NL9201211A - Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. - Google Patents

Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. Download PDF

Info

Publication number
NL9201211A
NL9201211A NL9201211A NL9201211A NL9201211A NL 9201211 A NL9201211 A NL 9201211A NL 9201211 A NL9201211 A NL 9201211A NL 9201211 A NL9201211 A NL 9201211A NL 9201211 A NL9201211 A NL 9201211A
Authority
NL
Netherlands
Prior art keywords
semiconductor material
gas
treatment space
wafer
table part
Prior art date
Application number
NL9201211A
Other languages
English (en)
Dutch (nl)
Original Assignee
Cobrain Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cobrain Nv filed Critical Cobrain Nv
Priority to NL9201211A priority Critical patent/NL9201211A/nl
Priority to ES93915843T priority patent/ES2107672T3/es
Priority to DE69314465T priority patent/DE69314465T2/de
Priority to PCT/EP1993/001779 priority patent/WO1994001597A1/en
Priority to DK93915843.2T priority patent/DK0614497T3/da
Priority to JP6502966A priority patent/JPH07502381A/ja
Priority to AT93915843T priority patent/ATE159056T1/de
Priority to EP93915843A priority patent/EP0614497B1/de
Publication of NL9201211A publication Critical patent/NL9201211A/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constitution Of High-Frequency Heating (AREA)
NL9201211A 1992-07-07 1992-07-07 Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal. NL9201211A (nl)

Priority Applications (8)

Application Number Priority Date Filing Date Title
NL9201211A NL9201211A (nl) 1992-07-07 1992-07-07 Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal.
ES93915843T ES2107672T3 (es) 1992-07-07 1993-07-07 Aparato y metodo para tratar una oblea de material semiconductor.
DE69314465T DE69314465T2 (de) 1992-07-07 1993-07-07 Vorrichtung und verfahren zur behandlung eines wafers aus halbleiter-werkstoff
PCT/EP1993/001779 WO1994001597A1 (en) 1992-07-07 1993-07-07 Apparatus and method for treating a wafer of semiconductor material
DK93915843.2T DK0614497T3 (da) 1992-07-07 1993-07-07 Apparat og fremgangsmåde til behandling af en wafer af halvledermateriale
JP6502966A JPH07502381A (ja) 1992-07-07 1993-07-07 半導体材料のウェハを処理するための装置および方法
AT93915843T ATE159056T1 (de) 1992-07-07 1993-07-07 Vorrichtung und verfahren zur behandlung eines wafers aus halbleiter-werkstoff
EP93915843A EP0614497B1 (de) 1992-07-07 1993-07-07 Vorrichtung und verfahren zur behandlung eines wafers aus halbleiter-werkstoff

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL9201211A NL9201211A (nl) 1992-07-07 1992-07-07 Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal.
NL9201211 1992-07-07

Publications (1)

Publication Number Publication Date
NL9201211A true NL9201211A (nl) 1994-02-01

Family

ID=19861026

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9201211A NL9201211A (nl) 1992-07-07 1992-07-07 Inrichting en werkwijze voor het behandelen van een plak halfgeleider-materiaal.

Country Status (8)

Country Link
EP (1) EP0614497B1 (de)
JP (1) JPH07502381A (de)
AT (1) ATE159056T1 (de)
DE (1) DE69314465T2 (de)
DK (1) DK0614497T3 (de)
ES (1) ES2107672T3 (de)
NL (1) NL9201211A (de)
WO (1) WO1994001597A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5800686A (en) * 1993-04-05 1998-09-01 Applied Materials, Inc. Chemical vapor deposition chamber with substrate edge protection
JP4108119B2 (ja) * 1994-02-23 2008-06-25 アプライド マテリアルズ， インコーポレイテッド 改良型化学気相堆積チャンバ
US6210483B1 (en) 1997-12-02 2001-04-03 Applied Materials, Inc. Anti-notch thinning heater
US6222161B1 (en) 1998-01-12 2001-04-24 Tokyo Electron Limited Heat treatment apparatus
JP3555734B2 (ja) * 1998-03-24 2004-08-18 大日本スクリーン製造株式会社 基板加熱処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57110665A (en) * 1980-12-26 1982-07-09 Seiko Epson Corp Heating mechanism for vacuum apparatus
US5060354A (en) * 1990-07-02 1991-10-29 George Chizinsky Heated plate rapid thermal processor
US5133284A (en) * 1990-07-16 1992-07-28 National Semiconductor Corp. Gas-based backside protection during substrate processing

Also Published As

Publication number Publication date
DK0614497T3 (da) 1998-05-18
EP0614497B1 (de) 1997-10-08
ES2107672T3 (es) 1997-12-01
WO1994001597A1 (en) 1994-01-20
JPH07502381A (ja) 1995-03-09
ATE159056T1 (de) 1997-10-15
DE69314465D1 (de) 1997-11-13
DE69314465T2 (de) 1998-02-12
EP0614497A1 (de) 1994-09-14

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Legal Events

Date Code Title Description
A1B A search report has been drawn up
BC A request for examination has been filed
BN A decision not to publish the application has become irrevocable