NL8005413A - Werkwijze voor het maken van gekleurde glazen fotomaskers. - Google Patents

Werkwijze voor het maken van gekleurde glazen fotomaskers. Download PDF

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Publication number
NL8005413A
NL8005413A NL8005413A NL8005413A NL8005413A NL 8005413 A NL8005413 A NL 8005413A NL 8005413 A NL8005413 A NL 8005413A NL 8005413 A NL8005413 A NL 8005413A NL 8005413 A NL8005413 A NL 8005413A
Authority
NL
Netherlands
Prior art keywords
glass
silver
emulsion
pattern
areas
Prior art date
Application number
NL8005413A
Other languages
English (en)
Dutch (nl)
Original Assignee
Ppg Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ppg Industries Inc filed Critical Ppg Industries Inc
Publication of NL8005413A publication Critical patent/NL8005413A/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/26—Processes using silver-salt-containing photosensitive materials or agents therefor
    • G03C5/40—Chemically transforming developed images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Surface Treatment Of Glass (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL8005413A 1979-10-01 1980-09-30 Werkwijze voor het maken van gekleurde glazen fotomaskers. NL8005413A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US8087579 1979-10-01
US06/080,875 US4309495A (en) 1978-08-02 1979-10-01 Method for making stained glass photomasks from photographic emulsion

Publications (1)

Publication Number Publication Date
NL8005413A true NL8005413A (nl) 1981-04-03

Family

ID=22160203

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8005413A NL8005413A (nl) 1979-10-01 1980-09-30 Werkwijze voor het maken van gekleurde glazen fotomaskers.

Country Status (6)

Country Link
US (1) US4309495A (ko)
JP (1) JPS5674252A (ko)
KR (1) KR840000314B1 (ko)
CH (1) CH645740A5 (ko)
DE (1) DE3036555C2 (ko)
NL (1) NL8005413A (ko)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4421836A (en) * 1981-09-25 1983-12-20 Ppg Industries, Inc. Method for repairing silver image glass photomasks with Ni
US4407891A (en) * 1981-11-20 1983-10-04 Ppg Industries, Inc. Low temperature reduction process for large photomasks
US4390592A (en) * 1981-11-20 1983-06-28 Ppg Industries, Inc. Low temperature reduction process for photomasks
CN1033345C (zh) * 1989-03-02 1996-11-20 东芝株式会社 荫罩的图形印相版
WO1991011754A1 (en) * 1990-01-31 1991-08-08 Presstek, Inc. Improved method and means for producing photomasks
US5217829A (en) * 1990-02-22 1993-06-08 Presstek, Inc. Method for producing photomasks
EP0548385A1 (en) * 1991-12-20 1993-06-30 Corning Incorporated Method for burying optical waveguide paths
US5354633A (en) * 1993-09-22 1994-10-11 Presstek, Inc. Laser imageable photomask constructions
US6277006B1 (en) * 1998-05-21 2001-08-21 Eastman Kodak Company Coated media bearing surface for conveying abrasive media and the like
US6303262B1 (en) 1998-06-18 2001-10-16 Mitsubishi Paper Mills Ltd. Photomask material, photomask and methods for the production thereof
FR2839560B1 (fr) * 2002-05-07 2005-10-14 Commissariat Energie Atomique Masque pour photolithographie a elements absorbeurs/dephaseurs inclus
DE102004035239B4 (de) * 2004-07-21 2011-08-18 boraident GmbH, 06118 Verfahren zur Herstellung einer Prüfmarkierung von Glas und Verwendung der Prüfmarkierung zum Nachweis der bei der Erzeugung der Prüfmarkierung herrschenden Temperatur- und Zeitbedingungen
JP2006201538A (ja) * 2005-01-21 2006-08-03 Seiko Epson Corp マスク、マスクの製造方法、パターン形成方法、配線パターン形成方法
KR100646986B1 (ko) * 2005-08-22 2006-11-23 엘지전자 주식회사 포토마스크 및 이를 이용한 노광 방법

