KR970060354A - 위치조정방법 및 장치 - Google Patents
위치조정방법 및 장치 Download PDFInfo
- Publication number
- KR970060354A KR970060354A KR1019960082557A KR19960082557A KR970060354A KR 970060354 A KR970060354 A KR 970060354A KR 1019960082557 A KR1019960082557 A KR 1019960082557A KR 19960082557 A KR19960082557 A KR 19960082557A KR 970060354 A KR970060354 A KR 970060354A
- Authority
- KR
- South Korea
- Prior art keywords
- mark
- substrate
- mask
- reference mark
- alignment system
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7046—Strategy, e.g. mark, sensor or wavelength selection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13624/1996 | 1996-01-30 | ||
JP8013624A JPH09213601A (ja) | 1996-01-30 | 1996-01-30 | 露光方法及び装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970060354A true KR970060354A (ko) | 1997-08-12 |
Family
ID=11838396
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960082557A KR970060354A (ko) | 1996-01-30 | 1996-12-31 | 위치조정방법 및 장치 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH09213601A (ja) |
KR (1) | KR970060354A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005010207A (ja) | 2003-06-16 | 2005-01-13 | Olympus Corp | 手振れ補正装置 |
-
1996
- 1996-01-30 JP JP8013624A patent/JPH09213601A/ja not_active Withdrawn
- 1996-12-31 KR KR1019960082557A patent/KR970060354A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JPH09213601A (ja) | 1997-08-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |