NL194397C - CVD-bekledingswerkwijze ter vervaardiging van lagen en inrichting voor het uitvoeren van de werkwijze. - Google Patents
CVD-bekledingswerkwijze ter vervaardiging van lagen en inrichting voor het uitvoeren van de werkwijze. Download PDFInfo
- Publication number
- NL194397C NL194397C NL8902229A NL8902229A NL194397C NL 194397 C NL194397 C NL 194397C NL 8902229 A NL8902229 A NL 8902229A NL 8902229 A NL8902229 A NL 8902229A NL 194397 C NL194397 C NL 194397C
- Authority
- NL
- Netherlands
- Prior art keywords
- reaction
- space
- opening
- substrate
- reaction gas
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45502—Flow conditions in reaction chamber
- C23C16/45504—Laminar flow
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Fluid Mechanics (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3830215 | 1988-09-06 | ||
DE3830215 | 1988-09-06 | ||
DE3926023A DE3926023A1 (de) | 1988-09-06 | 1989-08-07 | Cvd-beschichtungsverfahren zur herstellung von schichten und vorrichtung zur durchfuehrung des verfahrens |
DE3926023 | 1989-08-07 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL8902229A NL8902229A (nl) | 1990-04-02 |
NL194397B NL194397B (nl) | 2001-11-01 |
NL194397C true NL194397C (nl) | 2002-03-04 |
Family
ID=25871889
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8902229A NL194397C (nl) | 1988-09-06 | 1989-09-05 | CVD-bekledingswerkwijze ter vervaardiging van lagen en inrichting voor het uitvoeren van de werkwijze. |
Country Status (6)
Country | Link |
---|---|
US (2) | US5030475A (de) |
JP (1) | JP2696405B2 (de) |
DE (1) | DE3926023A1 (de) |
FR (1) | FR2636078B1 (de) |
GB (1) | GB2224753B (de) |
NL (1) | NL194397C (de) |
Families Citing this family (59)
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DE3926023A1 (de) | 1988-09-06 | 1990-03-15 | Schott Glaswerke | Cvd-beschichtungsverfahren zur herstellung von schichten und vorrichtung zur durchfuehrung des verfahrens |
WO1990012126A1 (en) * | 1989-03-31 | 1990-10-18 | Canon Kabushiki Kaisha | Method of forming polycrystalline film by chemical vapor deposition |
DE4008405C1 (de) * | 1990-03-16 | 1991-07-11 | Schott Glaswerke, 6500 Mainz, De | |
DE4010663C2 (de) * | 1990-04-03 | 1998-07-23 | Leybold Ag | Vorrichtung und Verfahren zur plasmagestützten Beschichtung von Werkstücken |
DE4114108C1 (de) * | 1991-04-30 | 1991-12-19 | Schott Glaswerke, 6500 Mainz, De | |
KR930011413B1 (ko) * | 1990-09-25 | 1993-12-06 | 가부시키가이샤 한도오따이 에네루기 겐큐쇼 | 펄스형 전자파를 사용한 플라즈마 cvd 법 |
US5217559A (en) * | 1990-12-10 | 1993-06-08 | Texas Instruments Incorporated | Apparatus and method for in-situ deep ultraviolet photon-assisted semiconductor wafer processing |
US5891253A (en) * | 1993-05-14 | 1999-04-06 | Applied Materials, Inc. | Corrosion resistant apparatus |
US5522932A (en) * | 1993-05-14 | 1996-06-04 | Applied Materials, Inc. | Corrosion-resistant apparatus |
DE4325011A1 (de) * | 1993-07-28 | 1995-03-02 | Herlitz Michael | Erweiterung von Entspiegelung wie bei Brillengläsern üblich auf Autoglasscheiben sowie weitere Kraftfahrzeuge und Verkehrsmittel, sowie alle anderen Silikat- und Kunststoffscheiben |
DE4335224A1 (de) * | 1993-10-15 | 1995-04-20 | Leybold Ag | Vorrichtung für die Herstellung optischer Schichten |
FR2712309B1 (fr) * | 1993-11-10 | 1995-12-22 | Yannick Chouan | Procédé de dépôt de couches minces de silice à basse température et machine de dépôt pour la mise en Óoeuvre de ce procédé. |
