NL1004387C2 - Oximsulfonzuuresters en de toepassing daarvan als latente sulfonzuren. - Google Patents

Oximsulfonzuuresters en de toepassing daarvan als latente sulfonzuren. Download PDF

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Publication number
NL1004387C2
NL1004387C2 NL1004387A NL1004387A NL1004387C2 NL 1004387 C2 NL1004387 C2 NL 1004387C2 NL 1004387 A NL1004387 A NL 1004387A NL 1004387 A NL1004387 A NL 1004387A NL 1004387 C2 NL1004387 C2 NL 1004387C2
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NL
Netherlands
Prior art keywords
alkyl
phenyl
substituted
unsubstituted
groups
Prior art date
Application number
NL1004387A
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English (en)
Dutch (nl)
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NL1004387A1 (nl
Inventor
Kurt Dietliker
Martin Kunz
Original Assignee
Ciba Geigy Ag
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Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of NL1004387A1 publication Critical patent/NL1004387A1/xx
Application granted granted Critical
Publication of NL1004387C2 publication Critical patent/NL1004387C2/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/64—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms
    • C07C309/65—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to acyclic carbon atoms of a saturated carbon skeleton
    • C07C309/66—Methanesulfonates
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/73—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton to carbon atoms of non-condensed six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C07C309/63—Esters of sulfonic acids
    • C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
    • C07C309/75—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing singly-bound oxygen atoms bound to the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/50—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton
    • C07C323/62—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and carboxyl groups bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/06—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
    • C07D311/08—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
    • C07D311/18—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted otherwise than in position 3 or 7
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18—Fluorenes; Hydrogenated fluorenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Dental Preparations (AREA)
NL1004387A 1995-10-31 1996-10-30 Oximsulfonzuuresters en de toepassing daarvan als latente sulfonzuren. NL1004387C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH308095 1995-10-31
CH308095 1995-10-31

Publications (2)

Publication Number Publication Date
NL1004387A1 NL1004387A1 (nl) 1997-05-02
NL1004387C2 true NL1004387C2 (nl) 1998-05-19

Family

ID=4248187

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1004387A NL1004387C2 (nl) 1995-10-31 1996-10-30 Oximsulfonzuuresters en de toepassing daarvan als latente sulfonzuren.

Country Status (19)

Country Link
US (1) US6017675A (ja)
JP (1) JP3975411B2 (ja)
KR (1) KR100441135B1 (ja)
CN (1) CN1088855C (ja)
AT (1) AT407157B (ja)
AU (1) AU709583B2 (ja)
BE (1) BE1010726A5 (ja)
BR (1) BR9605394A (ja)
CA (1) CA2189110A1 (ja)
CH (1) CH691630A5 (ja)
DE (1) DE19644797A1 (ja)
ES (1) ES2122916B1 (ja)
FR (1) FR2740455B1 (ja)
GB (1) GB2306958B (ja)
IT (1) IT1286067B1 (ja)
MX (1) MX9605258A (ja)
MY (1) MY117352A (ja)
NL (1) NL1004387C2 (ja)
SG (1) SG49984A1 (ja)

Families Citing this family (34)

