KR970063550A - 기판 절단 방법 및 기판 절단 장치 - Google Patents
기판 절단 방법 및 기판 절단 장치 Download PDFInfo
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- KR970063550A KR970063550A KR1019970005299A KR19970005299A KR970063550A KR 970063550 A KR970063550 A KR 970063550A KR 1019970005299 A KR1019970005299 A KR 1019970005299A KR 19970005299 A KR19970005299 A KR 19970005299A KR 970063550 A KR970063550 A KR 970063550A
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- South Korea
- Prior art keywords
- cutting
- substrate
- line
- unit
- detecting
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- 239000000758 substrate Substances 0.000 title claims abstract 24
- 238000000034 method Methods 0.000 title claims 12
- 238000006243 chemical reaction Methods 0.000 claims 2
- 238000001514 detection method Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14603—Special geometry or disposition of pixel-elements, address-lines or gate-electrodes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
- B23D59/00—Accessories specially designed for sawing machines or sawing devices
- B23D59/001—Measuring or control devices, e.g. for automatic control of work feed pressure on band saw blade
- B23D59/002—Measuring or control devices, e.g. for automatic control of work feed pressure on band saw blade for the position of the saw blade
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
- H01L27/14676—X-ray, gamma-ray or corpuscular radiation imagers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/04—Processes
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/04—Processes
- Y10T83/0405—With preparatory or simultaneous ancillary treatment of work
- Y10T83/0443—By fluid application
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/04—Processes
- Y10T83/0605—Cut advances across work surface
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/141—With means to monitor and control operation [e.g., self-regulating means]
- Y10T83/148—Including means to correct the sensed operation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/162—With control means responsive to replaceable or selectable information program
- Y10T83/173—Arithmetically determined program
- Y10T83/175—With condition sensor
- Y10T83/178—Responsive to work
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/364—By fluid blast and/or suction
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/525—Operation controlled by detector means responsive to work
- Y10T83/533—With photo-electric work-sensing means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/525—Operation controlled by detector means responsive to work
- Y10T83/538—Positioning of tool controlled
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/869—Means to drive or to guide tool
- Y10T83/8878—Guide
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Measurement Of Radiation (AREA)
- Dicing (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
기판이 절단될 때 정확한 절단을 수행함으로써, 다수의 기판들이 배열되는 경우 기판들 사이의 틈새가 일정하게 되거나 혹은 감소되거나 제거되어, 기판들 사이의 틈새 부분의 전기적 특성을 개선할 수 있다. 이러한 목적으로 기판 상에는 절단선과 안내선이 제공되고, 기판은 절단선을 따라 절단되며, 안내선은 절단과 동시에 탐지되며, 이에 따라 오정렬을 탐지하여 오정렬이 수정되는 동안 기판을 절단하게 된다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제7도는 본 발명의 절단의 예를 설명하기 위한 순서도.
Claims (18)
- 절단선에 대응하여 제공된 안내선의 위치를 탐지하여 절단 위치를 수정하면서 상기 절단선을 따라 기판을 절단하는 기판 절단 방법.
- 제1항에 있어서, 상기 안내선은 상기 절단선의 안내선으로 사용된 후 절단을 위한 절단선으로 설정되는 기판 절단 방법.
- 제1항에 있어서, 상기 안내선은 상기 절단성과 동시에 형성되는 기판 절단 방법.
- 제1항에 있어서, 상기 안내선은 상기 기판 상에 제공된 전극선은 기판 절단 방법.
- 제1항에 있어서, 상기 위치 탐지는 광원 및 광전 변환 소자를 사용하여 수행되는 기판 절단 방법.
- 제1항에 있어서, 상기 절단은 회전 절삭날에의해 수행되는 기판 절단 방법.
- 제1항에 있어서, 상기 절단선 및 상기 안내선은 상기 기판 상에 제공된 전극층들에 의해 형성되는 기판 절단 방법.
- 제7항에 있어서, 상기 전극층은 상기 기판 상에 형성된 전극선과 동일한 물질로 형성되는 기판 절단 방법.
