NL8204584A - Roentgen analyse apparaat met een vier-kristal monochromator. - Google Patents
Roentgen analyse apparaat met een vier-kristal monochromator. Download PDFInfo
- Publication number
- NL8204584A NL8204584A NL8204584A NL8204584A NL8204584A NL 8204584 A NL8204584 A NL 8204584A NL 8204584 A NL8204584 A NL 8204584A NL 8204584 A NL8204584 A NL 8204584A NL 8204584 A NL8204584 A NL 8204584A
- Authority
- NL
- Netherlands
- Prior art keywords
- crystal
- ray
- analysis device
- monochromator
- ray analysis
- Prior art date
Links
- 239000013078 crystal Substances 0.000 title claims description 83
- 238000004458 analytical method Methods 0.000 title description 2
- 238000002441 X-ray diffraction Methods 0.000 claims description 14
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 7
- 230000005855 radiation Effects 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 description 8
- 238000010276 construction Methods 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 239000010405 anode material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
- G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Dispersion Chemistry (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8204584A NL8204584A (nl) | 1982-11-25 | 1982-11-25 | Roentgen analyse apparaat met een vier-kristal monochromator. |
| US06/548,274 US4567605A (en) | 1982-11-25 | 1983-11-03 | X-Ray analysis apparatus comprising a four-crystal monochromator |
| DE8383201641T DE3379115D1 (en) | 1982-11-25 | 1983-11-17 | X-ray analysis apparatus comprising a four-crystal monochromator |
| EP83201641A EP0110469B1 (de) | 1982-11-25 | 1983-11-17 | Apparat zur Röntgenstrahlenanalyse, mit einem Vierkristallmonochromator |
| JP58220469A JPS59108945A (ja) | 1982-11-25 | 1983-11-22 | Ｘ線回析装置 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8204584A NL8204584A (nl) | 1982-11-25 | 1982-11-25 | Roentgen analyse apparaat met een vier-kristal monochromator. |
| NL8204584 | 1982-11-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8204584A true NL8204584A (nl) | 1984-06-18 |
Family
ID=19840648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8204584A NL8204584A (nl) | 1982-11-25 | 1982-11-25 | Roentgen analyse apparaat met een vier-kristal monochromator. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4567605A (de) |
| EP (1) | EP0110469B1 (de) |
| JP (1) | JPS59108945A (de) |
| DE (1) | DE3379115D1 (de) |
| NL (1) | NL8204584A (de) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6193936A (ja) * | 1984-10-13 | 1986-05-12 | Furukawa Electric Co Ltd:The | 放射線による被測定物の組成分析方法 |
| US4821301A (en) * | 1986-02-28 | 1989-04-11 | Duke University | X-ray reflection method and apparatus for chemical analysis of thin surface layers |
| ATE89097T1 (de) * | 1986-08-15 | 1993-05-15 | Commw Scient Ind Res Org | Instrumente zur konditionierung von roentgenoder neutronenstrahlen. |
| JP2695165B2 (ja) * | 1987-10-09 | 1997-12-24 | 株式会社日立製作所 | 結晶構造解析法 |
| GB8926998D0 (en) * | 1989-11-29 | 1990-01-17 | Fisons Plc | Analysis crystal |
| JPH0485300U (de) * | 1990-11-30 | 1992-07-24 | ||
| US5173930A (en) * | 1991-11-22 | 1992-12-22 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | X-ray monochromator |
