MXPA03005143A - Fotoiniciadores tensoactivos. - Google Patents

Fotoiniciadores tensoactivos.

Info

Publication number
MXPA03005143A
MXPA03005143A MXPA03005143A MXPA03005143A MXPA03005143A MX PA03005143 A MXPA03005143 A MX PA03005143A MX PA03005143 A MXPA03005143 A MX PA03005143A MX PA03005143 A MXPA03005143 A MX PA03005143A MX PA03005143 A MXPA03005143 A MX PA03005143A
Authority
MX
Mexico
Prior art keywords
active photoinitiators
photoinitiators
active
Prior art date
Application number
MXPA03005143A
Other languages
English (en)
Inventor
Jung Tunja
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of MXPA03005143A publication Critical patent/MXPA03005143A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/46—Friedel-Crafts reactions
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/67—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton
    • C07C45/68—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C45/70—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form
    • C07C45/71—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by reaction with functional groups containing oxygen only in singly bound form being hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/06—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
    • C07D311/08—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
    • C07D311/12—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted in position 3 and unsubstituted in position 7
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16—Oxygen atoms, e.g. thioxanthones
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0834—Compounds having one or more O-Si linkage
    • C07F7/0838—Compounds with one or more Si-O-Si sequences

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
MXPA03005143A 2000-12-13 2001-12-06 Fotoiniciadores tensoactivos. MXPA03005143A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00811185 2000-12-13
PCT/EP2001/014357 WO2002048204A1 (en) 2000-12-13 2001-12-06 Surface-active photoinitiators

Publications (1)

Publication Number Publication Date
MXPA03005143A true MXPA03005143A (es) 2003-09-22

Family

ID=8175076

Family Applications (1)

Application Number Title Priority Date Filing Date
MXPA03005143A MXPA03005143A (es) 2000-12-13 2001-12-06 Fotoiniciadores tensoactivos.

Country Status (10)

Country Link
US (1) US20040033317A1 (es)
EP (1) EP1353959A1 (es)
JP (1) JP2004522819A (es)
KR (1) KR20030063422A (es)
CN (1) CN1481392A (es)
AU (1) AU2002224919A1 (es)
BR (1) BR0116141A (es)
CA (1) CA2431619A1 (es)
MX (1) MXPA03005143A (es)
WO (1) WO2002048204A1 (es)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
EP1594904A1 (en) * 2003-02-20 2005-11-16 Ciba SC Holding AG Photocurable compositions
RU2351615C2 (ru) * 2003-06-06 2009-04-10 Циба Спешиалти Кемикэлз Холдинг Инк. Новые поверхностно-активные полисилоксановые фотоинициаторы
BRPI0616087A2 (pt) * 2005-09-22 2011-06-07 Ciba Sc Holding Ag polìmero reistente a arranhões, bem como composições de revestimento e método para prover resistência a arranhÈes
EP1783548B1 (en) 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Method of forming a patterned layer on a substrate
JP2007264291A (ja) * 2006-03-28 2007-10-11 Fujifilm Corp 反射防止フィルム、偏光板、および画像表示装置
KR101057546B1 (ko) * 2007-06-05 2011-08-17 주식회사 엘지화학 광학 이방성 화합물 및 이를 포함하는 수지 조성물
CN101735345B (zh) * 2008-11-11 2012-06-20 北京英力科技发展有限公司 2-氯-4'-苯基二苯甲酮作为光引发剂的组合物
WO2010077132A1 (en) 2008-12-31 2010-07-08 Draka Comteq B.V. Uvled apparatus for curing glass-fiber coatings
CA2794795C (en) 2010-03-30 2020-05-19 Surmodics, Inc. Degradable photo-crosslinker
DK2388239T3 (da) 2010-05-20 2017-04-24 Draka Comteq Bv Hærdningsapparat, der anvender vinklede UV-LED'er
US8871311B2 (en) 2010-06-03 2014-10-28 Draka Comteq, B.V. Curing method employing UV sources that emit differing ranges of UV radiation
EP2418183B1 (en) 2010-08-10 2018-07-25 Draka Comteq B.V. Method for curing coated glass fibres providing increased UVLED intensitiy
US10315987B2 (en) 2010-12-13 2019-06-11 Surmodics, Inc. Photo-crosslinker
KR102263350B1 (ko) * 2013-08-14 2021-06-11 듀폰 도레이 스페셜티 머티리얼즈 가부시키가이샤 신규한 오가노폴리실록산, 이를 포함하는 표면 처리제, 이를 포함하는 수지 조성물, 및 이의 겔상물 또는 경화물
CN108137624B (zh) * 2015-08-18 2021-01-05 新加坡科技研究局 用作引发剂和纳米填料二者的光引发剂
HUE056740T2 (hu) * 2016-06-20 2022-03-28 Sekisui Medical Co Ltd Új difenilmetán védõszer
IL257535B (en) * 2018-02-14 2020-01-30 N3 Coat Ltd Benzophenone compounds as light catalysts for polyolefins
WO2020013765A1 (en) * 2018-07-11 2020-01-16 Structo Pte Ltd Methods and composition of a dental model for the manufacture of orthodontic appliances without the use of separator
CN111324010A (zh) * 2018-12-17 2020-06-23 固安鼎材科技有限公司 一种感光树脂组合物及其用途、一种彩色滤光片
CN111324012A (zh) * 2018-12-17 2020-06-23 固安鼎材科技有限公司 一种改性光引发剂及其制备方法和用途
JP2021146242A (ja) * 2020-03-17 2021-09-27 株式会社豊田中央研究所 電子線硬化型水性塗料の塗装方法
CN111808525B (zh) * 2020-09-07 2021-01-19 佛山宜可居新材料有限公司 一种多相结构uv光固化粉末涂料树脂及其制备方法