- 제7항에 있어서, 상기 전극층은 상기 기판 상에 형성된 전극선과 동시에 형성되는 기판 절단 방법.
- 제1항에 있어서, 상기 절단선 및 상기 안내선은 평행하게 배열되는 기판 절단 방법.
- 상부에 절단선 및 안내선이 형성된 기판이 상기 기판의 상기 절단선을 따라 절단될 때, 상기 절단과 동시에 상기 안내선을 탐지함으로써 오정렬이 탐지되고 상기 오정렬이 수정되면서 상기 기판이 절단되는 기판 절단 방법.
- 제11항에 있어서, 상기 절단선 및 상기 안내선은 상기 기판 상에 형성된 박막 반도체 소자를 구성하는 전극선들인 기판 절단 방법.
- 제11항에 있어서, 상기 안내선은 상기 절단선으로 공통적으로 사용되는 기판 절단 방법.
- 절단기; 상기 절단기의 절단 위치를 절단될 물체에 대해 상대적으로 이동시키기 위한 유닛; 상기 절단 위치와 다른 위치에서 위치를 탐지하기 위한 유닛; 및 상기 위치 탐지 유닛에 의한 위치 정보를 기초로 상기 절단 위치를 조정하기 위한 유닛을 포함하는 기판 절단 장치.
- 제14항에 있어서, 상기 절단기는 절단 유닛을 구비한 기판 절단 장치.
- 제15항에 있어서, 상기 절단 유닛은 회전 절삭날 혹은 물 분사 노즐을 구비한 기판 절단 장치.
- 제16항에 있어서, 상기 위치 탐지 유닛은 광전 변환 장치를 구비한 기판 절단 장치.
- 상부에 기판을 절단하기 위한 절단선 및 절단과 동시에 오정렬을 탐지하기 위한 안내선이 형성된 상기 기판을 절단하기 위한 기판 절단 장치에 있어서, 상기 절단선을 절단하기 위한 유닛; 상기 절단과 동시에 상기 안내선을 탐지함으로써 상기 오정렬을 탐지하기 위한 유닛; 및 상기 절단과 동시에 상기 오정렬이 발생할 때 오정렬량을 수정하기 위한 유닛을 포함하는 기판 절단 장치.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP96-033615 | 1996-02-21 | ||
JP3361596 | 1996-02-21 | ||
JP97-027837 | 1997-02-12 | ||
JP2783797A JP3618945B2 (ja) | 1996-02-21 | 1997-02-12 | 基板の切断方法及び基板切断装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970063550A true KR970063550A (ko) | 1997-09-12 |
KR100326568B1 KR100326568B1 (ko) | 2002-07-27 |
Family
ID=26365817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970005299A KR100326568B1 (ko) | 1996-02-21 | 1997-02-21 | 기판절단방법및기판절단장치 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7077120B2 (ko) |
JP (1) | JP3618945B2 (ko) |
KR (1) | KR100326568B1 (ko) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002050754A (ja) * | 2000-05-08 | 2002-02-15 | Canon Inc | 半導体装置とその製造方法、放射線検出装置とそれを用いた放射線検出システム |
JP4621161B2 (ja) * | 2000-05-08 | 2011-01-26 | キヤノン株式会社 | 半導体装置 |
JP2004355943A (ja) * | 2003-05-29 | 2004-12-16 | Nippon Seiki Co Ltd | 封止用基板の製造方法及び有機elパネルの製造方法 |
KR101140074B1 (ko) * | 2004-03-18 | 2012-04-30 | 브이엠아이 홀랜드 비.브이. | 컷팅 장치 |
KR101096733B1 (ko) | 2004-12-27 | 2011-12-21 | 엘지디스플레이 주식회사 | 기판의 절단장치 및 이를 이용한 기판의 절단방법 |
KR100769529B1 (ko) * | 2006-09-19 | 2007-10-23 | 삼성전기주식회사 | 기판 정렬 방법 및 장치 |
JP2008151768A (ja) * | 2006-11-22 | 2008-07-03 | Konica Minolta Medical & Graphic Inc | 放射線用シンチレータパネル、放射線用シンチレータパネルの製造方法、及び放射線画像撮影装置 |
DE102008001757A1 (de) * | 2008-05-14 | 2009-11-19 | Robert Bosch Gmbh | Werkzeugmaschine, insbesondere handgehaltene Werkzeugmaschine |
DE102008001762A1 (de) * | 2008-05-14 | 2009-11-19 | Robert Bosch Gmbh | Werkzeugmaschine, insbesondere handgehaltene Werkzeugmaschine |
