NL149298C - Werkwijze voor het vervaardigen van een offsetdrukvorm, alsmede werkwijze voor het bedrukken van een kunststofoppervlak met een aldus verkregen drukvorm. - Google Patents

Werkwijze voor het vervaardigen van een offsetdrukvorm, alsmede werkwijze voor het bedrukken van een kunststofoppervlak met een aldus verkregen drukvorm.

Info

Publication number
NL149298C
NL149298C NL6606131A NL6606131A NL149298C NL 149298 C NL149298 C NL 149298C NL 6606131 A NL6606131 A NL 6606131A NL 6606131 A NL6606131 A NL 6606131A NL 149298 C NL149298 C NL 149298C
Authority
NL
Netherlands
Prior art keywords
cleaning
light
print form
nov
heating
Prior art date
Application number
NL6606131A
Other languages
English (en)
Other versions
NL149298B (nl
NL6606131A (nl
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of NL6606131A publication Critical patent/NL6606131A/xx
Publication of NL149298B publication Critical patent/NL149298B/nl
Application granted granted Critical
Publication of NL149298C publication Critical patent/NL149298C/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
NL6606131A 1965-11-24 1966-05-05 Werkwijze voor het vervaardigen van een offsetdrukvorm, alsmede werkwijze voor het bedrukken van een kunststofoppervlak met een aldus verkregen drukvorm. NL149298C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1965K0057722 DE1447963B2 (de) 1965-11-24 1965-11-24 Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial

Publications (3)

Publication Number Publication Date
NL6606131A NL6606131A (nl) 1967-05-25
NL149298B NL149298B (nl) 1976-04-15
NL149298C true NL149298C (nl) 1982-09-16

Family

ID=7228378

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6606131A NL149298C (nl) 1965-11-24 1966-05-05 Werkwijze voor het vervaardigen van een offsetdrukvorm, alsmede werkwijze voor het bedrukken van een kunststofoppervlak met een aldus verkregen drukvorm.

Country Status (8)

Country Link
AT (1) AT297757B (nl)
BE (1) BE680536A (nl)
CH (1) CH463279A (nl)
DE (1) DE1447963B2 (nl)
ES (1) ES326362A1 (nl)
GB (1) GB1154749A (nl)
NL (1) NL149298C (nl)
SE (1) SE340951B (nl)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
CH613059A5 (en) * 1975-06-30 1979-08-31 Hoechst Ag Method for producing a flat-bed printing forme
US4191570A (en) * 1978-10-10 1980-03-04 Polychrome Corporation Process for heat treating lithographic printing plates
DE2855393A1 (de) * 1978-12-21 1980-07-03 Hoechst Ag Verfahren zum herstellen von flachdruckformen
DE3110632A1 (de) * 1981-03-19 1982-09-30 Hoechst Ag, 6000 Frankfurt Verfahren zum einbrennen von lichtempflindlichen schichten bei der herstellung von druckformen
US4587196A (en) * 1981-06-22 1986-05-06 Philip A. Hunt Chemical Corporation Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
US4377631A (en) * 1981-06-22 1983-03-22 Philip A. Hunt Chemical Corporation Positive novolak photoresist compositions
US4529682A (en) * 1981-06-22 1985-07-16 Philip A. Hunt Chemical Corporation Positive photoresist composition with cresol-formaldehyde novolak resins
DE3128951A1 (de) * 1981-07-22 1983-02-10 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von fotopolymer-tiefdurckformen
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
DE3246037A1 (de) * 1982-12-09 1984-06-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch, daraus hergestelltes lichtempfindliches kopiermaterial und verfahren zur herstellung einer druckform aus dem kopiermaterial
US5084372A (en) * 1982-12-09 1992-01-28 Hoechst Celanese Corporation Process for preparing photographic elements utilizing light-sensitive layer containing cyclical acid amide thermo-crosslinking compound
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
EP0196031A3 (en) * 1985-03-22 1987-12-23 Fuji Photo Film Co., Ltd. Light-sensitive compositions and light-sensitive materials
DE3725741A1 (de) * 1987-08-04 1989-02-16 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch
DE3729035A1 (de) * 1987-08-31 1989-03-09 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes photolithographisches aufzeichnungsmaterial
DE3820699A1 (de) * 1988-06-18 1989-12-21 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE3827901A1 (de) * 1988-08-17 1990-02-22 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
GB8822956D0 (en) * 1988-09-30 1988-11-09 Cookson Graphics Plc Baking treatment of lithographic printing plate
DE3940911A1 (de) * 1989-12-12 1991-06-13 Hoechst Ag Verfahren zur herstellung negativer kopien
DE4002397A1 (de) * 1990-01-27 1991-08-01 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4004511A1 (de) * 1990-02-14 1991-08-22 Hoechst Ag Vorrichtung zum einbrennen von lichtempfindlichen schichten waehrend der herstellung von druckformen
DE4004719A1 (de) * 1990-02-15 1991-08-22 Hoechst Ag Strahlungsempfindliches gemisch, hiermit hergestelltes strahlungsempfindliches aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
DE4414897A1 (de) * 1994-04-28 1995-11-02 Hoechst Ag Aromatische Diazoniumsalze und deren Verwendung in strahlungsempfindlichen Gemischen
DE4444669A1 (de) 1994-12-15 1996-06-20 Hoechst Ag Strahlungsempfindliches Gemisch
DE19739299A1 (de) * 1997-09-08 1999-03-11 Agfa Gevaert Ag Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck
DE19834746A1 (de) 1998-08-01 2000-02-03 Agfa Gevaert Ag Strahlungsempfindliches Gemisch mit IR-absorbierenden, betainischen oder betainisch-anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial
DE19834745A1 (de) 1998-08-01 2000-02-03 Agfa Gevaert Ag Strahlungsempfindliches Gemisch mit IR-absorbierenden, anionischen Cyaninfarbstoffen und damit hergestelltes Aufzeichnungsmaterial
JP4184813B2 (ja) 2002-02-19 2008-11-19 コダックグラフィックコミュニケーションズ株式会社 感光性組成物、感光性平版印刷版およびこれを用いた平版印刷版の作製方法
US20060234161A1 (en) 2002-10-04 2006-10-19 Eric Verschueren Method of making a lithographic printing plate precursor
US7348126B2 (en) 2004-04-27 2008-03-25 Agfa Graphics N.V. Negative working, heat-sensitive lithographic printing plate precursor
US7195861B2 (en) 2004-07-08 2007-03-27 Agfa-Gevaert Method for making a negative working, heat-sensitive lithographic printing plate precursor
US7425405B2 (en) 2004-07-08 2008-09-16 Agfa Graphics, N.V. Method for making a lithographic printing plate
US7354696B2 (en) 2004-07-08 2008-04-08 Agfa Graphics Nv Method for making a lithographic printing plate
ATE552111T1 (de) 2008-09-02 2012-04-15 Agfa Graphics Nv Wärmeempfindlicher, positiv arbeitender lithographiedruckformvorläufer
EP2213690B1 (en) 2009-01-30 2015-11-11 Agfa Graphics N.V. A new alkali soluble resin
ATE553920T1 (de) 2009-06-18 2012-05-15 Agfa Graphics Nv Lithographiedruckplattenvorläufer
EP2329951B1 (en) 2009-12-04 2012-06-20 AGFA Graphics NV A lithographic printing plate precursor
EP2366545B1 (en) 2010-03-19 2012-12-05 Agfa Graphics N.V. A lithographic printing plate precursor
EP2668039B1 (en) 2011-01-25 2015-06-03 AGFA Graphics NV A lithographic printing plate precursor
ES2427137T3 (es) 2011-02-18 2013-10-29 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
CN104870193B (zh) 2013-01-01 2017-12-22 爱克发印艺公司 (乙烯、乙烯醇缩醛)共聚物和它们在平版印刷版前体中的用途
EP2933278B1 (en) 2014-04-17 2018-08-22 Agfa Nv (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors
ES2617557T3 (es) 2014-05-15 2017-06-19 Agfa Graphics Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
ES2660063T3 (es) 2014-06-13 2018-03-20 Agfa Nv Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica
EP2963496B1 (en) 2014-06-30 2017-04-05 Agfa Graphics NV A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers
EP3130465B1 (en) 2015-08-12 2020-05-13 Agfa Nv Heat-sensitive lithographic printing plate precursor
EP3170662B1 (en) 2015-11-20 2019-08-14 Agfa Nv A lithographic printing plate precursor

Also Published As

Publication number Publication date
DE1447963A1 (de) 1968-11-14
NL149298B (nl) 1976-04-15
NL6606131A (nl) 1967-05-25
CH463279A (de) 1968-09-30
ES326362A1 (es) 1967-03-01
GB1154749A (en) 1969-06-11
DE1447963B2 (de) 1972-09-07
AT297757B (de) 1972-04-10
BE680536A (nl) 1966-11-04
SE340951B (nl) 1971-12-06

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Legal Events

Date Code Title Description
NP1G Not automatically granted patents, but text of patent specification modified with respect to the text of examined patent application
V4 Lapsed because of reaching the maxim lifetime of a patent