NL8701718A - Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal. - Google Patents

Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal. Download PDF

Info

Publication number
NL8701718A
NL8701718A NL8701718A NL8701718A NL8701718A NL 8701718 A NL8701718 A NL 8701718A NL 8701718 A NL8701718 A NL 8701718A NL 8701718 A NL8701718 A NL 8701718A NL 8701718 A NL8701718 A NL 8701718A
Authority
NL
Netherlands
Prior art keywords
composition
oxidic
substrate
superconductive
layer
Prior art date
Application number
NL8701718A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8701718A priority Critical patent/NL8701718A/nl
Priority to AT88201513T priority patent/ATE98401T1/de
Priority to DE3886115T priority patent/DE3886115T2/de
Priority to EP88201513A priority patent/EP0300567B1/en
Priority to US07/219,519 priority patent/US4900709A/en
Priority to SU884356188A priority patent/SU1738104A3/ru
Priority to KR1019880008925A priority patent/KR970005156B1/ko
Priority to JP63180451A priority patent/JPS6441282A/ja
Priority to US07/292,676 priority patent/US4957899A/en
Publication of NL8701718A publication Critical patent/NL8701718A/nl

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/73—Vacuum treating or coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/742—Annealing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
NL8701718A 1987-07-21 1987-07-21 Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal. NL8701718A (nl)

Priority Applications (9)

Application Number Priority Date Filing Date Title
NL8701718A NL8701718A (nl) 1987-07-21 1987-07-21 Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal.
AT88201513T ATE98401T1 (de) 1987-07-21 1988-07-14 Verfahren zum anbringen duenner schichten aus oxidischem supraleitendem material.
DE3886115T DE3886115T2 (de) 1987-07-21 1988-07-14 Verfahren zum Anbringen dünner Schichten aus oxidischem supraleitendem Material.
EP88201513A EP0300567B1 (en) 1987-07-21 1988-07-14 Method of applying thin layers of oxidic superconductive material
US07/219,519 US4900709A (en) 1987-07-21 1988-07-15 Method of patterning superconducting oxide thin films
SU884356188A SU1738104A3 (ru) 1987-07-21 1988-07-18 Способ изготовлени сверхпровод щего устройства планарного типа
KR1019880008925A KR970005156B1 (ko) 1987-07-21 1988-07-18 산화 초전도 물질 코팅방법
JP63180451A JPS6441282A (en) 1987-07-21 1988-07-21 Method of depositing superconducting oxide material thin layer
US07/292,676 US4957899A (en) 1987-07-21 1989-01-03 Method of patterning superconducting oxide thin films

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8701718A NL8701718A (nl) 1987-07-21 1987-07-21 Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal.
NL8701718 1987-07-21

Publications (1)

Publication Number Publication Date
NL8701718A true NL8701718A (nl) 1989-02-16

Family

ID=19850351

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8701718A NL8701718A (nl) 1987-07-21 1987-07-21 Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal.

Country Status (8)

Country Link
US (2) US4900709A (ja)
EP (1) EP0300567B1 (ja)
JP (1) JPS6441282A (ja)
KR (1) KR970005156B1 (ja)
AT (1) ATE98401T1 (ja)
DE (1) DE3886115T2 (ja)
NL (1) NL8701718A (ja)
SU (1) SU1738104A3 (ja)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3884511T2 (de) * 1987-07-27 1994-02-03 Ovonic Synthetic Materials Verfahren zum Stabilisieren eines hoch-Tc-supraleitenden Materials und so stabilisiertes Material.
JPS6457438A (en) * 1987-08-28 1989-03-03 Mitsubishi Electric Corp Recording medium
JPH01171247A (ja) * 1987-12-25 1989-07-06 Mitsubishi Metal Corp 超伝導体配線の構造
GB2215548B (en) * 1988-02-26 1991-10-23 Gen Electric Co Plc A method of fabricating superconducting electronic devices
JPH0244784A (ja) * 1988-08-05 1990-02-14 Canon Inc 超伝導パターンの形成方法
US5246916A (en) * 1989-03-22 1993-09-21 Sri International Method of forming shaped superconductor materials by electrophoretic deposition of superconductor particulate coated with fusible binder
US5229360A (en) * 1989-07-24 1993-07-20 The Furukawa Electric Co., Ltd. Method for forming a multilayer superconducting circuit
US5135908A (en) * 1989-08-07 1992-08-04 The Trustees Of Columbia University In The City Of New York Method of patterning superconducting films
EP0450394A3 (en) * 1990-03-20 1991-10-23 Fujitsu Limited Method and apparatus for forming superconductor layer
US5856275A (en) * 1990-11-01 1999-01-05 Sumitomo Electric Industries, Ltd. Superconducting wiring lines and process for fabricating the same
JPH0697522A (ja) * 1990-11-30 1994-04-08 Internatl Business Mach Corp <Ibm> 超伝導材料の薄膜の製造方法
US5252551A (en) * 1991-12-27 1993-10-12 The United States Of America As Represented By The Department Of Energy Superconducting composite with multilayer patterns and multiple buffer layers
US5593918A (en) * 1994-04-22 1997-01-14 Lsi Logic Corporation Techniques for forming superconductive lines
JP3076503B2 (ja) * 1994-12-08 2000-08-14 株式会社日立製作所 超電導素子およびその製造方法
DE102006030787B4 (de) * 2006-06-30 2008-11-27 Zenergy Power Gmbh Negativstrukturierung von Dünnschicht Hochtemperatur-Supraleitern

