NL8701718A - Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal. - Google Patents
Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal. Download PDFInfo
- Publication number
- NL8701718A NL8701718A NL8701718A NL8701718A NL8701718A NL 8701718 A NL8701718 A NL 8701718A NL 8701718 A NL8701718 A NL 8701718A NL 8701718 A NL8701718 A NL 8701718A NL 8701718 A NL8701718 A NL 8701718A
- Authority
- NL
- Netherlands
- Prior art keywords
- composition
- oxidic
- substrate
- superconductive
- layer
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000004020 conductor Substances 0.000 title 1
- 239000000463 material Substances 0.000 claims abstract description 43
- 239000000203 mixture Substances 0.000 claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 23
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 239000004332 silver Substances 0.000 claims description 7
- 238000000059 patterning Methods 0.000 claims description 4
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 239000010970 precious metal Substances 0.000 claims description 2
- 238000011282 treatment Methods 0.000 abstract description 3
- 239000000126 substance Substances 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 33
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/73—Vacuum treating or coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S505/00—Superconductor technology: apparatus, material, process
- Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
- Y10S505/742—Annealing
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8701718A NL8701718A (nl) | 1987-07-21 | 1987-07-21 | Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal. |
| AT88201513T ATE98401T1 (de) | 1987-07-21 | 1988-07-14 | Verfahren zum anbringen duenner schichten aus oxidischem supraleitendem material. |
| EP88201513A EP0300567B1 (de) | 1987-07-21 | 1988-07-14 | Verfahren zum Anbringen dünner Schichten aus oxidischem supraleitendem Material |
| DE3886115T DE3886115T2 (de) | 1987-07-21 | 1988-07-14 | Verfahren zum Anbringen dünner Schichten aus oxidischem supraleitendem Material. |
| US07/219,519 US4900709A (en) | 1987-07-21 | 1988-07-15 | Method of patterning superconducting oxide thin films |
| KR1019880008925A KR970005156B1 (ko) | 1987-07-21 | 1988-07-18 | 산화 초전도 물질 코팅방법 |
| SU884356188A SU1738104A3 (ru) | 1987-07-21 | 1988-07-18 | Способ изготовлени сверхпровод щего устройства планарного типа |
| JP63180451A JPS6441282A (en) | 1987-07-21 | 1988-07-21 | Method of depositing superconducting oxide material thin layer |
| US07/292,676 US4957899A (en) | 1987-07-21 | 1989-01-03 | Method of patterning superconducting oxide thin films |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8701718A NL8701718A (nl) | 1987-07-21 | 1987-07-21 | Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal. |
| NL8701718 | 1987-07-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8701718A true NL8701718A (nl) | 1989-02-16 |
Family
ID=19850351
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8701718A NL8701718A (nl) | 1987-07-21 | 1987-07-21 | Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal. |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US4900709A (de) |
| EP (1) | EP0300567B1 (de) |
| JP (1) | JPS6441282A (de) |
| KR (1) | KR970005156B1 (de) |
| AT (1) | ATE98401T1 (de) |
| DE (1) | DE3886115T2 (de) |
| NL (1) | NL8701718A (de) |
| SU (1) | SU1738104A3 (de) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0301689B1 (de) * | 1987-07-27 | 1993-09-29 | Ovonic Synthetic Materials Company, Inc. | Verfahren zum Stabilisieren eines hoch-Tc-supraleitenden Materials und so stabilisiertes Material |
| JPS6457438A (en) * | 1987-08-28 | 1989-03-03 | Mitsubishi Electric Corp | Recording medium |
| JPH01171247A (ja) * | 1987-12-25 | 1989-07-06 | Mitsubishi Metal Corp | 超伝導体配線の構造 |
