DE69621291D1 - Fluid-Regelungssystem sowie dafür verwendetes Ventil - Google Patents

Fluid-Regelungssystem sowie dafür verwendetes Ventil

Info

Publication number
DE69621291D1
DE69621291D1 DE69621291T DE69621291T DE69621291D1 DE 69621291 D1 DE69621291 D1 DE 69621291D1 DE 69621291 T DE69621291 T DE 69621291T DE 69621291 T DE69621291 T DE 69621291T DE 69621291 D1 DE69621291 D1 DE 69621291D1
Authority
DE
Germany
Prior art keywords
control system
fluid control
used therefor
valve used
valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69621291T
Other languages
English (en)
Other versions
DE69621291T2 (de
Inventor
Tadahiro Ohmi
Michio Yamaji
Nobukazu Ikeda
Hiroshi Morokoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikin Inc
Original Assignee
Fujikin Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP17837495A external-priority patent/JP3452695B2/ja
Application filed by Fujikin Inc filed Critical Fujikin Inc
Application granted granted Critical
Publication of DE69621291D1 publication Critical patent/DE69621291D1/de
Publication of DE69621291T2 publication Critical patent/DE69621291T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/02—Actuating devices; Operating means; Releasing devices electric; magnetic
    • F16K31/06—Actuating devices; Operating means; Releasing devices electric; magnetic using a magnet, e.g. diaphragm valves, cutting off by means of a liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16—Feed and outlet means for the gases; Modifying the flow of the gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/122—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston
    • F16K31/1226—Actuating devices; Operating means; Releasing devices actuated by fluid the fluid acting on a piston the fluid circulating through the piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/42—Actuating devices; Operating means; Releasing devices actuated by fluid by means of electrically-actuated members in the supply or discharge conduits of the fluid motor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87676—With flow control
    • Y10T137/87684—Valve in each inlet

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Magnetically Actuated Valves (AREA)
  • Fluid-Driven Valves (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Fluid-Pressure Circuits (AREA)
DE69621291T 1995-07-14 1996-03-26 Fluid-Regelungssystem sowie dafür verwendetes Ventil Expired - Fee Related DE69621291T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17837495A JP3452695B2 (ja) 1995-04-13 1995-07-14 流体制御システム及びこれに用いるバルブ

Publications (2)

Publication Number Publication Date
DE69621291D1 true DE69621291D1 (de) 2002-06-27
DE69621291T2 DE69621291T2 (de) 2002-11-07

Family

ID=16047381

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69621291T Expired - Fee Related DE69621291T2 (de) 1995-07-14 1996-03-26 Fluid-Regelungssystem sowie dafür verwendetes Ventil

Country Status (7)

Country Link
US (1) US5850853A (de)
EP (1) EP0756118B1 (de)
KR (1) KR100201048B1 (de)
CA (1) CA2173267C (de)
DE (1) DE69621291T2 (de)
IL (1) IL117732A (de)
TW (1) TW342429B (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030222235A1 (en) * 2002-06-04 2003-12-04 Filkovski Gregory T. Modular shut-off valve apparatus
US6805328B2 (en) * 2002-06-04 2004-10-19 Maxon Corporation Shut-off valve apparatus
US6789563B2 (en) * 2002-06-04 2004-09-14 Maxon Corporation Pneumatic exhaust controller
US7222636B2 (en) * 2002-08-20 2007-05-29 Applied Materials, Inc. Electronically actuated valve
US6994319B2 (en) * 2003-01-29 2006-02-07 Applied Materials, Inc. Membrane gas valve for pulsing a gas
JP4195837B2 (ja) 2003-06-20 2008-12-17 東京エレクトロン株式会社 ガス分流供給装置及びガス分流供給方法
US7325567B2 (en) * 2003-07-08 2008-02-05 Aaa Sales & Engineering, Inc. Pneumatic retarder acutator valve
ATE462910T1 (de) 2003-10-17 2010-04-15 Sundew Technologies Llc Ausfallsicheres, pneumatisch betätigtes ventil
US7475863B2 (en) * 2005-10-14 2009-01-13 Rain Bird Corporation Piston for reverse flow diaphragm valve
JP4765746B2 (ja) * 2006-04-17 2011-09-07 日立金属株式会社 遮断弁装置及びこれを組み込んだ質量流量制御装置
JP5372353B2 (ja) * 2007-09-25 2013-12-18 株式会社フジキン 半導体製造装置用ガス供給装置
US9273796B2 (en) 2007-09-27 2016-03-01 Kmatic Aps Valve actuator system
EP2201277A4 (de) 2007-09-27 2017-10-18 Kmatic APS Ventilaktuatorsystem
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
US20140305522A1 (en) * 2013-04-12 2014-10-16 Parker-Hannifin Corporation Stream switching system
FR3042581B1 (fr) * 2015-10-16 2018-03-30 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Systeme de commande de circulation de fluide, installation d'alimentation comprenant un tel systeme de commande et procede employant une telle installation d'alimentation
CN105671643A (zh) * 2016-03-16 2016-06-15 江苏华盛天龙光电设备股份有限公司 一种单晶炉的炉盖
US10983537B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
CN113167406A (zh) 2018-12-07 2021-07-23 株式会社富士金 电磁阀、阀、流体控制装置、及电磁阀更换方法
IL268254A (en) * 2019-07-24 2021-01-31 Ham Let Israel Canada Ltd Flow control accessory
US11635015B2 (en) * 2019-11-05 2023-04-25 Norgren Gt Development Llc Coolant control valve