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DE971002C (de) * 1950-11-22 1958-11-27 Sterling Drug Inc Verfahren zur Herstellung von Thioxanthonen
US2938047A (en) * 1958-11-13 1960-05-24 Union Carbide Corp Carbobenzophenoneoxyalkyl siloxanes and their preparation
CH423473A (de) * 1963-01-19 1966-10-31 Ciba Geigy Verfahren zur Herstellung eines photographischen Farbenbildes unter Verwendung neuer Thiophenverbindungen als Farbstoffbildner für Purpurfarbstoffe
US4042613A (en) * 1974-04-23 1977-08-16 Dai Nippon Printing Co., Ltd. Benzophenone derivatives and their preparation and application
DE3008411A1 (de) * 1980-03-05 1981-09-10 Merck Patent Gmbh, 6100 Darmstadt Neue aromatisch-aliphatische ketone, ihre verwendung als photoinitiatoren sowie photopolymerisierbare systeme enthaltend solche ketone
US4278804A (en) * 1980-05-30 1981-07-14 General Electric Company Ultraviolet light absorbing agents and compositions and articles containing same
US4467082A (en) * 1982-03-15 1984-08-21 Dow Corning Corporation Organopolysiloxane photosensitizers and methods for their preparation
EP0088842B1 (en) * 1982-03-16 1986-01-02 Toray Silicone Company Limited Organopolysiloxane photosensitizers and methods for their preparation
US4507187A (en) * 1984-04-19 1985-03-26 Loctite Corporation Siloxane photoinitiators with aryoyl formate groups
US4585669A (en) * 1984-09-28 1986-04-29 General Electric Company Novel dual cure silicone compositions
US4698286A (en) * 1985-06-03 1987-10-06 Hercules Incorporated Plasma developable photoresist compositions containing perylene coumarin photosensitizer
IL84254A (en) * 1986-11-12 1991-08-16 Thiokol Morton Inc Photoinitiator composition for photopolymerization
US5270426A (en) * 1990-01-22 1993-12-14 Shin-Etsu Chemical Co., Ltd. Organosilicon compound
JPH0789895A (ja) * 1993-02-09 1995-04-04 Asahi Glass Co Ltd 含フッ素ベンゾフェノン誘導体およびその用途
EP0667379B1 (de) * 1994-02-10 2002-07-17 Ciba SC Holding AG Holzschutzanstrich
DE4435487A1 (de) * 1994-10-04 1996-04-11 Hoechst Ag Mit Silikonen kompatible Photoinitiatoren und diese enthaltende lichtempfindliche Gemische
CA2163060A1 (en) * 1995-11-16 1997-05-17 Jack Paavila Ice cream confection
FR2750429B1 (fr) * 1996-06-27 1998-08-07 Essilor Int Materiau a base de silicone reticule comportant un photoamorceur fixe, son procede de preparation, produit polymerique hydrophile obtenu a partir de ce materiau et son procede de preparation, et nouveaux photoamorceurs
AU3341297A (en) * 1996-07-02 1998-01-21 Ciba Specialty Chemicals Holding Inc. Process for curing a polymerizable composition
US6025408A (en) * 1997-03-27 2000-02-15 First Chemical Corporation Liquid thioxanthone photoinitiators
US6376568B1 (en) * 1999-07-29 2002-04-23 Ciba Specialty Chemicals Corporation Surface-active photoinitiators
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings
KR20030063416A (ko) * 2000-12-13 2003-07-28 시바 스페셜티 케미칼스 홀딩 인크. 계면 활성 광 개시제

Also Published As

Publication number Publication date
AU2002224919A1 (en) 2002-06-24
US20040033317A1 (en) 2004-02-19
CN1481392A (zh) 2004-03-10
BR0116141A (pt) 2003-10-21
JP2004522819A (ja) 2004-07-29
WO2002048204A1 (en) 2002-06-20
CA2431619A1 (en) 2002-06-20
KR20030063422A (ko) 2003-07-28
EP1353959A1 (en) 2003-10-22

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Legal Events

Date Code Title Description
FA Abandonment or withdrawal