SE8200235L - Forfarande och apparat for kemisk angavsettning av filmer pa kiselskivor - Google Patents

Forfarande och apparat for kemisk angavsettning av filmer pa kiselskivor

Info

Publication number
SE8200235L
SE8200235L SE8200235A SE8200235A SE8200235L SE 8200235 L SE8200235 L SE 8200235L SE 8200235 A SE8200235 A SE 8200235A SE 8200235 A SE8200235 A SE 8200235A SE 8200235 L SE8200235 L SE 8200235L
Authority
SE
Sweden
Prior art keywords
wafers
enclosure
evacuated
vacuum pump
supported
Prior art date
Application number
SE8200235A
Other languages
English (en)
Inventor
C J Zaferes
Original Assignee
Advanced Crystal Sciences Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Crystal Sciences Inc filed Critical Advanced Crystal Sciences Inc
Publication of SE8200235L publication Critical patent/SE8200235L/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/10—Heating of the reaction chamber or the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45506—Turbulent flow
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/935—Gas flow control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Chemical Vapour Deposition (AREA)
SE8200235A 1980-05-16 1982-01-18 Forfarande och apparat for kemisk angavsettning av filmer pa kiselskivor SE8200235L (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/150,555 US4309240A (en) 1980-05-16 1980-05-16 Process for chemical vapor deposition of films on silicon wafers

Publications (1)

Publication Number Publication Date
SE8200235L true SE8200235L (sv) 1982-01-18

Family

ID=22535068

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8200235A SE8200235L (sv) 1980-05-16 1982-01-18 Forfarande och apparat for kemisk angavsettning av filmer pa kiselskivor

Country Status (12)

Country Link
US (2) US4309240A (sv)
EP (1) EP0051677A4 (sv)
JP (1) JPS57500906A (sv)
KR (2) KR830006481A (sv)
CH (1) CH657632A5 (sv)
DE (1) DE3148620C2 (sv)
GB (1) GB2085422B (sv)
IE (1) IE51091B1 (sv)
IT (1) IT1221829B (sv)
NL (1) NL8120209A (sv)
SE (1) SE8200235L (sv)
WO (1) WO1981003348A1 (sv)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1158109A (en) * 1981-01-14 1983-12-06 George M. Jenkins Coating of semiconductor wafers and apparatus therefor
US4609424A (en) * 1981-05-22 1986-09-02 United Technologies Corporation Plasma enhanced deposition of semiconductors
US4547404A (en) * 1982-08-27 1985-10-15 Anicon, Inc. Chemical vapor deposition process
US4696833A (en) * 1982-08-27 1987-09-29 Hewlett-Packard Company Method for applying a uniform coating to integrated circuit wafers by means of chemical deposition
US4545327A (en) * 1982-08-27 1985-10-08 Anicon, Inc. Chemical vapor deposition apparatus
US4539933A (en) * 1983-08-31 1985-09-10 Anicon, Inc. Chemical vapor deposition apparatus
EP0140791A1 (en) * 1983-10-28 1985-05-08 B T U Engineering Corporation Apparatus for providing uniform thickness CVD thin-film on semiconductor substrates
NL8401233A (nl) * 1984-04-17 1985-11-18 Philips Nv Werkwijze voor het vervaardigen van halfgeleiderinrichtingen waarbij materiaal uit een reaktiegas wordt afgescheiden en een inrichting voor het uitvoeren van een dergelijke werkwijze.
FR2589887B1 (fr) * 1985-11-14 1988-10-07 Semy Engineering Procede et reacteur de depot de couches de siliciure
US4900525A (en) * 1986-08-25 1990-02-13 Gte Laboratories Incorporated Chemical vapor deposition reactor for producing metal carbide or nitride whiskers
US5246536A (en) * 1986-09-08 1993-09-21 Research Development Corporation Of Japan Method for growing single crystal thin films of element semiconductor
US4976996A (en) * 1987-02-17 1990-12-11 Lam Research Corporation Chemical vapor deposition reactor and method of use thereof
US4854266A (en) * 1987-11-02 1989-08-08 Btu Engineering Corporation Cross-flow diffusion furnace
KR950024302A (ko) * 1994-01-06 1995-08-21 빈센트 비. 인그라시아 반도체 구조체 및 반도체 구조체 제조 방법
FI100409B (sv) 1994-11-28 1997-11-28 Asm Int Förfarande och anläggning för framställning av tunnfilmer
FI97730C (sv) * 1994-11-28 1997-02-10 Mikrokemia Oy Anordning för framställning av tunnfilmer
JP3698885B2 (ja) * 1998-02-18 2005-09-21 富士通株式会社 強誘電体膜を用いた装置の製造方法
KR100319494B1 (ko) * 1999-07-15 2002-01-09 김용일 원자층 에피택시 공정을 위한 반도체 박막 증착장치
KR100757552B1 (ko) * 2000-07-25 2007-09-10 동경 엘렉트론 주식회사 열처리장치, 열처리방법 및 기록매체
US20050098107A1 (en) * 2003-09-24 2005-05-12 Du Bois Dale R. Thermal processing system with cross-flow liner
JP5109376B2 (ja) * 2007-01-22 2012-12-26 東京エレクトロン株式会社 加熱装置、加熱方法及び記憶媒体
JP4535116B2 (ja) * 2007-10-31 2010-09-01 株式会社デンソー 炭化珪素単結晶の製造装置および製造方法
KR101431197B1 (ko) * 2008-01-24 2014-09-17 삼성전자주식회사 원자층 증착설비 및 그의 원자층 증착방법
US8715789B2 (en) * 2009-12-18 2014-05-06 Sub-One Technology, Inc. Chemical vapor deposition for an interior of a hollow article with high aspect ratio