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1953850U (de) * 1965-01-23 1967-01-19 Erich Herion Absperr- oder steuerventil mit einem kugelfoermigen verschlussstueck.
US3727877A (en) * 1970-03-04 1973-04-17 Chayes Dental Inst Corp Piloted shut-off valve
CH655984A5 (de) * 1982-04-07 1986-05-30 Sulzer Ag Magnetventil mit leistungsverstaerker.
US4624441A (en) * 1982-09-13 1986-11-25 Valcor Engineering Corporation Inflation valve
US4558845A (en) * 1982-09-22 1985-12-17 Hunkapiller Michael W Zero dead volume valve
US4703913A (en) * 1982-09-22 1987-11-03 California Institute Of Technology Diaphragm valve
JPS61244976A (ja) * 1985-04-23 1986-10-31 Fujikin:Kk 流体遮断開放器
JPH0762504B2 (ja) * 1986-09-30 1995-07-05 藤倉ゴム工業株式会社 空気作動弁
US4741354A (en) * 1987-04-06 1988-05-03 Spire Corporation Radial gas manifold
US4874014A (en) * 1987-12-21 1989-10-17 Fsi International, Inc. Flow control manifold
DE3800654A1 (de) * 1988-01-13 1989-07-27 Hans Barth Druckregelventil
JPH0211984A (ja) * 1988-05-04 1990-01-17 Nupro Co 流体作動形弁アクチュエータ及び弁
US4986299A (en) * 1989-09-05 1991-01-22 Eaton Corporation Reversible poppet valve cartridge
JP3017816B2 (ja) * 1991-02-20 2000-03-13 清原 まさ子 流体制御器
US5308433A (en) * 1991-04-11 1994-05-03 Matsushita Electric Industrial Co., Ltd. Apparatus and method for vapor growth
JP3006913B2 (ja) * 1991-05-09 2000-02-07 清原 まさ子 流体制御器
US5368062A (en) * 1992-01-29 1994-11-29 Kabushiki Kaisha Toshiba Gas supplying system and gas supplying apparatus
JPH0687135A (ja) * 1992-09-04 1994-03-29 K T K:Kk 高圧ガス制御弁及び射出成形用ガス噴射システム
JP3332053B2 (ja) * 1993-10-27 2002-10-07 清原 まさ子 チャンバーへのガス供給方法

Also Published As

Publication number Publication date
EP0756118A2 (de) 1997-01-29
DE69621291T2 (de) 2002-11-07
EP0756118A3 (de) 1997-02-05
US5850853A (en) 1998-12-22
IL117732A0 (en) 1996-07-23
CA2173267C (en) 1999-11-09
CA2173267A1 (en) 1997-01-15
KR100201048B1 (ko) 1999-06-15
IL117732A (en) 2000-01-31
KR970007029A (ko) 1997-02-21
EP0756118B1 (de) 2002-05-22
TW342429B (en) 1998-10-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee