KR970007029A - 유체제어 시스템 및 이것에 사용되는 밸브 - Google Patents

유체제어 시스템 및 이것에 사용되는 밸브 Download PDF

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KR970007029A
KR970007029A KR1019960014034A KR19960014034A KR970007029A KR 970007029 A KR970007029 A KR 970007029A KR 1019960014034 A KR1019960014034 A KR 1019960014034A KR 19960014034 A KR19960014034 A KR 19960014034A KR 970007029 A KR970007029 A KR 970007029A
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South Korea
Prior art keywords
valve
fluid
pressure actuator
plunger
fluid pressure
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KR1019960014034A
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English (en)
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KR100201048B1 (ko
Inventor
타다히로 오오미
미치로 야마지
노부카즈 이케다
히로시 모로코시
Original Assignee
타다히로 오오미
오오가와 슈우헤이
카부시키가이샤 후지킨
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Priority claimed from JP17837495A external-priority patent/JP3452695B2/ja
Application filed by 타다히로 오오미, 오오가와 슈우헤이, 카부시키가이샤 후지킨 filed Critical 타다히로 오오미
Publication of KR970007029A publication Critical patent/KR970007029A/ko
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Publication of KR100201048B1 publication Critical patent/KR100201048B1/ko

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F16K31/1226—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston the fluid circulating through the piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/42—Actuating devices; Operating means; Releasing devices actuated by fluid by means of electrically-actuated members in the supply or discharge conduits of the fluid motor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87676—With flow control
    • Y10T137/87684—Valve in each inlet

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Magnetically Actuated Valves (AREA)
  • Fluid-Driven Valves (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Fluid-Pressure Circuits (AREA)

Abstract

반도체의 제조나 자성박막의 제조, 바이오 관련제품의 제조 등에 사용되는 유체제어 시스템 및 이것에 사용되는 밸브에 있어서, 밸브의 작동(개폐)을 신속하고 또한, 정확하게 실시하도록 유체의 공급을 정확하게 제어하는 것을 목적으로 한다.
처리장치(C) 내로 여러종류의 유체(G1),(G2),…,를 공급하는 주 제어라인(L1),(L2),…,과, 분기 제어라인 (L1),(L2),…,에 설치되어 처리장치(C) 내로 공급되는 각종 유체(G1),(G2),…,의 전환을 실시하는 복수의 밸브(V)로 이루어진 유체제어 시스템에 있어서, 상기한 밸브(V)를 유체압 액츄에이터(1)를 구비한 유체구동형 밸브(V′)와, 유체구동형 밸브(V′)에 일체적으로 부착되어 유체압 액츄에이터(1)에 작동유체(A)를 공급하는 전자밸브(V′)로 구성된 것을 특징으로 하는 유체제어 시스템.

Description

유체제어 시스템 및 이것에 사용되는 밸브
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 실시의 형태에 관하여 반도체 제조장치의 유체제어 시스템의 한 실시예를 표시하는 유압회로도이다. 제2도는 본 발명의 유체제어 시스템에 사용되는 전환밸브의 한 실시예를 표시하는 확대 종단면도이다, 제3도는 본 발명의 유체제어 시스템에 사용되는 전환밸브의 다른 실시예를 표시하는 부분 확대 종단면도이다.

Claims (4)