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JP3665166B2 (ja) * 1996-07-24 2005-06-29 東京応化工業株式会社 化学増幅型レジスト組成物及びそれに用いる酸発生剤
US6770420B2 (en) * 1996-09-02 2004-08-03 Ciba Specialty Chemicals Corporation Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
TW550439B (en) * 1997-07-01 2003-09-01 Ciba Sc Holding Ag New oxime sulfonates as latent acids and compositions and photoresists comprising said oxime sulfonates
PL343192A1 (en) 1998-03-13 2001-07-30 Akzo Nobel Nv Non-aqueous coating composition based on an oxidatively drying alkyd resin and a photo-initiator
JP3853967B2 (ja) * 1998-04-13 2006-12-06 富士写真フイルム株式会社 熱硬化性組成物およびこれを用いた平版印刷版用原版ならびにスルホン酸エステル化合物
TW575792B (en) * 1998-08-19 2004-02-11 Ciba Sc Holding Ag New unsaturated oxime derivatives and the use thereof as latent acids
CN1636971A (zh) 1998-10-29 2005-07-13 西巴特殊化学品控股有限公司 肟衍生物及其作为潜酸的用途
KR100591030B1 (ko) 1999-03-03 2006-06-22 시바 스페셜티 케미칼스 홀딩 인크. 옥심 유도체를 포함하는 광중합성 조성물
SG78412A1 (en) 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids
NL1014545C2 (nl) * 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim-derivaten en de toepassing daarvan als latente zuren.
US6797451B2 (en) * 1999-07-30 2004-09-28 Hynix Semiconductor Inc. Reflection-inhibiting resin used in process for forming photoresist pattern
WO2001055789A2 (en) * 2000-01-25 2001-08-02 Infineon Technologies Ag Chemically amplified short wavelength resist
JP2001296666A (ja) * 2000-04-12 2001-10-26 Orc Mfg Co Ltd 基板露光方法および露光装置
US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
TWI272451B (en) 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
ATE288907T1 (de) 2001-06-01 2005-02-15 Ciba Sc Holding Ag Substituierte oxim-derivate und ihre verwendung als latente säuren
JP3633595B2 (ja) * 2001-08-10 2005-03-30 富士通株式会社 レジストパターン膨潤化材料およびそれを用いた微小パターンの形成方法および半導体装置の製造方法
JP4951827B2 (ja) * 2001-08-17 2012-06-13 Ｊｓｒ株式会社 スルホニル構造を有する化合物、それを用いた感放射線性酸発生剤、ポジ型感放射線性樹脂組成物、及びネガ型感放射線性樹脂組成物
AU2003206787A1 (en) * 2002-02-06 2003-09-02 Ciba Specialty Chemicals Holding Inc. Sulfonate derivatives and the use therof as latent acids
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
WO2004074242A2 (en) * 2003-02-19 2004-09-02 Ciba Specialty Chemicals Holding Inc. Halogenated oxime derivatives and the use thereof as latent acids
JP2004333865A (ja) * 2003-05-07 2004-11-25 Osaka Gas Co Ltd 光酸発生剤及びそれを含む光重合性樹脂組成物
CA2574054A1 (en) * 2004-07-20 2006-01-26 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use therof as latent acids
JP4644464B2 (ja) * 2004-10-19 2011-03-02 株式会社トクヤマ 歯科用修復材料
JP4631059B2 (ja) * 2006-03-30 2011-02-16 国立大学法人 千葉大学 光酸発生材料、これを用いたフォトリソグラフィー材料、光パターニングまたは光リソグラフィー
CN101473268A (zh) * 2006-06-20 2009-07-01 西巴控股有限公司 肟磺酸酯和其作为潜伏酸的用途
KR20090043591A (ko) * 2006-08-24 2009-05-06 시바 홀딩 인크 Ｕｖ-선량 표시기
KR101439951B1 (ko) 2007-02-15 2014-09-17 주식회사 동진쎄미켐 설포닐기를 포함하는 포토레지스트 모노머, 폴리머 및 이를 포함하는 포토레지스트 조성물
JP4637221B2 (ja) * 2007-09-28 2011-02-23 富士フイルム株式会社 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法
JP5308657B2 (ja) * 2007-12-10 2013-10-09 東京応化工業株式会社 非イオン性感光性化合物、酸発生剤、レジスト組成物およびレジストパターン形成方法
JP5676179B2 (ja) * 2010-08-20 2015-02-25 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5335045B2 (ja) * 2011-08-31 2013-11-06 富士フイルム株式会社 感光性樹脂組成物、オキシムスルホネート化合物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
KR102537349B1 (ko) * 2015-02-02 2023-05-26 바스프 에스이 잠재성 산 및 그의 용도
JP6605820B2 (ja) * 2015-03-11 2019-11-13 株式会社Ａｄｅｋａ オキシムスルホネート化合物、光酸発生剤、レジスト組成物、カチオン重合開始剤、およびカチオン重合性組成物