| BE1007349A3 (nl) * | 1993-07-19 | 1995-05-23 | Philips Electronics Nv | Asymmetrische 4-kristalmonochromator. |
| US5524040A (en) * | 1993-12-17 | 1996-06-04 | The United States Of America As Represented By The United States Department Of Energy | High energy resolution, high angular acceptance crystal monochromator |
| DE4407278A1 (de) * | 1994-03-04 | 1995-09-07 | Siemens Ag | Röntgen-Analysegerät |
| DE69525027T2 (de) * | 1994-06-25 | 2002-09-05 | Koninklijke Philips Electronics N.V., Eindhoven | Analyse einer materialprobe |
| DE19833524B4 (de) | 1998-07-25 | 2004-09-23 | Bruker Axs Gmbh | Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel |
| ES2160546B1 (es) * | 2000-03-07 | 2003-04-16 | Univ Madrid Autonoma | Utilizacion de estructuras cuasicristalinas en aplicaciones opticas de rayos - x |
| JP4313844B2 (ja) | 2000-05-31 | 2009-08-12 | 株式会社リガク | チャンネルカットモノクロメータ |
| JP4660712B2 (ja) * | 2000-11-30 | 2011-03-30 | 財団法人新産業創造研究機構 | Ｘ線マイクロビーム生成装置 |
| JP2007010483A (ja) * | 2005-06-30 | 2007-01-18 | Rigaku Corp | Ｘ線ビーム処理装置及びｘ線分析装置 |
| JP4773899B2 (ja) * | 2006-06-29 | 2011-09-14 | 株式会社リガク | Ｘ線分光測定方法およびｘ線分光装置 |
| US9269468B2 (en) * | 2012-04-30 | 2016-02-23 | Jordan Valley Semiconductors Ltd. | X-ray beam conditioning |
| JP6260125B2 (ja) * | 2013-07-08 | 2018-01-17 | 富士通株式会社 | 分析装置、分析方法、成膜装置及び成膜方法 |
| CN103940837A (zh) * | 2014-04-01 | 2014-07-23 | 中国科学院物理研究所 | 一种SiC晶体单色器 |
| JP2019191169A (ja) | 2018-04-23 | 2019-10-31 | ブルカー ジェイヴィ イスラエル リミテッドＢｒｕｋｅｒ Ｊｖ Ｉｓｒａｅｌ Ｌｔｄ． | 小角ｘ線散乱測定用のｘ線源光学系 |
| KR102710484B1 (ko) | 2018-07-05 | 2024-09-27 | 브루커 테크놀로지스 리미티드 | 소각 ｘ선 산란 계측 |
| US11781999B2 (en) | 2021-09-05 | 2023-10-10 | Bruker Technologies Ltd. | Spot-size control in reflection-based and scatterometry-based X-ray metrology systems |
| US12249059B2 (en) | 2022-03-31 | 2025-03-11 | Bruker Technologies Ltd. | Navigation accuracy using camera coupled with detector assembly |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4524957Y1 (de) * | 1965-12-09 | 1970-09-30 | ||
| US3518427A (en) * | 1968-06-05 | 1970-06-30 | Atomic Energy Commission | Universal planar x-ray resonator |
| JPS5599050A (en) * | 1979-01-23 | 1980-07-28 | Nippon X Sen Kk | Xxray spectroscope |
| SU817553A1 (ru) * | 1979-06-29 | 1981-03-30 | Институт Кристаллографии Им.А.В.Шуб-Никова Ah Cccp | Рентгеновский спектрометр дл СиНХРОТРОННОгО иСТОчНиКА излучЕНи |
| JPS57156600A (en) * | 1981-03-20 | 1982-09-27 | Rigaku Denki Co Ltd | X-ray monochromater |
-
1982
- 1982-11-25 NL NL8204584A patent/NL8204584A/nl not_active Application Discontinuation
-
1983
- 1983-11-03 US US06/548,274 patent/US4567605A/en not_active Expired - Lifetime
- 1983-11-17 DE DE8383201641T patent/DE3379115D1/de not_active Expired
- 1983-11-17 EP EP83201641A patent/EP0110469B1/de not_active Expired
- 1983-11-22 JP JP58220469A patent/JPS59108945A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| EP0110469A3 (en) | 1985-04-10 |
| US4567605A (en) | 1986-01-28 |
| EP0110469B1 (de) | 1989-02-01 |
| JPH0430541B2 (de) | 1992-05-22 |
| DE3379115D1 (en) | 1989-03-09 |
| EP0110469A2 (de) | 1984-06-13 |
| JPS59108945A (ja) | 1984-06-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1B | A search report has been drawn up | ||
| A85 | Still pending on 85-01-01 | ||
| BV | The patent application has lapsed |