MY175223A - Cleaning lead-frames to improve wirebonding process - Google Patents
Cleaning lead-frames to improve wirebonding processInfo
- Publication number
- MY175223A MY175223A MYPI2013702006A MYPI2013702006A MY175223A MY 175223 A MY175223 A MY 175223A MY PI2013702006 A MYPI2013702006 A MY PI2013702006A MY PI2013702006 A MYPI2013702006 A MY PI2013702006A MY 175223 A MY175223 A MY 175223A
- Authority
- MY
- Malaysia
- Prior art keywords
- frames
- improve
- wirebonding process
- cleaning lead
- substrate
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- 238000004140 cleaning Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 4
- 239000000203 mixture Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4821—Flat leads, e.g. lead frames with or without insulating supports
- H01L21/4835—Cleaning, e.g. removing of solder
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
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- H01L2924/01—Chemical elements
- H01L2924/0105—Tin [Sn]
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- H—ELECTRICITY
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- H01L2924/01—Chemical elements
- H01L2924/01075—Rhenium [Re]
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- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/146—Mixed devices
- H01L2924/1461—MEMS
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/157—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2924/15738—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
- H01L2924/15747—Copper [Cu] as principal constituent
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Emergency Medicine (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Wire Bonding (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161478582P | 2011-04-25 | 2011-04-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
MY175223A true MY175223A (en) | 2020-06-16 |
Family
ID=47073028
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2013702006A MY175223A (en) | 2011-04-25 | 2012-04-25 | Cleaning lead-frames to improve wirebonding process |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP2702607A4 (fr) |
JP (1) | JP6030637B2 (fr) |
KR (1) | KR101729203B1 (fr) |
CN (1) | CN103620753B (fr) |
MY (1) | MY175223A (fr) |
SG (1) | SG194523A1 (fr) |
TW (1) | TWI467675B (fr) |
WO (1) | WO2012148967A2 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201428901A (zh) * | 2013-01-07 | 2014-07-16 | 矽品精密工業股份有限公司 | 半導體封裝件及其製法 |
CN105873691B (zh) | 2013-12-06 | 2018-04-20 | 富士胶片电子材料美国有限公司 | 用于去除表面上的残余物的清洗调配物 |
US11302669B2 (en) | 2015-10-15 | 2022-04-12 | Skyworks Solutions, Inc. | Wire bond cleaning method and wire bonding recovery process |
EP3774680A4 (fr) | 2018-03-28 | 2021-05-19 | FUJIFILM Electronic Materials U.S.A, Inc. | Compositions de nettoyage |
US10713583B1 (en) | 2019-01-02 | 2020-07-14 | International Business Machines Corporation | Removal of wirebonds in quantum hardware |
JP7296835B2 (ja) | 2019-09-19 | 2023-06-23 | 株式会社ディスコ | ウェーハの処理方法、及び、チップ測定装置 |
CN117594453B (zh) * | 2024-01-18 | 2024-05-28 | 瑞能微恩半导体(上海)有限公司 | 晶体管封装结构体的封装方法和晶体管封装结构体 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS6057219B2 (ja) * | 1980-12-26 | 1985-12-13 | 株式会社東芝 | 半導体装置 |
US4968397A (en) * | 1989-11-27 | 1990-11-06 | Asher Reginald K | Non-cyanide electrode cleaning process |
JP2539093B2 (ja) * | 1990-10-25 | 1996-10-02 | 三菱マテリアル株式会社 | リ―ドフレ―ムとその製造方法及び半導体装置 |