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0012158A2 (de) * 1978-09-01 1980-06-25 Ciba-Geigy Ag Oximderivate und ihre Anwendung zum Schutz von Pflanzenkulturen
EP0048615A1 (en) * 1980-09-22 1982-03-31 Eli Lilly And Company Improvements in or relating to 3-aryl-5-isothiazole derivatives
US4451286A (en) * 1977-03-02 1984-05-29 Ciba-Geigy Corporation Compositions, which influence plant growth and protect plants based on oxime ethers and oxime esters
EP0139609A1 (de) * 1983-08-17 1985-05-02 Ciba-Geigy Ag Verfahren zum Härten säurehärtbarer Lacke
EP0199672A1 (de) * 1985-04-12 1986-10-29 Ciba-Geigy Ag Oximsulfonate mit reaktiven Gruppen
EP0241423A2 (de) * 1986-04-08 1987-10-14 Ciba-Geigy Ag Verfahren zur Herstellung positiver Abbildungen
EP0361907A2 (en) * 1988-09-29 1990-04-04 Hoechst Celanese Corporation Photoresist compositions for deep UV image reversal
EP0571330A1 (de) * 1992-05-22 1993-11-24 Ciba-Geigy Ag Hochauflösender I-Linien Photoresist mit höhere Empfindlichkeit
EP0592139A1 (en) * 1992-10-06 1994-04-13 Ciba-Geigy Ag Composition for priming and cleaning based on organosilane

Family Cites Families (1)

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Publication number Priority date Publication date Assignee Title
JP3830183B2 (ja) * 1995-09-29 2006-10-04 東京応化工業株式会社 オキシムスルホネート化合物及びレジスト用酸発生剤

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4451286A (en) * 1977-03-02 1984-05-29 Ciba-Geigy Corporation Compositions, which influence plant growth and protect plants based on oxime ethers and oxime esters
EP0012158A2 (de) * 1978-09-01 1980-06-25 Ciba-Geigy Ag Oximderivate und ihre Anwendung zum Schutz von Pflanzenkulturen
EP0048615A1 (en) * 1980-09-22 1982-03-31 Eli Lilly And Company Improvements in or relating to 3-aryl-5-isothiazole derivatives
EP0139609A1 (de) * 1983-08-17 1985-05-02 Ciba-Geigy Ag Verfahren zum Härten säurehärtbarer Lacke
EP0199672A1 (de) * 1985-04-12 1986-10-29 Ciba-Geigy Ag Oximsulfonate mit reaktiven Gruppen
EP0241423A2 (de) * 1986-04-08 1987-10-14 Ciba-Geigy Ag Verfahren zur Herstellung positiver Abbildungen
EP0361907A2 (en) * 1988-09-29 1990-04-04 Hoechst Celanese Corporation Photoresist compositions for deep UV image reversal
EP0571330A1 (de) * 1992-05-22 1993-11-24 Ciba-Geigy Ag Hochauflösender I-Linien Photoresist mit höhere Empfindlichkeit
EP0592139A1 (en) * 1992-10-06 1994-04-13 Ciba-Geigy Ag Composition for priming and cleaning based on organosilane

Also Published As

Publication number Publication date
CH691630A5 (de) 2001-08-31
AT407157B (de) 2001-01-25
ATA190596A (de) 2000-05-15
FR2740455B1 (fr) 1999-01-29
IT1286067B1 (it) 1998-07-07
GB2306958B (en) 1999-12-15
BR9605394A (pt) 1998-07-28
NL1004387A1 (nl) 1997-05-02
US6017675A (en) 2000-01-25
CN1088855C (zh) 2002-08-07
ES2122916A1 (es) 1998-12-16
MX9605258A (es) 1997-04-30
GB9621798D0 (en) 1996-12-11
JP3975411B2 (ja) 2007-09-12
BE1010726A5 (fr) 1998-12-01
DE19644797A1 (de) 1997-05-07
AU709583B2 (en) 1999-09-02
MY117352A (en) 2004-06-30
ES2122916B1 (es) 1999-08-16
KR970022553A (ko) 1997-05-30
GB2306958A (en) 1997-05-14
AU7038296A (en) 1997-05-08
FR2740455A1 (fr) 1997-04-30
ITMI962251A1 (it) 1998-04-30
KR100441135B1 (ko) 2004-10-02
SG49984A1 (en) 2001-01-16
JPH09222725A (ja) 1997-08-26
CA2189110A1 (en) 1997-05-01
CN1153926A (zh) 1997-07-09

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