JPS6441282A - Method of depositing superconducting oxide material thin layer - Google Patents

Method of depositing superconducting oxide material thin layer

Info

Publication number
JPS6441282A
JPS6441282A JP63180451A JP18045188A JPS6441282A JP S6441282 A JPS6441282 A JP S6441282A JP 63180451 A JP63180451 A JP 63180451A JP 18045188 A JP18045188 A JP 18045188A JP S6441282 A JPS6441282 A JP S6441282A
Authority
JP
Japan
Prior art keywords
layer
thin layer
oxide material
material thin
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63180451A
Other languages
English (en)
Inventor
Heraruda Yosefua Heei Maritsua
Korunerusu Tsuarumu Peteru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of JPS6441282A publication Critical patent/JPS6441282A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
JP63180451A 1987-07-21 1988-07-21 Method of depositing superconducting oxide material thin layer Pending JPS6441282A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL8701718A NL8701718A (nl) 1987-07-21 1987-07-21 Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal.

Publications (1)

Publication Number Publication Date
JPS6441282A true JPS6441282A (en) 1989-02-13

Family

ID=19850351

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63180451A Pending JPS6441282A (en) 1987-07-21 1988-07-21 Method of depositing superconducting oxide material thin layer

Country Status (8)

Country Link
US (2) US4900709A (ja)
EP (1) EP0300567B1 (ja)
JP (1) JPS6441282A (ja)
KR (1) KR970005156B1 (ja)
AT (1) ATE98401T1 (ja)
DE (1) DE3886115T2 (ja)
NL (1) NL8701718A (ja)
SU (1) SU1738104A3 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0244784A (ja) * 1988-08-05 1990-02-14 Canon Inc 超伝導パターンの形成方法
JPH08162682A (ja) * 1994-12-08 1996-06-21 Hitachi Ltd 超電導素子およびその製造方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3884511T2 (de) * 1987-07-27 1994-02-03 Ovonic Synthetic Materials Verfahren zum Stabilisieren eines hoch-Tc-supraleitenden Materials und so stabilisiertes Material.
JPS6457438A (en) * 1987-08-28 1989-03-03 Mitsubishi Electric Corp Recording medium
JPH01171247A (ja) * 1987-12-25 1989-07-06 Mitsubishi Metal Corp 超伝導体配線の構造
GB2215548B (en) * 1988-02-26 1991-10-23 Gen Electric Co Plc A method of fabricating superconducting electronic devices
US5246916A (en) * 1989-03-22 1993-09-21 Sri International Method of forming shaped superconductor materials by electrophoretic deposition of superconductor particulate coated with fusible binder
US5229360A (en) * 1989-07-24 1993-07-20 The Furukawa Electric Co., Ltd. Method for forming a multilayer superconducting circuit
US5135908A (en) * 1989-08-07 1992-08-04 The Trustees Of Columbia University In The City Of New York Method of patterning superconducting films
EP0450394A3 (en) * 1990-03-20 1991-10-23 Fujitsu Limited Method and apparatus for forming superconductor layer
CA2054796C (en) * 1990-11-01 1999-01-19 Hiroshi Inada Superconducting wiring lines and process for fabricating the same
JPH0697522A (ja) * 1990-11-30 1994-04-08 Internatl Business Mach Corp <Ibm> 超伝導材料の薄膜の製造方法
US5252551A (en) * 1991-12-27 1993-10-12 The United States Of America As Represented By The Department Of Energy Superconducting composite with multilayer patterns and multiple buffer layers
US5593918A (en) * 1994-04-22 1997-01-14 Lsi Logic Corporation Techniques for forming superconductive lines
DE102006030787B4 (de) * 2006-06-30 2008-11-27 Zenergy Power Gmbh Negativstrukturierung von Dünnschicht Hochtemperatur-Supraleitern

