Spain
- Prior art keywords
- wafer
- semiconductor material
- treatment space
- treating
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Constitution Of High-Frequency Heating (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
LA PRESENTE INVENCION PROPORCIONA UN DISPOSITIVO PARA TRATAR UNA OBLEA DE MATERIAL SEMICONDUCTOR A UNA DETERMINADA TEMPERATURA CON GAS Y/O VAPOR, QUE COMPRENDE: UNA ESCLUSA (7) DE SUMINISTRO PARA SUMINISTRAR UNA OBLEA (W) DE MATERIAL SEMICONDUCTOR; UN ESPACIO (9) DE TRATAMIENTO EN EL CUAL PUEDE SER COLOCADA UNA OBLEA DE MATERIAL SEMICONDUCTOR A TRAVES DE LA ESCLUSA DE SUMINISTRO; UNA ENTRADA (13) DE GAS PARA ADMINISTRAR GAS Y/O VAPOR DENTRO DEL ESPACIO DE TRATAMIENTO; MEDIOS DE BOMBA PARA LLEVAR AL ESPACIO DE TRATAMIENTO, Y MANTENERLO, A SOBREPRESION, Y UNA PARTE (11) DE MESA PARA SOPORTAR LA OBLEA DE MATERIAL SEMICONDUCTOR QUE TIENE UNA MASA RELATIVA A LAS PARTES QUE LA RODEAN, TAL QUE DURANTE EL TRATAMIENTO PREVALECE UNA TEMPERATURA APROXIMADAMENTE CONSTANTE EN EL ESPACIO DE TRATAMIENTO.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL9201211A NL9201211A (nl) | 1992-07-07 | 1992-07-07 | Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2107672T3 true ES2107672T3 (es) | 1997-12-01 |
Family
ID=19861026
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES93915843T Expired - Lifetime ES2107672T3 (es) | 1992-07-07 | 1993-07-07 | Aparato y metodo para tratar una oblea de material semiconductor. |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0614497B1 (es) |
JP (1) | JPH07502381A (es) |
AT (1) | ATE159056T1 (es) |
DE (1) | DE69314465T2 (es) |
DK (1) | DK0614497T3 (es) |
ES (1) | ES2107672T3 (es) |
NL (1) | NL9201211A (es) |
WO (1) | WO1994001597A1 (es) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5800686A (en) * | 1993-04-05 | 1998-09-01 | Applied Materials, Inc. | Chemical vapor deposition chamber with substrate edge protection |
EP0746874A1 (en) * | 1994-02-23 | 1996-12-11 | Applied Materials, Inc. | Chemical vapor deposition chamber |
US6210483B1 (en) | 1997-12-02 | 2001-04-03 | Applied Materials, Inc. | Anti-notch thinning heater |
US6222161B1 (en) | 1998-01-12 | 2001-04-24 | Tokyo Electron Limited | Heat treatment apparatus |
JP3555734B2 (ja) * | 1998-03-24 | 2004-08-18 | 大日本スクリーン製造株式会社 | 基板加熱処理装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57110665A (en) * | 1980-12-26 | 1982-07-09 | Seiko Epson Corp | Heating mechanism for vacuum apparatus |
US5060354A (en) * | 1990-07-02 | 1991-10-29 | George Chizinsky | Heated plate rapid thermal processor |
US5133284A (en) * | 1990-07-16 | 1992-07-28 | National Semiconductor Corp. | Gas-based backside protection during substrate processing |
-
1992
- 1992-07-07 NL NL9201211A patent/NL9201211A/nl active Search and Examination
-
1993
- 1993-07-07 AT AT93915843T patent/ATE159056T1/de not_active IP Right Cessation
- 1993-07-07 ES ES93915843T patent/ES2107672T3/es not_active Expired - Lifetime
- 1993-07-07 EP EP93915843A patent/EP0614497B1/en not_active Expired - Lifetime
- 1993-07-07 DK DK93915843.2T patent/DK0614497T3/da active
- 1993-07-07 WO PCT/EP1993/001779 patent/WO1994001597A1/en active IP Right Grant
- 1993-07-07 DE DE69314465T patent/DE69314465T2/de not_active Expired - Fee Related
- 1993-07-07 JP JP6502966A patent/JPH07502381A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
WO1994001597A1 (en) | 1994-01-20 |
EP0614497B1 (en) | 1997-10-08 |
ATE159056T1 (de) | 1997-10-15 |
EP0614497A1 (en) | 1994-09-14 |
NL9201211A (nl) | 1994-02-01 |
DE69314465T2 (de) | 1998-02-12 |
DK0614497T3 (da) | 1998-05-18 |
DE69314465D1 (de) | 1997-11-13 |
JPH07502381A (ja) | 1995-03-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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