US5975912A (en) * | 1994-06-03 | 1999-11-02 | Materials Research Corporation | Low temperature plasma-enhanced formation of integrated circuits |
US5665640A (en) * | 1994-06-03 | 1997-09-09 | Sony Corporation | Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor |
US5628829A (en) * | 1994-06-03 | 1997-05-13 | Materials Research Corporation | Method and apparatus for low temperature deposition of CVD and PECVD films |
WO1995034092A1 (en) * | 1994-06-03 | 1995-12-14 | Materials Research Corporation | A method of nitridization of titanium thin films |
DE19503205C1 (de) * | 1995-02-02 | 1996-07-11 | Muegge Electronic Gmbh | Vorrichtung zur Erzeugung von Plasma |
US5789040A (en) * | 1997-05-21 | 1998-08-04 | Optical Coating Laboratory, Inc. | Methods and apparatus for simultaneous multi-sided coating of optical thin film designs using dual-frequency plasma-enhanced chemical vapor deposition |
DE19622550A1 (de) * | 1996-06-05 | 1997-12-11 | Schott Glaswerke | Glasbehälter insbesondere zur Aufbewahrung pharmazeutischer oder diagnostischer Lösungen |
US5643365A (en) * | 1996-07-25 | 1997-07-01 | Ceram Optec Industries Inc | Method and device for plasma vapor chemical deposition of homogeneous films on large flat surfaces |
DE19643865C2 (de) * | 1996-10-30 | 1999-04-08 | Schott Glas | Plasmaunterstütztes chemisches Abscheidungsverfahren (CVD) mit entfernter Anregung eines Anregungsgases (Remote-Plasma-CVD-Verfahren) zur Beschichtung oder zur Behandlung großflächiger Substrate und Vorrichtung zur Durchführung desselben |
US6493159B1 (en) * | 1996-11-01 | 2002-12-10 | Unaxis Balzers Aktiengesellschaft | Optical element and its manufacturing process |
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DE10125152A1 (de) * | 2001-05-22 | 2002-12-12 | Schott Glas | Lichtwellenleiter |
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DE10239875B4 (de) * | 2002-08-29 | 2008-11-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur großflächigen Beschichtung von Substraten bei Atmosphärendruckbedingungen |
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DE102006042328B4 (de) * | 2006-09-01 | 2012-07-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Ausbildung dünner Schichten auf Substratoberflächen |
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US7985188B2 (en) * | 2009-05-13 | 2011-07-26 | Cv Holdings Llc | Vessel, coating, inspection and processing apparatus |
EP2263983A1 (de) * | 2009-06-05 | 2010-12-22 | AGC Glass Europe | Verfahren und Anlage zum Auftragen von Schichten auf ein Substrat |
US9458536B2 (en) | 2009-07-02 | 2016-10-04 | Sio2 Medical Products, Inc. | PECVD coating methods for capped syringes, cartridges and other articles |
DE102009044496B4 (de) | 2009-11-11 | 2023-11-02 | Muegge Gmbh | Vorrichtung zur Erzeugung von Plasma mittels Mikrowellen |
US11624115B2 (en) | 2010-05-12 | 2023-04-11 | Sio2 Medical Products, Inc. | Syringe with PECVD lubrication |
US9878101B2 (en) | 2010-11-12 | 2018-01-30 | Sio2 Medical Products, Inc. | Cyclic olefin polymer vessels and vessel coating methods |
US9272095B2 (en) | 2011-04-01 | 2016-03-01 | Sio2 Medical Products, Inc. | Vessels, contact surfaces, and coating and inspection apparatus and methods |
US9554968B2 (en) | 2013-03-11 | 2017-01-31 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging |
EP2776603B1 (de) | 2011-11-11 | 2019-03-06 | SiO2 Medical Products, Inc. | Passivierungs-, ph-schutz- oder schmierbeschichtung für arzneimittelverpackung, beschichtungsverfahren und vorrichtung |
US11116695B2 (en) | 2011-11-11 | 2021-09-14 | Sio2 Medical Products, Inc. | Blood sample collection tube |
US20130286567A1 (en) * | 2012-01-10 | 2013-10-31 | Hzo, Inc. | Apparatuses, systems and methods for protecting electronic device assemblies |
DE102012103425A1 (de) | 2012-04-19 | 2013-10-24 | Roth & Rau Ag | Mikrowellenplasmaerzeugungsvorrichtung und Verfahren zu deren Betrieb |
CA2890066C (en) | 2012-11-01 | 2021-11-09 | Sio2 Medical Products, Inc. | Coating inspection method |
EP2920567B1 (de) | 2012-11-16 | 2020-08-19 | SiO2 Medical Products, Inc. | Verfahren und vorrichtung zur erkennung von schnellen sperrbeschichtungsintegritätseigenschaften |
US9764093B2 (en) | 2012-11-30 | 2017-09-19 | Sio2 Medical Products, Inc. | Controlling the uniformity of PECVD deposition |
CN105705676B (zh) | 2012-11-30 | 2018-09-07 | Sio2医药产品公司 | 控制在医用注射器、药筒等上的pecvd沉积的均匀性 |
GB201222395D0 (en) | 2012-12-12 | 2013-01-23 | Element Six Ltd | Microwave plasma CVD synthetic diamond growth on non-planar and/or non-refractory substrates |
US20160015898A1 (en) | 2013-03-01 | 2016-01-21 | Sio2 Medical Products, Inc. | Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus |
US9937099B2 (en) | 2013-03-11 | 2018-04-10 | Sio2 Medical Products, Inc. | Trilayer coated pharmaceutical packaging with low oxygen transmission rate |
US9863042B2 (en) | 2013-03-15 | 2018-01-09 | Sio2 Medical Products, Inc. | PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases |
EP3122917B1 (de) | 2014-03-28 | 2020-05-06 | SiO2 Medical Products, Inc. | Antistatische beschichtungen für kunststoffbehälter |
FI126794B (en) | 2014-12-22 | 2017-05-31 | Picosun Oy | Photo-assisted coating process |
WO2017031354A2 (en) | 2015-08-18 | 2017-02-23 | Sio2 Medical Products, Inc. | Pharmaceutical and other packaging with low oxygen transmission rate |
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FR2623820A1 (fr) * | 1987-11-30 | 1989-06-02 | Gen Electric | Depot en phase gazeuse par procede chimique a laser avec utilisation d'un faisceau a fibre optique |
DE3926023A1 (de) | 1988-09-06 | 1990-03-15 | Schott Glaswerke | Cvd-beschichtungsverfahren zur herstellung von schichten und vorrichtung zur durchfuehrung des verfahrens |
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-
1989
- 1989-08-07 DE DE3926023A patent/DE3926023A1/de active Granted
- 1989-09-05 FR FR8911571A patent/FR2636078B1/fr not_active Expired - Fee Related
- 1989-09-05 NL NL8902229A patent/NL194397C/nl not_active IP Right Cessation
- 1989-09-05 GB GB8920021A patent/GB2224753B/en not_active Expired - Fee Related
- 1989-09-06 US US07/403,430 patent/US5030475A/en not_active Expired - Lifetime
- 1989-09-06 JP JP1229442A patent/JP2696405B2/ja not_active Expired - Fee Related
- 1989-12-07 US US07/447,480 patent/US5062508A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
NL194397B (nl) | 2001-11-01 |
DE3926023A1 (de) | 1990-03-15 |
DE3926023C2 (de) | 1991-07-11 |
FR2636078B1 (fr) | 1994-03-04 |
JPH02138478A (ja) | 1990-05-28 |
JP2696405B2 (ja) | 1998-01-14 |
GB2224753B (en) | 1992-11-18 |
NL8902229A (nl) | 1990-04-02 |
US5062508A (en) | 1991-11-05 |
US5030475A (en) | 1991-07-09 |
GB8920021D0 (en) | 1989-10-18 |
FR2636078A1 (fr) | 1990-03-09 |
GB2224753A (en) | 1990-05-16 |
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