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6513397A (sv) * 1964-11-02 1966-05-03 Siemens Ag
US3637434A (en) * 1968-11-07 1972-01-25 Nippon Electric Co Vapor deposition apparatus
US3753809A (en) * 1970-01-09 1973-08-21 Ibm Method for obtaining optimum phosphorous concentration in semiconductor wafers
JPS4829810U (sv) * 1971-08-14 1973-04-12
JPS4895186A (sv) * 1972-03-14 1973-12-06
FR2251370B1 (sv) * 1973-11-15 1978-12-01 Radiotechnique Compelec
JPS5436279Y2 (sv) * 1974-10-15 1979-11-02
US4108106A (en) * 1975-12-29 1978-08-22 Tylan Corporation Cross-flow reactor
US4062318A (en) * 1976-11-19 1977-12-13 Rca Corporation Apparatus for chemical vapor deposition
US4211182A (en) * 1978-05-05 1980-07-08 Rca Corporation Diffusion apparatus
US4220116A (en) * 1978-10-30 1980-09-02 Burroughs Corporation Reactant gas flow structure for a low pressure chemical vapor deposition system
US4203387A (en) * 1978-12-28 1980-05-20 General Signal Corporation Cage for low pressure silicon dioxide deposition reactors
US4256053A (en) * 1979-08-17 1981-03-17 Dozier Alfred R Chemical vapor reaction system
FR2463819A1 (fr) * 1979-08-21 1981-02-27 Thomson Csf Reacteur de depot chimique en phase vapeur fonctionnant sous basse pression

Also Published As

Publication number Publication date
GB2085422A (en) 1982-04-28
EP0051677A1 (en) 1982-05-19
JPS57500906A (sv) 1982-05-20
WO1981003348A1 (en) 1981-11-26
DE3148620T1 (de) 1982-09-23
DE3148620C2 (de) 1986-05-28
IE51091B1 (en) 1986-10-01
IT8183382A0 (it) 1981-05-15
GB2085422B (en) 1984-05-16
US4443410A (en) 1984-04-17
CH657632A5 (de) 1986-09-15
IT1221829B (it) 1990-07-12
KR830006481A (ko) 1983-09-24
KR840002182Y1 (ko) 1984-10-23
NL8120209A (sv) 1982-04-01
EP0051677A4 (en) 1982-10-07
IE811017L (en) 1981-11-16
US4309240A (en) 1982-01-05

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