NL185186B - Halfgeleiderlaserelement. - Google Patents

Halfgeleiderlaserelement.

Info

Publication number
NL185186B
NL185186B NLAANVRAGE8001104,A NL8001104A NL185186B NL 185186 B NL185186 B NL 185186B NL 8001104 A NL8001104 A NL 8001104A NL 185186 B NL185186 B NL 185186B
Authority
NL
Netherlands
Prior art keywords
semiconductor laser
laser element
semiconductor
laser
Prior art date
Application number
NLAANVRAGE8001104,A
Other languages
English (en)
Other versions
NL185186C (nl
NL8001104A (nl
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of NL8001104A publication Critical patent/NL8001104A/nl
Publication of NL185186B publication Critical patent/NL185186B/nl
Application granted granted Critical
Publication of NL185186C publication Critical patent/NL185186C/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H01S5/0282—Passivation layers or treatments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/02—Structural details or components not essential to laser action
    • H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
    • H01S5/0282—Passivation layers or treatments
    • H01S5/0283—Optically inactive coating on the facet, e.g. half-wave coating

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
NLAANVRAGE8001104,A 1979-02-26 1980-02-22 Halfgeleiderlaserelement. NL185186C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2080279 1979-02-26
JP2080279A JPS55115386A (en) 1979-02-26 1979-02-26 Semiconductor laser unit

Publications (3)

Publication Number Publication Date
NL8001104A NL8001104A (nl) 1980-08-28
NL185186B true NL185186B (nl) 1989-09-01
NL185186C NL185186C (nl) 1990-02-01

Family

ID=12037174

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE8001104,A NL185186C (nl) 1979-02-26 1980-02-22 Halfgeleiderlaserelement.

Country Status (6)

Country Link
US (1) US4337443A (nl)
JP (1) JPS55115386A (nl)
CA (1) CA1141457A (nl)
DE (1) DE3006949C2 (nl)
GB (1) GB2043989B (nl)
NL (1) NL185186C (nl)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5967677A (ja) * 1982-07-01 1984-04-17 Semiconductor Res Found 光集積回路
JPS59119733A (ja) * 1982-12-24 1984-07-11 Toshiba Corp 半導体装置
JPS59145588A (ja) * 1983-02-09 1984-08-21 Hitachi Ltd 半導体レ−ザ装置
US4656638A (en) * 1983-02-14 1987-04-07 Xerox Corporation Passivation for surfaces and interfaces of semiconductor laser facets or the like
US4563368A (en) * 1983-02-14 1986-01-07 Xerox Corporation Passivation for surfaces and interfaces of semiconductor laser facets or the like
US4734380A (en) * 1983-04-08 1988-03-29 American Telephone And Telegraph Company, At&T Bell Laboratories Multicavity optical device held together by metallic film
US4622671A (en) * 1983-02-25 1986-11-11 At&T Bell Laboratories Multicavity optical device
EP0117734B1 (en) * 1983-02-25 1989-04-26 AT&T Corp. Multicavity optical device and applications thereof
US4510607A (en) * 1984-01-03 1985-04-09 The United States Of America As Represented By The Secretary Of The Navy Semiconductor laser end-facet coatings for use in solid or liquid environments
EP0162660B1 (en) * 1984-05-16 1989-07-26 Sharp Kabushiki Kaisha A compound resonator type semiconductor laser device
US4633476A (en) * 1984-11-16 1986-12-30 Spectra Diode Laboratories, Inc. Semiconductor laser with internal reflectors and vertical output
GB8514051D0 (en) * 1985-06-04 1985-07-10 British Telecomm Opto-electronic devices
JPS61296785A (ja) * 1985-06-25 1986-12-27 Sharp Corp 半導体レ−ザアレイ装置
US4840922A (en) * 1986-07-29 1989-06-20 Ricoh Company, Ltd. Method of manufacturing masked semiconductor laser
JPS63198390A (ja) * 1987-02-13 1988-08-17 Ricoh Co Ltd マスク半導体レ−ザ−の製作方法
JPH0644663B2 (ja) * 1987-03-31 1994-06-08 三菱電機株式会社 半導体レ−ザ
US4845725A (en) * 1987-05-20 1989-07-04 Spectra Diode Laboratories, Inc. Window laser with high power reduced divergence output
JPH01141132U (nl) * 1988-03-24 1989-09-27
JP2991716B2 (ja) * 1988-08-16 1999-12-20 三菱化学株式会社 エッチトミラー型化合物半導体レーザー装置及び集積素子
DE59009167D1 (de) * 1989-02-01 1995-07-06 Siemens Ag Elektroaktive Passivierschicht.
DE68915763T2 (de) * 1989-09-07 1994-12-08 Ibm Verfahren zur Spiegelpassivierung bei Halbleiterlaserdioden.
JP2736173B2 (ja) * 1990-12-18 1998-04-02 シャープ株式会社 半導体レーザ素子の製造方法
JP3381073B2 (ja) * 1992-09-28 2003-02-24 ソニー株式会社 半導体レーザ装置とその製造方法
US5440575A (en) * 1994-04-06 1995-08-08 At&T Corp. Article comprising a semiconductor laser with stble facet coating
US5665637A (en) * 1995-11-17 1997-09-09 Lucent Technologies Inc. Passivated faceted article comprising a semiconductor laser
JPH09167873A (ja) * 1995-12-15 1997-06-24 Mitsubishi Electric Corp 半導体レーザ装置
EP0814544B1 (en) * 1996-06-22 2002-08-21 International Business Machines Corporation Semiconductor laser with facet coating and method for making the same
US5940424A (en) * 1996-06-24 1999-08-17 International Business Machines Corporation Semiconductor lasers and method for making the same
DE69711611T2 (de) * 1996-12-13 2002-11-21 Uniphase Opto Holdings Inc., San Jose Selbstpulsierender halbleiterdiodenlaser und dessen herstellungverfahren
GB2333896B (en) * 1998-01-31 2003-04-09 Mitel Semiconductor Ab Vertical cavity surface emitting laser
US6396864B1 (en) 1998-03-13 2002-05-28 Jds Uniphase Corporation Thermally conductive coatings for light emitting devices
US6590920B1 (en) 1998-10-08 2003-07-08 Adc Telecommunications, Inc. Semiconductor lasers having single crystal mirror layers grown directly on facet
US6483862B1 (en) * 1998-12-11 2002-11-19 Agilent Technologies, Inc. System and method for the monolithic integration of a light emitting device and a photodetector using a native oxide semiconductor layer
US6519272B1 (en) 1999-06-30 2003-02-11 Corning Incorporated Long, high-power semiconductor laser with shifted-wave and passivated output facet
US6744796B1 (en) * 2000-03-30 2004-06-01 Triquint Technology Holding Co. Passivated optical device and method of forming the same
US6618409B1 (en) 2000-05-03 2003-09-09 Corning Incorporated Passivation of semiconductor laser facets
JP4033626B2 (ja) * 2000-10-06 2008-01-16 日本オプネクスト株式会社 半導体レーザ装置の製造方法
JP4102554B2 (ja) * 2000-10-31 2008-06-18 シャープ株式会社 半導体レーザ素子及びその製造方法
JP2002164609A (ja) * 2000-11-28 2002-06-07 Sharp Corp 半導体レーザ素子およびその製造方法
JP3868286B2 (ja) * 2001-12-21 2007-01-17 シャープ株式会社 フォトマスクおよび半導体レーザ素子の製造方法
JP3770386B2 (ja) * 2002-03-29 2006-04-26 ユーディナデバイス株式会社 光半導体装置及びその製造方法
EP1866955A4 (en) * 2005-03-25 2011-02-02 Trumpf Photonics Inc PASSIVATION OF LASER FACETS
EP1906461B1 (de) * 2006-09-26 2020-03-18 OSRAM Opto Semiconductors GmbH Verfahren zur Herstellung eines optoelektronischen Bauelements und optoelektronisches Bauelement
DE102009054912A1 (de) 2009-08-28 2011-03-10 M2K-Laser Gmbh Hochleistungs-Diodenlaser und Verfahren zum Herstellen eines Hochleistungs-Diodenlasers
JP2012109499A (ja) * 2010-11-19 2012-06-07 Sony Corp 半導体レーザ素子およびその製造方法
CN117096723B (zh) * 2023-10-20 2024-02-06 度亘核芯光电技术(苏州)有限公司 钝化膜结构及形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3914465A (en) * 1972-09-25 1975-10-21 Bell Telephone Labor Inc Surface passivation of GaAs junction laser devices
GB1407351A (en) * 1973-02-06 1975-09-24 Standard Telephones Cables Ltd Injection lasers
US3849738A (en) * 1973-04-05 1974-11-19 Bell Telephone Labor Inc Multilayer antireflection coatings for solid state lasers
US4178564A (en) * 1976-01-15 1979-12-11 Rca Corporation Half wave protection layers on injection lasers
US4095011A (en) * 1976-06-21 1978-06-13 Rca Corp. Electroluminescent semiconductor device with passivation layer
DE2632647A1 (de) * 1976-07-20 1978-01-26 Siemens Ag Halbleiterbauelement mit passivierender schutzschicht
US4254426A (en) * 1979-05-09 1981-03-03 Rca Corporation Method and structure for passivating semiconductor material