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2314804A (en) * 1938-12-07 1943-03-23 Corning Glass Works Glass article
US2455719A (en) * 1945-06-01 1948-12-07 Woldemar A Weyl Glass manufacture
US2468402A (en) * 1945-06-14 1949-04-26 Bausch & Lomb Method of marking glass
US2732298A (en) * 1952-12-05 1956-01-24 Method of producing a photograph
US2904432A (en) * 1954-09-29 1959-09-15 Corning Glass Works Method of producing a photograph in glass
NL204868A (ko) * 1955-02-25
US3515587A (en) * 1963-04-06 1970-06-02 Bausch & Lomb Method for changing the optical characteristics of an article
US3489624A (en) * 1965-03-31 1970-01-13 Westinghouse Canada Ltd Etching techniques for glass
US3551304A (en) * 1965-07-12 1970-12-29 Bausch & Lomb Method for producing a composite article
US3370948A (en) * 1966-04-13 1968-02-27 Bausch & Lomb Method for selective etching of alkali glass
US3508982A (en) * 1967-01-03 1970-04-28 Itt Method of making an ultra-violet selective template
US3510371A (en) * 1967-01-25 1970-05-05 Itt Method of making an ultraviolet sensitive template
US3542612A (en) * 1967-08-11 1970-11-24 Western Electric Co Photolithographic masks and methods for their manufacture
US3561963A (en) * 1967-09-11 1971-02-09 Signetics Corp Transparent mask and method for making the same
US3573948A (en) * 1968-01-29 1971-04-06 Ppg Industries Inc Methods of making an image plane plate
US3620795A (en) * 1968-04-29 1971-11-16 Signetics Corp Transparent mask and method for making the same
GB1264958A (ko) * 1968-07-15 1972-02-23
US3653864A (en) * 1969-03-17 1972-04-04 Corning Glass Works Dealkalization of glass surfaces
JPS5022877B1 (ko) * 1969-07-28 1975-08-02
US3732792A (en) * 1970-12-14 1973-05-15 Ppg Industries Inc Image plane plate
FR2128937A5 (ko) * 1971-03-09 1972-10-27 Ragonot Ets
US3907566A (en) * 1971-07-23 1975-09-23 Canon Kk Photosensitive material containing inorganic compound coated metal particles and the use thereof in photographic development processes
US3715244A (en) * 1971-08-26 1973-02-06 Corning Glass Works Chromium film microcircuit mask
US3720515A (en) * 1971-10-20 1973-03-13 Trw Inc Microelectronic circuit production
JPS5038342B2 (ko) * 1971-12-01 1975-12-09
US3857689A (en) * 1971-12-28 1974-12-31 Nippon Selfoc Co Ltd Ion exchange process for manufacturing integrated optical circuits
GB1423171A (en) * 1972-06-05 1976-01-28 Pilkington Brothers Ltd Manufacture of surface glass
US3811855A (en) * 1972-10-10 1974-05-21 Rca Corp Method of treating a glass body to provide an ion-depleted region therein
US3836348A (en) * 1973-02-22 1974-09-17 Nippon Selfoc Co Ltd Method for manufacturing optical integrated circuits utilizing an external electric field
IT1009218B (it) * 1973-04-02 1976-12-10 Glaverbel Procedimento per colorare un ogget to di vetro o per modificarne il colore e oggetto cosi ottenuto
US3879183A (en) * 1973-08-15 1975-04-22 Rca Corp Corona discharge method of depleting mobile ions from a glass region
JPS5230848B2 (ko) * 1973-10-09 1977-08-11
US4113486A (en) * 1973-10-22 1978-09-12 Fuji Photo Film Co., Ltd. Method for producing a photomask
AU7016574A (en) * 1974-06-18 1975-12-18 Matvienko V Y Photomasks
US3896016A (en) * 1974-07-05 1975-07-22 Rca Corp Fabrication of liquid crystal devices
US3991228A (en) * 1975-01-27 1976-11-09 Rca Corporation Deposition of tin oxide films on glass
US3991227A (en) * 1975-01-27 1976-11-09 Rca Corporation Method for forming electrode patterns in transparent conductive coatings on glass substrates
US4144066A (en) * 1977-11-30 1979-03-13 Ppg Industries, Inc. Electron bombardment method for making stained glass photomasks
US4155735A (en) * 1977-11-30 1979-05-22 Ppg Industries, Inc. Electromigration method for making stained glass photomasks

Also Published As

Publication number Publication date
KR840000314B1 (ko) 1984-03-16
JPS6157624B2 (ko) 1986-12-08
DE3036555C2 (de) 1982-08-19
KR830003748A (ko) 1983-06-22
DE3036555A1 (de) 1981-04-02
CH645740A5 (en) 1984-10-15
JPS5674252A (en) 1981-06-19
US4309495A (en) 1982-01-05

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Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
A85 Still pending on 85-01-01
BV The patent application has lapsed