MX384099B - Placa de impresión flexográfica, con formación de imagen digital, con capa de barrera integrada. - Google Patents

Placa de impresión flexográfica, con formación de imagen digital, con capa de barrera integrada.

Info

Publication number
MX384099B
MX384099B MX2017015163A MX2017015163A MX384099B MX 384099 B MX384099 B MX 384099B MX 2017015163 A MX2017015163 A MX 2017015163A MX 2017015163 A MX2017015163 A MX 2017015163A MX 384099 B MX384099 B MX 384099B
Authority
MX
Mexico
Prior art keywords
flexo
barrier layer
î1⁄4m
layer
binding agent
Prior art date
Application number
MX2017015163A
Other languages
English (en)
Other versions
MX2017015163A (es
Inventor
Armin Becker
Matthias Beyer
Original Assignee
Flint Group Germany Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Flint Group Germany Gmbh filed Critical Flint Group Germany Gmbh
Publication of MX2017015163A publication Critical patent/MX2017015163A/es
Publication of MX384099B publication Critical patent/MX384099B/es

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/12Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00Forme preparation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0047Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202Masking pattern being obtained by thermal means, e.g. laser ablation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/36Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

La invención se refiere a un elemento de impresión flexográfica fotopolimerizable, con formación de imagen digital, para producir formas de impresión flexográfica, que comprende - dispuestos uno encima de otro en el orden establecido - (A) al menos un soporte dimensionalmente estable, (B) al menos una capa formadora de relieve fotopolimerizable, con un espesor de capa de 300-6000 µm, que comprende al menos un agente aglutinante elastomérico, un monómero etilénicamente insaturado así como un fotoiniciador o un sistema fotoiniciador, (C) una capa de barrera que es transparente para la luz UVA y bloquea el oxígeno, con un espesor de capa de 0.3-5 µm, (D) una capa de máscara ablatable por láser con un espesor de capa de 0.3-5 µm, que comprende al menos un agente aglutinante elastomérico y un material absorbente de luz UVA/lS, así como (E) una película de recubrimiento retirable, en donde las capas (B), (C) y (D) pueden disolverse o dispersarse en un solvente orgánico, y la capa de barrera (C) contiene al menos un agente aglutinante bloqueador de oxígeno y un componente adhesivo básico oligomérico o polimérico. La invención también se refiere a un método para producir una forma de impresión flexográfica, y a una forma de impresión flexográfica que se puede obtener usando el método.
MX2017015163A 2015-05-28 2016-05-24 Placa de impresión flexográfica, con formación de imagen digital, con capa de barrera integrada. MX384099B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP15169554 2015-05-28
PCT/EP2016/061640 WO2016188981A1 (de) 2015-05-28 2016-05-24 Digital bebilderbare flexodruckplatte mit integraler barriereschicht

Publications (2)

Publication Number Publication Date
MX2017015163A MX2017015163A (es) 2018-03-28
MX384099B true MX384099B (es) 2025-03-14

Family

ID=53298147

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2017015163A MX384099B (es) 2015-05-28 2016-05-24 Placa de impresión flexográfica, con formación de imagen digital, con capa de barrera integrada.

Country Status (8)

Country Link
US (1) US10518571B2 (es)
EP (2) EP3633454A1 (es)
JP (2) JP2018517179A (es)
CN (1) CN107969149B (es)
BR (1) BR112017025209B1 (es)
ES (1) ES2781325T3 (es)
MX (1) MX384099B (es)
WO (1) WO2016188981A1 (es)

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WO2018069242A1 (de) 2016-10-10 2018-04-19 Akk Gmbh Verbundplatte mit sperrschicht und verfahren zur herstellung einer hochdruckplatte
JP7036536B2 (ja) * 2016-12-01 2022-03-15 旭化成株式会社 フレキソ印刷原版
US11822246B2 (en) 2017-10-10 2023-11-21 Flint Group Germany Gmbh Relief precursor having low cupping and fluting
ES2992559T3 (es) * 2018-02-16 2024-12-13 Miraclon Corp Precursor de elemento de máscara y sistema de formación de imagen en relieve
US12099302B2 (en) 2018-12-10 2024-09-24 Asahi Kasei Kabushiki Kaisha Flexographic printing raw plate and manufacturing method of flexographic printing plate
US12023706B2 (en) 2019-06-05 2024-07-02 Esko-Graphics Imaging Gmbh Systems and methods for combined radiation and functional layer application
EP3832389A1 (de) 2019-12-06 2021-06-09 Folex AG Hochauflösende flexodruckplatte und mittel zu deren herstellung mit verbesserter sperrschicht und haftungsmodulierende schicht
CN114683675B (zh) * 2020-12-28 2023-11-14 乐凯华光印刷科技有限公司 一种表面自带纹理的平顶网点的柔性树脂版及其制版方法
CN114474959B (zh) * 2022-01-29 2024-10-22 乐凯华光印刷科技有限公司 一种阻氧层及包含其的凸起部分表面砂目化的自平顶网点数字化柔性树脂版
US12474639B2 (en) 2022-04-27 2025-11-18 Miraclon Corporation Flexographic printing mask with laser thermal imaging film
EP4495691A1 (en) 2023-07-18 2025-01-22 Eco3 Bv Relief forming plate precursors
WO2025017000A1 (en) 2023-07-18 2025-01-23 Eco3 Bv Relief forming plate precursors

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Also Published As

Publication number Publication date
EP3304203B1 (de) 2020-01-01
EP3304203A1 (de) 2018-04-11
CN107969149B (zh) 2021-12-17
EP3633454A1 (de) 2020-04-08
JP2021167970A (ja) 2021-10-21
ES2781325T3 (es) 2020-09-01
BR112017025209B1 (pt) 2022-04-19
MX2017015163A (es) 2018-03-28
US20180170088A1 (en) 2018-06-21
US10518571B2 (en) 2019-12-31
BR112017025209A2 (pt) 2018-08-07
JP7242771B2 (ja) 2023-03-20
WO2016188981A1 (de) 2016-12-01
CN107969149A (zh) 2018-04-27
JP2018517179A (ja) 2018-06-28

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