IL117732A - Fluid control system and a valve to be used therewith - Google Patents

Fluid control system and a valve to be used therewith

Info

Publication number
IL117732A
IL117732A IL11773296A IL11773296A IL117732A IL 117732 A IL117732 A IL 117732A IL 11773296 A IL11773296 A IL 11773296A IL 11773296 A IL11773296 A IL 11773296A IL 117732 A IL117732 A IL 117732A
Authority
IL
Israel
Prior art keywords
valve
control system
fluid control
used therewith
therewith
Prior art date
Application number
IL11773296A
Other languages
English (en)
Other versions
IL117732A0 (en
Original Assignee
Ohmi Tadahiro
Fujikin Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP17837495A external-priority patent/JP3452695B2/ja
Application filed by Ohmi Tadahiro, Fujikin Kk filed Critical Ohmi Tadahiro
Publication of IL117732A0 publication Critical patent/IL117732A0/xx
Priority to IL12664098A priority Critical patent/IL126640A0/xx
Priority to IL12664198A priority patent/IL126641A0/xx
Publication of IL117732A publication Critical patent/IL117732A/xx

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F16K31/1226—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston the fluid circulating through the piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/42—Actuating devices; Operating means; Releasing devices actuated by fluid by means of electrically-actuated members in the supply or discharge conduits of the fluid motor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87676—With flow control
    • Y10T137/87684—Valve in each inlet

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Magnetically Actuated Valves (AREA)
  • Fluid-Driven Valves (AREA)
  • Fluid-Pressure Circuits (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
IL11773296A 1995-07-14 1996-03-31 Fluid control system and a valve to be used therewith IL117732A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
IL12664098A IL126640A0 (en) 1995-07-14 1998-10-18 Valve assembly
IL12664198A IL126641A0 (en) 1995-07-14 1998-10-18 Valve assembly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17837495A JP3452695B2 (ja) 1995-04-13 1995-07-14 流体制御システム及びこれに用いるバルブ

Publications (2)

Publication Number Publication Date
IL117732A0 IL117732A0 (en) 1996-07-23
IL117732A true IL117732A (en) 2000-01-31

Family

ID=16047381

Family Applications (1)

Application Number Title Priority Date Filing Date
IL11773296A IL117732A (en) 1995-07-14 1996-03-31 Fluid control system and a valve to be used therewith

Country Status (7)

Country Link
US (1) US5850853A (xx)
EP (1) EP0756118B1 (xx)
KR (1) KR100201048B1 (xx)
CA (1) CA2173267C (xx)
DE (1) DE69621291T2 (xx)
IL (1) IL117732A (xx)
TW (1) TW342429B (xx)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6805328B2 (en) * 2002-06-04 2004-10-19 Maxon Corporation Shut-off valve apparatus
US6789563B2 (en) * 2002-06-04 2004-09-14 Maxon Corporation Pneumatic exhaust controller
US20030222235A1 (en) * 2002-06-04 2003-12-04 Filkovski Gregory T. Modular shut-off valve apparatus
US7222636B2 (en) * 2002-08-20 2007-05-29 Applied Materials, Inc. Electronically actuated valve
US6994319B2 (en) * 2003-01-29 2006-02-07 Applied Materials, Inc. Membrane gas valve for pulsing a gas
JP4195837B2 (ja) * 2003-06-20 2008-12-17 東京エレクトロン株式会社 ガス分流供給装置及びガス分流供給方法
US7325567B2 (en) * 2003-07-08 2008-02-05 Aaa Sales & Engineering, Inc. Pneumatic retarder acutator valve
CN1894526A (zh) * 2003-10-17 2007-01-10 松德沃技术公司 故障保险气动致动阀
US7475863B2 (en) * 2005-10-14 2009-01-13 Rain Bird Corporation Piston for reverse flow diaphragm valve
JP4765746B2 (ja) * 2006-04-17 2011-09-07 日立金属株式会社 遮断弁装置及びこれを組み込んだ質量流量制御装置
JP5372353B2 (ja) * 2007-09-25 2013-12-18 株式会社フジキン 半導体製造装置用ガス供給装置
WO2009039856A1 (en) 2007-09-27 2009-04-02 Poul Elholm Jakobsen Valve actuator system
US9273796B2 (en) 2007-09-27 2016-03-01 Kmatic Aps Valve actuator system
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
US20140305522A1 (en) * 2013-04-12 2014-10-16 Parker-Hannifin Corporation Stream switching system
FR3042581B1 (fr) * 2015-10-16 2018-03-30 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Systeme de commande de circulation de fluide, installation d'alimentation comprenant un tel systeme de commande et procede employant une telle installation d'alimentation
CN105671643A (zh) * 2016-03-16 2016-06-15 江苏华盛天龙光电设备股份有限公司 一种单晶炉的炉盖
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
JP7349669B2 (ja) 2018-12-07 2023-09-25 株式会社フジキン 電磁弁、バルブ、流体制御装置、および電磁弁交換方法
IL268254B1 (en) * 2019-07-24 2024-06-01 Ham Let Israel Canada Ltd Flow control accessory
US11635015B2 (en) * 2019-11-05 2023-04-25 Norgren Gt Development Llc Coolant control valve

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1953850U (de) * 1965-01-23 1967-01-19 Erich Herion Absperr- oder steuerventil mit einem kugelfoermigen verschlussstueck.
US3727877A (en) * 1970-03-04 1973-04-17 Chayes Dental Inst Corp Piloted shut-off valve
CH655984A5 (de) * 1982-04-07 1986-05-30 Sulzer Ag Magnetventil mit leistungsverstaerker.
US4624441A (en) * 1982-09-13 1986-11-25 Valcor Engineering Corporation Inflation valve
US4558845A (en) * 1982-09-22 1985-12-17 Hunkapiller Michael W Zero dead volume valve
US4703913A (en) * 1982-09-22 1987-11-03 California Institute Of Technology Diaphragm valve
JPS61244976A (ja) * 1985-04-23 1986-10-31 Fujikin:Kk 流体遮断開放器
JPH0762504B2 (ja) * 1986-09-30 1995-07-05 藤倉ゴム工業株式会社 空気作動弁
US4741354A (en) * 1987-04-06 1988-05-03 Spire Corporation Radial gas manifold
US4874014A (en) * 1987-12-21 1989-10-17 Fsi International, Inc. Flow control manifold
DE8817026U1 (de) * 1988-01-13 1992-03-05 Barth, Hans, 7801 Schallstadt Druckregelventil
JPH0211984A (ja) * 1988-05-04 1990-01-17 Nupro Co 流体作動形弁アクチュエータ及び弁
US4986299A (en) * 1989-09-05 1991-01-22 Eaton Corporation Reversible poppet valve cartridge
JP3017816B2 (ja) * 1991-02-20 2000-03-13 清原 まさ子 流体制御器
US5308433A (en) * 1991-04-11 1994-05-03 Matsushita Electric Industrial Co., Ltd. Apparatus and method for vapor growth
JP3006913B2 (ja) * 1991-05-09 2000-02-07 清原 まさ子 流体制御器
US5368062A (en) * 1992-01-29 1994-11-29 Kabushiki Kaisha Toshiba Gas supplying system and gas supplying apparatus
JPH0687135A (ja) * 1992-09-04 1994-03-29 K T K:Kk 高圧ガス制御弁及び射出成形用ガス噴射システム
JP3332053B2 (ja) * 1993-10-27 2002-10-07 清原 まさ子 チャンバーへのガス供給方法

Also Published As

Publication number Publication date
EP0756118A2 (en) 1997-01-29
CA2173267A1 (en) 1997-01-15
TW342429B (en) 1998-10-11
EP0756118B1 (en) 2002-05-22
DE69621291T2 (de) 2002-11-07
CA2173267C (en) 1999-11-09
US5850853A (en) 1998-12-22
KR970007029A (ko) 1997-02-21
IL117732A0 (en) 1996-07-23
KR100201048B1 (ko) 1999-06-15
EP0756118A3 (en) 1997-02-05
DE69621291D1 (de) 2002-06-27

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KB Patent renewed