JP3160344B2 (ja) | 1991-01-25 | 2001-04-25 | アシュランド インコーポレーテッド | 有機ストリッピング組成物 |
US5433885A (en) | 1991-07-17 | 1995-07-18 | Church & Dwight Co., Inc. | Stabilization of silicate solutions |
DE4444388A1 (de) * | 1994-11-28 | 1996-05-30 | Atotech Deutschland Gmbh | Verfahren zum Bonden von Drähten auf oxidationsempfindlichen, lötbaren Metallsubstraten |
JPH08293576A (ja) * | 1995-04-25 | 1996-11-05 | Toppan Printing Co Ltd | リードフレームおよびその製造方法 |
JP2904192B2 (ja) * | 1997-06-25 | 1999-06-14 | 日本電気株式会社 | 半導体装置の製造方法 |
US6230719B1 (en) * | 1998-02-27 | 2001-05-15 | Micron Technology, Inc. | Apparatus for removing contaminants on electronic devices |
US6828289B2 (en) | 1999-01-27 | 2004-12-07 | Air Products And Chemicals, Inc. | Low surface tension, low viscosity, aqueous, acidic compositions containing fluoride and organic, polar solvents for removal of photoresist and organic and inorganic etch residues at room temperature |
US6358847B1 (en) * | 1999-03-31 | 2002-03-19 | Lam Research Corporation | Method for enabling conventional wire bonding to copper-based bond pad features |
US6693020B2 (en) * | 2001-03-12 | 2004-02-17 | Motorola, Inc. | Method of preparing copper metallization die for wirebonding |
JP4044296B2 (ja) * | 2001-03-22 | 2008-02-06 | 株式会社東芝 | 半導体装置の製造方法 |
US6627546B2 (en) * | 2001-06-29 | 2003-09-30 | Ashland Inc. | Process for removing contaminant from a surface and composition useful therefor |
KR100972061B1 (ko) * | 2002-12-30 | 2010-07-22 | 동부일렉트로닉스 주식회사 | 반도체 소자의 패드 알루미늄 처리 방법 |
US7049683B1 (en) | 2003-07-19 | 2006-05-23 | Ns Electronics Bangkok (1993) Ltd. | Semiconductor package including organo-metallic coating formed on surface of leadframe roughened using chemical etchant to prevent separation between leadframe and molding compound |
JP2005150508A (ja) * | 2003-11-18 | 2005-06-09 | Sanyo Electric Co Ltd | 半導体装置の製造方法 |
JP4700633B2 (ja) * | 2007-02-15 | 2011-06-15 | 株式会社新川 | ワイヤ洗浄ガイド |
JP2009099945A (ja) * | 2007-09-28 | 2009-05-07 | Fujifilm Corp | 半導体デバイス用洗浄剤及びそれを用いた洗浄方法 |
CN101425468B (zh) * | 2007-10-29 | 2012-07-04 | 飞思卡尔半导体(中国)有限公司 | 经过涂敷的引线框 |
US9048088B2 (en) * | 2008-03-28 | 2015-06-02 | Lam Research Corporation | Processes and solutions for substrate cleaning and electroless deposition |
JP5561914B2 (ja) * | 2008-05-16 | 2014-07-30 | 関東化学株式会社 | 半導体基板洗浄液組成物 |
US20100155260A1 (en) | 2008-12-22 | 2010-06-24 | Kwan Yiu Fai | Micro-blasting treatment for lead frames |
-
2012
- 2012-04-25 TW TW101114791A patent/TWI467675B/zh not_active IP Right Cessation
- 2012-04-25 JP JP2014508496A patent/JP6030637B2/ja not_active Expired - Fee Related
- 2012-04-25 EP EP12776905.7A patent/EP2702607A4/fr not_active Ceased
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- 2012-04-25 MY MYPI2013702006A patent/MY175223A/en unknown
- 2012-04-25 KR KR1020137031200A patent/KR101729203B1/ko active IP Right Grant
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SG194523A1 (en) | 2013-12-30 |
JP2014516478A (ja) | 2014-07-10 |
WO2012148967A3 (fr) | 2013-01-17 |
TWI467675B (zh) | 2015-01-01 |
JP6030637B2 (ja) | 2016-11-24 |
KR20130142197A (ko) | 2013-12-27 |
CN103620753A (zh) | 2014-03-05 |
WO2012148967A2 (fr) | 2012-11-01 |
CN103620753B (zh) | 2017-05-24 |
KR101729203B1 (ko) | 2017-04-21 |
EP2702607A4 (fr) | 2015-06-24 |
EP2702607A2 (fr) | 2014-03-05 |
TW201308455A (zh) | 2013-02-16 |
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