| GB2215548B (en) * | 1988-02-26 | 1991-10-23 | Gen Electric Co Plc | A method of fabricating superconducting electronic devices |
| JPH0244784A (ja) * | 1988-08-05 | 1990-02-14 | Canon Inc | 超伝導パターンの形成方法 |
| US5246916A (en) * | 1989-03-22 | 1993-09-21 | Sri International | Method of forming shaped superconductor materials by electrophoretic deposition of superconductor particulate coated with fusible binder |
| US5229360A (en) * | 1989-07-24 | 1993-07-20 | The Furukawa Electric Co., Ltd. | Method for forming a multilayer superconducting circuit |
| US5135908A (en) * | 1989-08-07 | 1992-08-04 | The Trustees Of Columbia University In The City Of New York | Method of patterning superconducting films |
| EP0450394A3 (de) * | 1990-03-20 | 1991-10-23 | Fujitsu Limited | Verfahren und Vorrichtung zur Herstellung von supraleitenden Schichten |
| CA2054796C (en) * | 1990-11-01 | 1999-01-19 | Hiroshi Inada | Superconducting wiring lines and process for fabricating the same |
| JPH0697522A (ja) * | 1990-11-30 | 1994-04-08 | Internatl Business Mach Corp <Ibm> | 超伝導材料の薄膜の製造方法 |
| US5252551A (en) * | 1991-12-27 | 1993-10-12 | The United States Of America As Represented By The Department Of Energy | Superconducting composite with multilayer patterns and multiple buffer layers |
| US5593918A (en) * | 1994-04-22 | 1997-01-14 | Lsi Logic Corporation | Techniques for forming superconductive lines |
| JP3076503B2 (ja) * | 1994-12-08 | 2000-08-14 | 株式会社日立製作所 | 超電導素子およびその製造方法 |
| DE102006030787B4 (de) * | 2006-06-30 | 2008-11-27 | Zenergy Power Gmbh | Negativstrukturierung von Dünnschicht Hochtemperatur-Supraleitern |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4316785A (en) * | 1979-11-05 | 1982-02-23 | Nippon Telegraph & Telephone Public Corporation | Oxide superconductor Josephson junction and fabrication method therefor |
| US4255474A (en) * | 1980-01-04 | 1981-03-10 | Rockwell International Corporation | Composite having transparent conductor pattern |
| US4290843A (en) * | 1980-02-19 | 1981-09-22 | Texas Instruments Incorporated | Epitaxial growth of magnetic memory film on implanted substrate |
| KR950010206B1 (ko) * | 1987-03-09 | 1995-09-11 | 가부시끼가이샤 한도다이 에네르기 겐꾸쇼 | 전자 장치 및 그 제조 방법 |
| US4960751A (en) * | 1987-04-01 | 1990-10-02 | Semiconductor Energy Laboratory Co., Ltd. | Electric circuit having superconducting multilayered structure and manufacturing method for same |
| JPS63291485A (ja) * | 1987-05-25 | 1988-11-29 | Fujikura Ltd | 酸化物超電導回路の製造方法 |
| CN1017110B (zh) * | 1987-08-13 | 1992-06-17 | 株式会社半导体能源研究所 | 一种超导器件 |
-
1987
- 1987-07-21 NL NL8701718A patent/NL8701718A/nl not_active Application Discontinuation
-
1988
- 1988-07-14 AT AT88201513T patent/ATE98401T1/de not_active IP Right Cessation
- 1988-07-14 DE DE3886115T patent/DE3886115T2/de not_active Expired - Fee Related
- 1988-07-14 EP EP88201513A patent/EP0300567B1/de not_active Expired - Lifetime
- 1988-07-15 US US07/219,519 patent/US4900709A/en not_active Expired - Fee Related
- 1988-07-18 KR KR1019880008925A patent/KR970005156B1/ko not_active IP Right Cessation
- 1988-07-18 SU SU884356188A patent/SU1738104A3/ru active
- 1988-07-21 JP JP63180451A patent/JPS6441282A/ja active Pending
-
1989
- 1989-01-03 US US07/292,676 patent/US4957899A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| KR890003053A (ko) | 1989-04-12 |
| SU1738104A3 (ru) | 1992-05-30 |
| DE3886115T2 (de) | 1994-06-09 |
| EP0300567B1 (de) | 1993-12-08 |
| DE3886115D1 (de) | 1994-01-20 |
| KR970005156B1 (ko) | 1997-04-12 |
| US4900709A (en) | 1990-02-13 |
| JPS6441282A (en) | 1989-02-13 |
| US4957899A (en) | 1990-09-18 |
| EP0300567A3 (en) | 1989-05-10 |
| ATE98401T1 (de) | 1993-12-15 |
| EP0300567A2 (de) | 1989-01-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1B | A search report has been drawn up | ||
| BV | The patent application has lapsed |