MX167928B - Metodo no fotografico para fabricar diseños en peliculas polimericas - Google Patents

Metodo no fotografico para fabricar diseños en peliculas polimericas

Info

Publication number
MX167928B
MX167928B MX022928A MX2292890A MX167928B MX 167928 B MX167928 B MX 167928B MX 022928 A MX022928 A MX 022928A MX 2292890 A MX2292890 A MX 2292890A MX 167928 B MX167928 B MX 167928B
Authority
MX
Mexico
Prior art keywords
layer
polymeric films
design
diluent
organic polymer
Prior art date
Application number
MX022928A
Other languages
English (en)
Inventor
John James Felten
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of MX167928B publication Critical patent/MX167928B/es

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/12—Stencil printing; Silk-screen printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/102—Glass compositions containing silica with 40% to 90% silica, by weight containing lead
    • C03C3/108—Glass compositions containing silica with 40% to 90% silica, by weight containing lead containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/10—Frit compositions, i.e. in a powdered or comminuted form containing lead
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14—Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/481—Insulating layers on insulating parts, with or without metallisation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0502—Patterning and lithography
    • H05K2203/0511—Diffusion patterning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

La presente invención se refiere a un método no grafico para preparar diseños o modelos en películas poliméticas orgánicas, caracterizado porque comprende en secuencia las etapas de: a. aplicar a un sustrato una primera capa sin diseño, que consiste de un polímero orgánico sólido el cual es dispersable en un diluyente predeterminado; b. aplicar a la primera capa sin el diseño una segunda capa con el diseño, que consiste de un agente el cual es capaz de cambiar la dispersabilidad del polímero orgánico sólido en el diluyente predeterminado; c. efectuar la difusión del diseño del agente que cambia la dispersabilidad en la capa de polímero orgánico sólido subyacente; y d. eliminar las áreas de la primera capa subyacente, las cuales son dispersables en el diluyente, lavándolas con el diluyente predeterminado.
MX022928A 1989-10-20 1990-10-19 Metodo no fotografico para fabricar diseños en peliculas polimericas MX167928B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US42538789A 1989-10-20 1989-10-20
US07/573,075 US5032216A (en) 1989-10-20 1990-08-29 Non-photographic method for patterning organic polymer films

Publications (1)

Publication Number Publication Date
MX167928B true MX167928B (es) 1993-04-22

Family

ID=27026664

Family Applications (1)

Application Number Title Priority Date Filing Date
MX022928A MX167928B (es) 1989-10-20 1990-10-19 Metodo no fotografico para fabricar diseños en peliculas polimericas

Country Status (10)