Also Published As

Publication number Publication date
DE3006949A1 (de) 1980-09-04
US4337443A (en) 1982-06-29
GB2043989A (en) 1980-10-08
NL185186C (nl) 1990-02-01
DE3006949C2 (de) 1982-10-28
JPS55115386A (en) 1980-09-05
GB2043989B (en) 1983-02-02
CA1141457A (en) 1983-02-15
JPS5722426B2 (nl) 1982-05-13
NL8001104A (nl) 1980-08-28

Similar Documents

Publication Publication Date Title
NL185186C (nl) Halfgeleiderlaserelement.
NL181963C (nl) Halfgeleiderlaserinrichting.
NO163653C (no) Laser-radiometer.
NL7704226A (nl) Halfgeleider laserinrichting.
IT1084379B (it) Procedimento di piroscissione.
NO158112C (no) Pakning.
NL171760C (nl) Halfgeleiderlaser.
NL7711664A (nl) Halfgeleiderlaser.
NL184086C (nl) Laser.
NL7808060A (nl) Halfgeleiderelement.
NL184715C (nl) Halfgeleiderlaserinrichting.
NL7700283A (nl) Halfgeleiderinjectielaser.
NL7902967A (nl) Elektroluminescerende halfgeleiderinrichting.
NL7701379A (nl) Licht-uitzendend halfgeleiderelement.
DE3072204D1 (de) Halbleiterspeicheranordnung.
ES254327Y (es) Portillon.
IT8021530A0 (it) Dispositivo semiconduttore ad elettroluminescenza.
NL190943C (nl) Halfgeleiderlaser.
IT8023529A0 (it) Struttura semiconduttrice.
NO802172L (no) Substituerte difenyletere.
NL7706405A (nl) Laser.
IT8019838A0 (it) Dispositivo semiconduttore.
IT8026552A0 (it) Laser a semiconduttore.
IT8021230A0 (it) Amminoacetonitrili idrossiimmino sostituiti.
NO812109L (no) Z-profilfoeringsinnretning.

Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
V1 Lapsed because of non-payment of the annual fee

Effective date: 19950901