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4316785A (en) * 1979-11-05 1982-02-23 Nippon Telegraph & Telephone Public Corporation Oxide superconductor Josephson junction and fabrication method therefor
US4255474A (en) * 1980-01-04 1981-03-10 Rockwell International Corporation Composite having transparent conductor pattern
US4290843A (en) * 1980-02-19 1981-09-22 Texas Instruments Incorporated Epitaxial growth of magnetic memory film on implanted substrate
EP0282012A3 (en) * 1987-03-09 1989-09-13 Semiconductor Energy Laboratory Co., Ltd. Superconducting semiconductor device
US4960751A (en) * 1987-04-01 1990-10-02 Semiconductor Energy Laboratory Co., Ltd. Electric circuit having superconducting multilayered structure and manufacturing method for same
JPS63291485A (ja) * 1987-05-25 1988-11-29 Fujikura Ltd 酸化物超電導回路の製造方法
CN1017110B (zh) * 1987-08-13 1992-06-17 株式会社半导体能源研究所 一种超导器件

Also Published As

Publication number Publication date
EP0300567A3 (en) 1989-05-10
KR970005156B1 (ko) 1997-04-12
US4957899A (en) 1990-09-18
DE3886115T2 (de) 1994-06-09
EP0300567A2 (en) 1989-01-25
ATE98401T1 (de) 1993-12-15
DE3886115D1 (de) 1994-01-20
KR890003053A (ko) 1989-04-12
US4900709A (en) 1990-02-13
JPS6441282A (en) 1989-02-13
EP0300567B1 (en) 1993-12-08
SU1738104A3 (ru) 1992-05-30

Similar Documents

Publication Publication Date Title
NL8701718A (nl) Werkwijze voor het aanbrengen van dunne lagen van oxidisch supergeleidend materiaal.
US4933318A (en) Plasma etch of masked superconductor film
EP0355888B1 (en) Method of manufacturing a device comprising a film of an oxidic superconducting material
US5041420A (en) Method for making superconductor films from organometallic precursors
EP0523639A2 (en) Method for patterning metallo-organic precursor film and film products
KR930004728B1 (ko) 초전도체 배선의 형성방법
KR940002412B1 (ko) 초전도 다층회로 및 그 제조방법
Lai et al. Deposition of thallium-based superconducting thin films by a simple thermal evaporation method
JPH01102976A (ja) 酸化物高温超伝導体薄膜パターン形成方法
JP2821761B2 (ja) 酸化物超伝導膜から成るブリッジ型粒界ジョセフソン素子のパターニング方法
JPH0494179A (ja) 酸化物超伝導薄膜デバイスの作製方法
JP3169654B2 (ja) 半導体装置の製造方法
JPH01132008A (ja) 超電導体およびその製造方法
JP2853532B2 (ja) 絶縁領域と超電導領域とを有する超電導薄膜の作製方法
JPH02248082A (ja) ジョセフソン接合の製造方法
KR930001567B1 (ko) 초전도체 배선의 구조 및 그 형성방법
GB2250517A (en) Microstructuring superconductive oxide by irradiation using a resist masking technique
JP2969068B2 (ja) 超伝導素子の製造方法
NL8000378A (nl) Werkwijze ter vervaardiging van josephson tunnel junctie.
Lalt et al. I Deposition of thallium-based superconducting thin films by thermal evaporation method
JPH06338639A (ja) ジョセフソン素子の製造方法
JPH02253672A (ja) 高温超電導薄膜回路の製造方法
KR19980078097A (ko) 상전이에 의한 고온 초전도 죠셉슨 접합 제조 방법
JPH01241147A (ja) 半導体装置の製造方法
KR970052289A (ko) 미세 패턴 형성 방법

Legal Events

Date Code Title Description
A1B A search report has been drawn up
BV The patent application has lapsed