Country Link
US (1) US5032216A (es)
EP (1) EP0497896B1 (es)
JP (1) JP2592548B2 (es)
KR (1) KR960010009B1 (es)
CN (1) CN1024980C (es)
CA (1) CA2069306A1 (es)
DE (1) DE69030261T2 (es)
MX (1) MX167928B (es)
MY (1) MY106618A (es)
WO (1) WO1991006118A1 (es)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153194A (en) * 1988-09-21 1992-10-06 Yoshitomi Pharmaceutical Industries, Ltd. Thienocycloheptapyridazine compounds and their pharmaceutical use
US5209814A (en) * 1991-09-30 1993-05-11 E. I. Du Pont De Nemours And Company Method for diffusion patterning
US5275689A (en) * 1991-11-14 1994-01-04 E. I. Du Pont De Nemours And Company Method and compositions for diffusion patterning
US5654354A (en) * 1991-11-14 1997-08-05 E. I. Du Pont De Nemours And Company Compositions for diffusion patterning
JPH05205989A (ja) * 1992-01-28 1993-08-13 Hitachi Ltd リソグラフィ法及び半導体装置の製造方法
US5260163A (en) * 1992-05-07 1993-11-09 E. I. Du Pont De Nemours And Company Photoenhanced diffusion patterning for organic polymer films
US5270078A (en) * 1992-08-14 1993-12-14 E. I. Du Pont De Nemours And Company Method for preparing high resolution wash-off images
US5635334A (en) * 1992-08-21 1997-06-03 E. I. Du Pont De Nemours And Company Process for making plasma display apparatus with pixel ridges made of diffusion patterned dielectrics
JPH06267439A (ja) * 1992-08-21 1994-09-22 Du Pont Kk プラズマディスプレイ装置およびその製造方法
US5292556A (en) * 1992-12-22 1994-03-08 E. I. Du Pont De Nemours And Company Method for preparing negative-working wash-off relief images
DE69328418T2 (de) * 1993-02-26 2001-01-04 Du Pont Verfahren zur Herstellung eines Plasma-Anzeigegeräts
EP0613166B1 (en) * 1993-02-26 2000-04-19 E.I. Du Pont De Nemours And Company Method of making plasma display apparatus
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US5776748A (en) * 1993-10-04 1998-07-07 President And Fellows Of Harvard College Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
US6776094B1 (en) * 1993-10-04 2004-08-17 President & Fellows Of Harvard College Kit For Microcontact Printing
US6180239B1 (en) 1993-10-04 2001-01-30 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles
US5900160A (en) * 1993-10-04 1999-05-04 President And Fellows Of Harvard College Methods of etching articles via microcontact printing
US5411628A (en) * 1993-10-21 1995-05-02 E. I. Du Pont De Nemours And Company Diffusion patterning process and screen therefor
US5466653A (en) * 1994-06-29 1995-11-14 E. I. Du Pont De Nemours And Company Method for preparing negative-working wash-off relief images and non-photosensitive elements for use therein
US6472148B1 (en) 1994-09-26 2002-10-29 President And Fellows Of Harvard College Molecular recognition at surfaces derivatized with self-assembled monolayers
US5620850A (en) * 1994-09-26 1997-04-15 President And Fellows Of Harvard College Molecular recognition at surfaces derivatized with self-assembled monolayers
EP0742585A1 (en) * 1995-05-08 1996-11-13 E.I. Du Pont De Nemours And Company Method and compositions for diffusion patterning tape on substrate
US20040137734A1 (en) * 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US7758794B2 (en) * 2001-10-29 2010-07-20 Princeton University Method of making an article comprising nanoscale patterns with reduced edge roughness
US6020047A (en) * 1996-09-04 2000-02-01 Kimberly-Clark Worldwide, Inc. Polymer films having a printed self-assembling monolayer
US7014992B1 (en) 1996-11-05 2006-03-21 Clinical Micro Sensors, Inc. Conductive oligomers attached to electrodes and nucleoside analogs
US6048623A (en) * 1996-12-18 2000-04-11 Kimberly-Clark Worldwide, Inc. Method of contact printing on gold coated films
KR100609365B1 (ko) * 1997-03-25 2006-08-09 이 아이 듀폰 디 네모아 앤드 캄파니 디스플레이 패널용 필드 이미터 캐소드 배면판 구조물
US5888287A (en) * 1997-04-10 1999-03-30 Markem Corporation Washable fabrics ink
US7122615B1 (en) * 1998-09-10 2006-10-17 Rutgers, The State University Of New Jersey Polyanhydrides with therapeutically useful degradation products
US6022485A (en) 1997-10-17 2000-02-08 International Business Machines Corporation Method for controlled removal of material from a solid surface
