NL8401721A - Werkwijze en stelsel voor het produceren van een reactief gesputterde geleidende transparante metaaloxidefilm op een doorlopende materiaalbaan. - Google Patents

Werkwijze en stelsel voor het produceren van een reactief gesputterde geleidende transparante metaaloxidefilm op een doorlopende materiaalbaan. Download PDF

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Publication number
NL8401721A
NL8401721A NL8401721A NL8401721A NL8401721A NL 8401721 A NL8401721 A NL 8401721A NL 8401721 A NL8401721 A NL 8401721A NL 8401721 A NL8401721 A NL 8401721A NL 8401721 A NL8401721 A NL 8401721A
Authority
NL
Netherlands
Prior art keywords
resistance
web
sputtering
oxygen
coating
Prior art date
Application number
NL8401721A
Other languages
English (en)
Dutch (nl)
Original Assignee
Leer Koninklijke Emballage
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leer Koninklijke Emballage filed Critical Leer Koninklijke Emballage
Priority to NL8401721A priority Critical patent/NL8401721A/nl
Priority to DE8585200833T priority patent/DE3565289D1/de
Priority to EP85200833A priority patent/EP0166477B1/en
Priority to CA000482582A priority patent/CA1247044A/en
Priority to US06/738,770 priority patent/US4661229A/en
Priority to JP60116302A priority patent/JPS60258461A/ja
Publication of NL8401721A publication Critical patent/NL8401721A/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Surface Treatment Of Glass (AREA)
NL8401721A 1984-05-29 1984-05-29 Werkwijze en stelsel voor het produceren van een reactief gesputterde geleidende transparante metaaloxidefilm op een doorlopende materiaalbaan. NL8401721A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL8401721A NL8401721A (nl) 1984-05-29 1984-05-29 Werkwijze en stelsel voor het produceren van een reactief gesputterde geleidende transparante metaaloxidefilm op een doorlopende materiaalbaan.
DE8585200833T DE3565289D1 (en) 1984-05-29 1985-05-22 Method and system for producing a reactively sputtered conducting transparent metal oxide film onto a continuous web
EP85200833A EP0166477B1 (en) 1984-05-29 1985-05-22 Method and system for producing a reactively sputtered conducting transparent metal oxide film onto a continuous web
CA000482582A CA1247044A (en) 1984-05-29 1985-05-28 Method and system for producing a reactively sputtered conducting transparent metal oxide film onto a continuous web
US06/738,770 US4661229A (en) 1984-05-29 1985-05-29 Method and system for producing a reactively sputtered conducting transparent metal oxide film onto a continuous web
JP60116302A JPS60258461A (ja) 1984-05-29 1985-05-29 ウエブヘの反応的スパツタリングによる伝導性のある透明な金属酸化物膜形成のための方法とその装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8401721A NL8401721A (nl) 1984-05-29 1984-05-29 Werkwijze en stelsel voor het produceren van een reactief gesputterde geleidende transparante metaaloxidefilm op een doorlopende materiaalbaan.
NL8401721 1984-05-29

Publications (1)

Publication Number Publication Date
NL8401721A true NL8401721A (nl) 1985-12-16

Family

ID=19844023

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8401721A NL8401721A (nl) 1984-05-29 1984-05-29 Werkwijze en stelsel voor het produceren van een reactief gesputterde geleidende transparante metaaloxidefilm op een doorlopende materiaalbaan.

Country Status (6)