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291485A (ja) * 1987-05-25 1988-11-29 Fujikura Ltd 酸化物超電導回路の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4316785A (en) * 1979-11-05 1982-02-23 Nippon Telegraph & Telephone Public Corporation Oxide superconductor Josephson junction and fabrication method therefor
US4255474A (en) * 1980-01-04 1981-03-10 Rockwell International Corporation Composite having transparent conductor pattern
US4290843A (en) * 1980-02-19 1981-09-22 Texas Instruments Incorporated Epitaxial growth of magnetic memory film on implanted substrate
EP0282012A3 (en) * 1987-03-09 1989-09-13 Semiconductor Energy Laboratory Co., Ltd. Superconducting semiconductor device
US4960751A (en) * 1987-04-01 1990-10-02 Semiconductor Energy Laboratory Co., Ltd. Electric circuit having superconducting multilayered structure and manufacturing method for same
CN1017110B (zh) * 1987-08-13 1992-06-17 株式会社半导体能源研究所 一种超导器件

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63291485A (ja) * 1987-05-25 1988-11-29 Fujikura Ltd 酸化物超電導回路の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0244784A (ja) * 1988-08-05 1990-02-14 Canon Inc 超伝導パターンの形成方法
JPH08162682A (ja) * 1994-12-08 1996-06-21 Hitachi Ltd 超電導素子およびその製造方法

Also Published As

Publication number Publication date
DE3886115T2 (de) 1994-06-09
US4900709A (en) 1990-02-13
EP0300567A3 (en) 1989-05-10
SU1738104A3 (ru) 1992-05-30
NL8701718A (nl) 1989-02-16
EP0300567B1 (en) 1993-12-08
DE3886115D1 (de) 1994-01-20
US4957899A (en) 1990-09-18
EP0300567A2 (en) 1989-01-25
ATE98401T1 (de) 1993-12-15
KR890003053A (ko) 1989-04-12
KR970005156B1 (ko) 1997-04-12

Similar Documents

Publication Publication Date Title
EP0480814B1 (en) Superconducting device having an extremely thin superconducting channel formed of oxide superconductor material and method for manufacturing the same
JPS6441282A (en) Method of depositing superconducting oxide material thin layer
US5407903A (en) Superconducting device having a reduced thickness of oxide superconducting layer
KR960019820A (ko) 결정 입계 채널을 갖는 초전도 전계효과 소자와 그 제조방법
CA2054795C (en) Superconducting device having an extremely thin superconducting channel formed of oxide superconductor material and method for manufacturing the same
GB2106419A (en) Growth of structures based on group iv semiconductor materials
CA2037481A1 (en) Method of preparing oxide superconducting film
US5547923A (en) Method for manufacturing superconducting device having a reduced thickness of oxide superconducting layer
JPH03259576A (ja) ジョセフソン接合
JPS6451680A (en) Oxide ceramics laminated layer structure and its manufacture
EP0477063B1 (en) Superconducting device having a reduced thickness of oxide superconducting layer and method for manufacturing the same
JPS6435975A (en) Method of manufacturing device from thin layer of superconducting material and device manufactured by the method
EP0445307A4 (en) Single crystal oxide substrate, superconductor device produced therefrom, and producing thereof
CA2043545A1 (en) Process for preparing superconducting junction of oxide superconductor
JPS5629383A (en) Manufacture of tunnel-junction type josephson element
CA2054796A1 (en) Superconducting wiring lines and process for fabricating the same
JPH01101677A (ja) 電子装置
JPS5688384A (en) Manufacture of josephson junction element
CA2045890A1 (en) Process for Preparing Thin Film of Oxide Superconductor
JPS57166026A (en) Manufacture of indium antimony group composite crystal thin-film
CA2186840C (en) Superconducting field effect device having a superconducting channel and method for manufacturing the same
Hunt et al. Method for Producing Edge Geometry Superconducting Tunnel Junctions Utilizing an NbN/MgO/NbN Thin Film Structure(Continuation-in-Part of Serial No. 07-387 928)
CA2085290A1 (en) Superconducting device having an extremely thin superconducting channel formed of oxide superconductor material and method for manufacturing the same
JPS6443922A (en) Formation of superconductive thin film
Schmidt et al. Characteristics of Getter Sputtered Thin Films of Nb sub 3 Ge and Multilayered Films of Nb sub 3 Ge/Nb sub 3 Ir