US7087148B1 (en) 1998-06-23 2006-08-08 Clinical Micro Sensors, Inc. Binding acceleration techniques for the detection of analytes
US20020177135A1 (en) * 1999-07-27 2002-11-28 Doung Hau H. Devices and methods for biochip multiplexing
US20060208621A1 (en) * 1999-09-21 2006-09-21 Amey Daniel I Jr Field emitter cathode backplate structures for display panels
US20030104614A1 (en) * 2000-02-11 2003-06-05 Uhrich Kathryn E. Micropatterning surfaces of polymeric substrates
US6753143B2 (en) 2000-05-01 2004-06-22 Clinical Micro Sensors, Inc. Target analyte detection using asymmetrical self-assembled monolayers
US6315916B1 (en) 2000-05-08 2001-11-13 Pisces-Print Image Sciences, Inc. Chemical imaging of a lithographic printing plate
US20040154489A1 (en) * 2000-05-08 2004-08-12 Deutsch Albert S. Chemical imaging of a lithographic printing plate
US6691618B2 (en) 2000-05-08 2004-02-17 Pisces-Print Imaging Sciences, Inc. Chemical imaging of a lithographic printing plate
US6770721B1 (en) 2000-11-02 2004-08-03 Surface Logix, Inc. Polymer gel contact masks and methods and molds for making same
DE10100681B4 (de) * 2001-01-09 2005-11-24 Kuraray Specialities Europe Gmbh Weichmacherhaltige Polyvinylbutyrale, Verfahren zu deren Herstellung sowie deren Verwendung, insbesondere zur Herstellung von Folien zum Einsatz in Verbundsicherheitsgläsern
AU2003251992A1 (en) * 2002-07-17 2004-02-02 Rutgers, The State University Therapeutic devices for patterned cell growth
US20040025730A1 (en) * 2002-08-06 2004-02-12 Fromson Howard A. Method for imaging a lithographic printing plate
US20040202955A1 (en) * 2003-02-13 2004-10-14 Goodin Jonathan W. Method for making printing plate by inkjet deposition of coalescing agent
WO2008034019A2 (en) 2006-09-13 2008-03-20 Polymerix Corporation Active agents and their oligomers and polymers
US9615463B2 (en) * 2006-09-22 2017-04-04 Oscar Khaselev Method for producing a high-aspect ratio conductive pattern on a substrate
US8741317B2 (en) 2010-08-19 2014-06-03 Rutgers, The State University Of New Jersey Slow-degrading polymers comprising salicylic acid for undelayed and sustained drug delivery
US9144579B2 (en) 2012-08-17 2015-09-29 Rutgers, The State University Of New Jersey Polyesters and methods of use thereof
US20140120057A1 (en) 2012-10-25 2014-05-01 Rutgers, The State University Of New Jersey Polymers and methods thereof for wound healing
US9387250B2 (en) 2013-03-15 2016-07-12 Rutgers, The State University Of New Jersey Therapeutic compositions for bone repair
US9862672B2 (en) 2013-05-29 2018-01-09 Rutgers, The State University Of New Jersey Antioxidant-based poly(anhydride-esters)
WO2015191742A1 (en) 2014-06-13 2015-12-17 Rutgers, The State University Of New Jersey Process and intermediates for preparing poly(anhydride-esters)
US9396958B2 (en) 2014-10-14 2016-07-19 Tokyo Electron Limited Self-aligned patterning using directed self-assembly of block copolymers
JP6930918B6 (ja) 2015-04-10 2021-12-15 ラトガーズ， ザ ステイト ユニバーシティ オブ ニュー ジャージー コウジ酸ポリマー
CN113533598B (zh) * 2021-07-30 2023-03-24 海南葫芦娃药业集团股份有限公司 一种小儿肺热咳喘颗粒中黄芩含量的高效液相色谱分析方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2253944C2 (de) * 1972-11-03 1983-02-24 Agfa-Gevaert Ag, 5090 Leverkusen Verfahren zur Herstellung eines Reliefbildes
JPS5915394B2 (ja) * 1978-08-31 1984-04-09 富士通株式会社 厚膜微細パタ−ン生成方法
US4394211A (en) * 1982-09-08 1983-07-19 Fujitsu Limited Method of manufacturing a semiconductor device having a layer of polymide resin
GB8412606D0 (en) * 1984-05-17 1984-06-20 Murray J Printed circuit boards
IT1228144B (it) * 1985-05-22 1991-05-28 Face Standard Ind Procedimento per la fabbricazione di circuiti a microonde in banda j con struttura a microstrisce in film spesso e relativo prodotto
US4751170A (en) * 1985-07-26 1988-06-14 Nippon Telegraph And Telephone Corporation Silylation method onto surface of polymer membrane and pattern formation process by the utilization of silylation method
US4808511A (en) * 1987-05-19 1989-02-28 International Business Machines Corporation Vapor phase photoresist silylation process
US4968552A (en) * 1989-10-13 1990-11-06 International Business Machines Corp. Versatile reactive ion etch barriers from polyamic acid salts