Country Link
US (1) US4661229A (ja)
EP (1) EP0166477B1 (ja)
JP (1) JPS60258461A (ja)
CA (1) CA1247044A (ja)
DE (1) DE3565289D1 (ja)
NL (1) NL8401721A (ja)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH072587Y2 (ja) * 1986-09-12 1995-01-25 トヨタ自動車株式会社 窓ガラス
NL8602759A (nl) * 1986-10-31 1988-05-16 Bekaert Sa Nv Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal.
JPH0830271B2 (ja) * 1987-08-04 1996-03-27 日東電工株式会社 薄膜形成装置
JP2587945B2 (ja) * 1987-08-04 1997-03-05 日東電工株式会社 薄膜形成装置
EP0324351B1 (en) * 1988-01-09 1993-10-06 Sumitomo Bakelite Company Limited Process for producing transparent conductive film coated with metal oxide thin film
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US5798027A (en) * 1988-02-08 1998-08-25 Optical Coating Laboratory, Inc. Process for depositing optical thin films on both planar and non-planar substrates
US5225057A (en) * 1988-02-08 1993-07-06 Optical Coating Laboratory, Inc. Process for depositing optical films on both planar and non-planar substrates
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US4847171A (en) * 1988-03-10 1989-07-11 Ford Motor Company Molybdenum oxide electrodes for thermoelectric generators
US4911810A (en) * 1988-06-21 1990-03-27 Brown University Modular sputtering apparatus
US4965142A (en) * 1989-06-01 1990-10-23 Ford Motor Company Molybdenum-platinum-oxide electrodes for thermoelectric generators
JPH0774445B2 (ja) * 1989-11-30 1995-08-09 アプライド マテリアルズ インコーポレーテッド 閉ループ制御反応スパッタリングにより所定成分比の金属化合物層を形成するプロセス及び装置
US5225273A (en) * 1989-12-28 1993-07-06 Teijin Limited Transparent electroconductive laminate
US5288541A (en) * 1991-10-17 1994-02-22 International Business Machines Corporation Method for metallizing through holes in thin film substrates, and resulting devices
JPH0874034A (ja) * 1994-09-09 1996-03-19 Aneruba Kk Ｉｔｏ透明導電膜の作製方法
US6402902B1 (en) * 1995-02-13 2002-06-11 Deposition Sciences, Inc. Apparatus and method for a reliable return current path for sputtering processes
SE509933C2 (sv) * 1996-09-16 1999-03-22 Scandinavian Solar Ab Sätt och anordning att framställa ett spektralselektivt absorberande skikt till solkollektorer samt framställt skikt
US6376018B1 (en) 1998-06-17 2002-04-23 Wilfred C. Kittler, Jr. Method for the production of unsupported thin film particles
JP3650079B2 (ja) * 2002-04-25 2005-05-18 株式会社鈴寅 機能性繊維シート
US20100261058A1 (en) * 2009-04-13 2010-10-14 Applied Materials, Inc. Composite materials containing metallized carbon nanotubes and nanofibers

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3510374A (en) * 1964-04-20 1970-05-05 Industrial Nucleonics Corp Method and control apparatus for regulating apparatuses
US3602190A (en) * 1968-10-30 1971-08-31 Western Electric Co Multiple vaporizing system
US3936665A (en) * 1972-06-12 1976-02-03 Industrial Nucleonics Corporation Sheet material characteristic measuring, monitoring and controlling method and apparatus using data profile generated and evaluated by computer means
GB1446848A (en) * 1972-11-29 1976-08-18 Triplex Safety Glass Co Sputtered metal oxide coatings articles comprising transparent electrically-conductive coatings on non-conducting substrates
JPS52111892A (en) * 1976-03-18 1977-09-19 Kobayashi Rigaku Kenkiyuushiyo Process for forming transparent electrode
JPS5340190A (en) * 1976-09-25 1978-04-12 Toshiba Corp Supplying water flow quantity controlling device of reactor
JPS57130303A (en) * 1981-02-03 1982-08-12 Sharp Kk Method of producing transparent conductive film
DE3123427C2 (de) * 1981-06-12 1985-10-24 Siemens AG, 1000 Berlin und 8000 München Anordnung zum Messen des elektrischen Widerstandes und der Temperatur von durch Aufdampfen oder Aufstäuben auf Substraten abgeschiedenen dünnen, metallischleitenden Schichten während der Schichtherstellung
EP0082654A1 (en) * 1981-12-19 1983-06-29 General Engineering Radcliffe 1979 Limited Apparatus for and a method of coating a length of material
JPS58141381A (ja) * 1982-02-15 1983-08-22 Hitachi Ltd 薄膜形成装置

Also Published As

Publication number Publication date
EP0166477B1 (en) 1988-09-28
CA1247044A (en) 1988-12-20
US4661229A (en) 1987-04-28
EP0166477A2 (en) 1986-01-02
DE3565289D1 (en) 1988-11-03
JPS60258461A (ja) 1985-12-20
EP0166477A3 (en) 1986-01-15

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