JP5254733B2 (ja) * | 2008-10-02 | 2013-08-07 | 株式会社ディスコ | ウォータジェット加工方法 |
WO2010077240A1 (en) | 2008-12-30 | 2010-07-08 | Sikorsky Aircraft Corporation | Non-destructive inspection method with objective evaluation |
US20100239751A1 (en) * | 2009-03-23 | 2010-09-23 | Sonavation, Inc. | Sea of Pillars |
JP6252838B2 (ja) * | 2013-07-18 | 2017-12-27 | 株式会社東京精密 | ダイシング装置及びその切削方法 |
JP6230870B2 (ja) * | 2013-10-18 | 2017-11-15 | 株式会社ディスコ | レーザー加工装置 |
US10099489B2 (en) * | 2016-04-15 | 2018-10-16 | Gp Squared Technologies, Inc. | Apparatus and method for trimming a print sheet, and registering the location of an image |
JP2019040916A (ja) * | 2017-08-22 | 2019-03-14 | 株式会社ディスコ | 加工方法 |
WO2019213853A1 (zh) * | 2018-05-09 | 2019-11-14 | 深圳市柔宇科技有限公司 | 基板、基板的检测装置及切割方法 |
KR20210070780A (ko) * | 2019-12-05 | 2021-06-15 | 엘지디스플레이 주식회사 | 디지털 엑스레이 검출기용 박막 트랜지스터 어레이 기판과 디지털 엑스레이 검출기 및 그 제조 방법 |
CN113865915B (zh) * | 2021-09-18 | 2023-10-13 | 长江存储科技有限责任公司 | 一种切片样品的检测方法 |
CN114169675B (zh) * | 2021-11-01 | 2022-12-13 | 深圳市匠心智汇科技有限公司 | 划切加工的监测方法、装置、终端设备及存储介质 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE313171B (ko) * | 1962-12-21 | 1969-08-04 | Stora Kopparbergs Bergslags Ab | |
FR1456488A (fr) * | 1965-05-07 | 1966-07-08 | Corpet Louvet & Cie | Installation de découpage de matériau en feuille |
GB1488841A (en) * | 1974-01-18 | 1977-10-12 | Plessey Co Ltd | Optical detection apparatus |
DE3403710C1 (de) * | 1984-02-03 | 1985-07-18 | Carl Schmale GmbH & Co KG, 4434 Ochtrup | Vorrichtung zum fortlaufenden Laengstrennen von Gewebebahnen |
US5059899A (en) * | 1990-08-16 | 1991-10-22 | Micron Technology, Inc. | Semiconductor dies and wafers and methods for making |
JP3076360B2 (ja) * | 1990-08-21 | 2000-08-14 | 株式会社ブリヂストン | コード入りゴムシートの切断不良検出方法 |
JP3066944B2 (ja) | 1993-12-27 | 2000-07-17 | キヤノン株式会社 | 光電変換装置、その駆動方法及びそれを有するシステム |
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1997
- 1997-02-12 JP JP2783797A patent/JP3618945B2/ja not_active Expired - Fee Related
- 1997-02-18 US US08/801,464 patent/US7077120B2/en not_active Expired - Fee Related
- 1997-02-21 KR KR1019970005299A patent/KR100326568B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP3618945B2 (ja) | 2005-02-09 |
KR100326568B1 (ko) | 2002-07-27 |
JPH09289181A (ja) | 1997-11-04 |
US20030079583A1 (en) | 2003-05-01 |
US7077120B2 (en) | 2006-07-18 |
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