Also Published As

Publication number Publication date
EP0497896A1 (en) 1992-08-12
CN1024980C (zh) 1994-06-08
MY106618A (en) 1995-06-30
DE69030261T2 (de) 1997-08-07
CA2069306A1 (en) 1991-04-21
EP0497896B1 (en) 1997-03-19
WO1991006118A1 (en) 1991-05-02
US5032216A (en) 1991-07-16
KR960010009B1 (ko) 1996-07-25
KR920702547A (ko) 1992-09-04
JPH05502140A (ja) 1993-04-15
JP2592548B2 (ja) 1997-03-19
DE69030261D1 (de) 1997-04-24
CN1053769A (zh) 1991-08-14

Similar Documents

Publication Publication Date Title
MX167928B (es) Metodo no fotografico para fabricar diseños en peliculas polimericas
ATE409356T1 (de) Verfahren zur herstellung eines halbleiterbauelements
KR910003752A (ko) 반도체장치의 제조방법
DE69020012D1 (de) Herstellung einer isolierenden Schicht, zum Beispiel in einem aktiven Matrix-Bauelement.
DE59806865D1 (de) Verfahren zur herstellung von strukturierten, selbstorganisierten molekularen monolagen einzelner molekularer spezies, insbesondere von substanzbibliotheken
JP2005514228A5 (es)
AT336446B (de) Laufsohle fur sportschuhe, insbesondere rennschuhe und verfahren zur herstellung einer laufsohle
DE69005129D1 (de) Verfahren zur Herstellung von integrierten Schaltungen mit EPROM-Speicher-Transistoren und logischen Transistoren.
EP1033622A3 (de) Photopolymerisierbares Aufzeichnungselement und Verfahren zur Herstellung von flexographischen Druckformen
DE3882849D1 (de) Anordnungen mit cmos-isolator-substrat mit niedriger streuung und verfahren zu deren herstellung.
KR900005565A (ko) 개선된 패턴 형성방법
ES2026152T3 (es) Elementos decorativos promoldeados para paredes laterales de neumaticos y procedimiento para su aplicacion.
DE68923880D1 (de) Verfahren zur Herstellung von komplementären Mustern zur Exposition von Halbleiterkörpern mit selbsttragenden Masken.
DK164357C (da) Lagdelt element og fremgangsmaade til fremstilling heraf samt dette elements anvendelse
ES382004A1 (es) Un procedimiento para la produccion de uno o mas disenos coloidales en color.
KR880010477A (ko) 반도체장치 제조방법
CH506890A (de) Verfahren zur Herstellung integrierter Schaltungen
ATE167646T1 (de) Mehrschichtige trübe filmstrukturen mit verringerter oberflächenreibung sowie verfahren zur herstellung
KR920018119A (ko) 높은 종횡비를 갖는 마이크로 성형물의 제조방법
DE50013276D1 (de) Verfahren und herstellung eines sensors
ATE135495T1 (de) Apparat und verfahren zur herstellung einer speicherzelle mit schwebendem gate und doppelter dielektrikumschicht
KR930018675A (ko) 위상반전마스크 및 그의 제조방법
NL7504118A (nl) Werkwijze voor het aanbrengen van naast elkaar liggende, dicht aan elkaar aansluitende, ver- schillende lagen op een transparante onderlaag.
TW200520045A (en) Immersion lithography process and mask layer structure applied in the same
AT349831B (de) Fungizides, insbesondere systemisch wirkendes mittel und verfahren zur herstellung desselben