  1. 처리장치(C) 내로 여러종류의 유체(G1),(G2),…,를 제공하는 주 제어라인(L) 및 복수의 분기 제어라인(L1),(L2),…,에 설치되어, 처리장치(C) 내로 공급되는 각종 유체(G1),(G2),…,의 전환을 실시하는 복수의 밸브(V)로 이루어진 유체제어 시스템에 있어서, 상기한 밸브(V)를 유체압 액츄에이터(1)를 구비한 유체구동형 밸브(V′)와, 유체구동형 밸브(V′)에 일체적으로 부착되어 유체압 액츄에이터(1)에 작동유체(A)를 제공하는 전자밸브(V′)로 구성된 것을 특징으로 하는 유체제어 시스템.
  2. 제1항에 있어서, 처리장치(C)를 반도체 제조장치의 웨이퍼의 처리를 실시하는 처리챔버로 하는 것을 특징으로 하는 유체제어 시스템.
  3. 유입통로(2a), 유출통로(2b), 밸브실(2c) 및 밸브시이트(2d)를 구비한 보디(2)와, 보디(2) 측으로 승강자재하게 지지된 스템(6)과, 스템(6)의 승강동에 의해 보디(2)의 밸브시이트(2d)에서 이탈하는 디스크(7)와, 보디(2) 측에 설치되어 스템(6)을 승강동시키는 유체압 액츄에이터(1)로 이루어진 유체구동형 밸브(V′)와, 입구(21a), 출구(21b), 밸브실(21c) 및 밸브시이트(21d)를 구비하고, 유체압 액츄에이터(1)에 일체적으로 부착함과 동시에, 출구(21b)가 유체압 액츄에이터(1)로 접속된 보디(21)와, 보디(21) 측으로 승강자재하게 지지된 플런저(24)와, 플런저(24)에 설치되어 밸브시이트(21d)에서 이탈하는 디스크(25)와, 디스크(25)가 밸브시이트(21d)에 장착되도록 플런저(24)를 밸브개방방향으로 밀어내는 스프링(29)과, 플런저(24)의 상방위치에 설치된 코어(26)와, 코어(26)의 주위에 설치된 여자코일(27)로 이루어진 전자밸브(V″)로 구성되는 밸브.
  4. 유입통로(2a), 유출통로(2b), 밸브실(2c) 및 밸브시이트(2d)를 구비한 보디(2)와, 보디(2) 측으로 승강자재하게 지지된 스템(6)과, 스템(6)의 승강동에 의해 보디(2)의 밸브시이트(2d)에서 이탈하는 금속형 타이어플램(7a)과, 보디(2) 측에 설치되어 스템(6)을 승강동시키는 유체압 액츄에이터(1)로 이루어진 유체구동형 밸브(V′)와, 입구(21a), 출구(21b), 밸브실(21c), 밸브시이트(21d)를 구비하고, 유체압 액츄에이터(1)에 일체적으로 부착함과 동시에, 출구(21b)가 유체압 액츄에이터(1)로 접속된 플런저(24)와, 플런저(24)에 설치되어 밸브시이트(21d)에서 이탈하는 디스크(25)와, 디스크(25)가 밸브시이트(21d)에 장착되도록 플런저(24)를 밸브폐쇄방향으로 밀어내는 스프링(29)과, 플런저(24)의 상방위치에 설치된 코어(26)와, 코어(26)의 주위에 설치된 여자코일(27)로 이루어진 전자밸브(V″)로 구성되는 밸브.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960014034A 1995-07-14 1996-04-30 유체제어 시스템 및 이것에 사용되는 밸브 KR100201048B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP95-178374 1995-07-14
JP17837495A JP3452695B2 (ja) 1995-04-13 1995-07-14 流体制御システム及びこれに用いるバルブ

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KR970007029A true KR970007029A (ko) 1997-02-21
KR100201048B1 KR100201048B1 (ko) 1999-06-15

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Country Link
US (1) US5850853A (ko)
EP (1) EP0756118B1 (ko)
KR (1) KR100201048B1 (ko)
CA (1) CA2173267C (ko)
DE (1) DE69621291T2 (ko)
IL (1) IL117732A (ko)
TW (1) TW342429B (ko)

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TW342429B (en) 1998-10-11
US5850853A (en) 1998-12-22
CA2173267A1 (en) 1997-01-15
KR100201048B1 (ko) 1999-06-15
IL117732A0 (en) 1996-07-23
EP0756118A2 (en) 1997-01-29
DE69621291T2 (de) 2002-11-07
EP0756118A3 (en) 1997-02-05
CA2173267C (en) 1999-11-09
EP0756118B1 (en) 2002-05-22
DE69621291D1 (de) 2002-06-27
IL117732A (en) 2000-01-31

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