KR970006538A - 금속증착시 무금속띠 형성방법 및 장치 - Google Patents

금속증착시 무금속띠 형성방법 및 장치 Download PDF

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Publication number
KR970006538A
KR970006538A KR1019960028095A KR19960028095A KR970006538A KR 970006538 A KR970006538 A KR 970006538A KR 1019960028095 A KR1019960028095 A KR 1019960028095A KR 19960028095 A KR19960028095 A KR 19960028095A KR 970006538 A KR970006538 A KR 970006538A
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South Korea
Prior art keywords
band
metal
evaporator
insulating
cover
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KR1019960028095A
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English (en)
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KR100278826B1 (ko
Inventor
아흐트너 볼프강
포크트 토마스
클렘 귄터
엘러 데트레프
Original Assignee
원본미기재
발처스 운트 레이볼트 도이칠란트 홀딩 악티엔게젤샤프트
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Publication of KR970006538A publication Critical patent/KR970006538A/ko
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Publication of KR100278826B1 publication Critical patent/KR100278826B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

절연재밴드(3)가, 형성하려는 무금속 띠 범위에서, 절연재밴드(3)에 놓여지고 이것과 동일속도로 진행하는 무한 커버밴드(4)에 의해 덮혀지고, 커버밴드는 증착구역(5)으로 유입되기 전에 금속증착기(6)와 대향한 측면에서 오일로 코팅되는, 절연재밴드(3)의 금속증착시 무금속 띠를 형성하기 위한 방법 및 장치에 있어서, 증착구역(5)을 통과한 후 및 커버밴드(4)와 절연재밴드(3)의 분리후, 커버밴드(4)의 바로 옆에 배치된 가열기(7)에서 커버밴드(4)를 가열함으로써 커버밴드(4)가 증착된 오일로부터 자유롭게 된다.

Description

금속증착시 무금속띠 형성방법 및 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
도면은 실시예중 하나를 도식적으로 도시한 단면도.

Claims (2)

  1. 절연재밴드(3)가, 형성하려는 무금속 띠 범위에서 절연재밴드(3)에 놓여지고 이것과 동일속도로 진행하는 무한 커버밴드(4)에 의해 덮혀지고, 커버밴드는 증착구역(5)으로 유입되기 전에 금속증착기(6)와 대향하는 측면에서 오일로 코팅되는, 전기콘덴서에서 사용되는 절연재밴드(3)의 금속증착시 무금속 띠를 형성하기 위한 방법에 있어서, 증착구역(5)을 통과한 후 및 커버밴드(4)와 절연재밴드(3)의 분리후, 커버밴드(4)의 바로 옆에 배치된 가열기(7)에서 커버밴드(4)를 가열함으로써 커버밴드(4)가 증착된 오일로부터 자유롭게 되고, 커버밴드(4)는 미리 증발기(8)에 의해 오일로 증착되고 그 다음에 도금하려는 절연재밴드(3)와 함께 안내되고 계속해서 양밴드(3 및 4)는 증착구역(5)을 함께 통과하는 것을 특징으로 하는 방법.
  2. 금속증발기(6), 커버밴드(4)의 진행방향으로 금속증발기 앞에 배치된 오일증발기(8), 도금하려는 밴드(3)를 위한 권취롤(9,10), 그리고 밴드(4)의 진행방향으로 금속증발기(6)와 연결되어 있는 가열장치(7)로 구성되고, 금속증발기(6) 상부에 배치된 증착구역(5)은 칼라(11)에 의해 증발기챔버(12)로부터 차폐되고, 그리고 분할금속판(13,14)이 진공챔버(15)내에 구비되어 권취공간(17)을 증발기챔버(12)와 분리시키고 또한 코팅 롤러(16)까지 연장되어 있는 것을 특징으로 하는 제1항의 방법을 실시하기 위한 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960028095A 1995-07-28 1996-07-12 금속증착시 무금속띠 형성방법 및 장치 KR100278826B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19527604A DE19527604A1 (de) 1995-07-28 1995-07-28 Verfahren und Vorrichtung zur Herstellung von metallfreien Streifen bei der Metallbedampfung
DE19527604.3 1995-07-28

Publications (2)

Publication Number Publication Date
KR970006538A true KR970006538A (ko) 1997-02-21
KR100278826B1 KR100278826B1 (ko) 2001-01-15

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KR1019960028095A KR100278826B1 (ko) 1995-07-28 1996-07-12 금속증착시 무금속띠 형성방법 및 장치

Country Status (6)

Country Link
US (1) US5652022A (ko)
EP (1) EP0756020B1 (ko)
JP (1) JPH09195048A (ko)
KR (1) KR100278826B1 (ko)
CN (1) CN1066780C (ko)
DE (2) DE19527604A1 (ko)

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KR100639935B1 (ko) * 1999-01-14 2006-10-31 어플라이드 매터리얼스 게엠베하 운트 컴퍼니 카게 띠형 기판의 가스처리 장치

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KR101201755B1 (ko) 2010-11-02 2012-11-15 삼성에스디아이 주식회사 진공 증착 장치 및 이를 이용한 진공 증착 방법
CN104233193A (zh) * 2013-06-06 2014-12-24 上海和辉光电有限公司 蒸镀装置及蒸镀方法
JP6509696B2 (ja) * 2015-09-18 2019-05-08 株式会社アルバック 真空処理装置
JP6796970B2 (ja) * 2016-08-26 2020-12-09 株式会社アルバック マスク材走行ユニット
CN113684464B (zh) * 2021-08-27 2023-06-02 辽宁分子流科技有限公司 一种用于石墨烯复合薄膜制备的卷绕式设备

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Publication number Priority date Publication date Assignee Title
KR100639935B1 (ko) * 1999-01-14 2006-10-31 어플라이드 매터리얼스 게엠베하 운트 컴퍼니 카게 띠형 기판의 가스처리 장치

Also Published As

Publication number Publication date
EP0756020A1 (de) 1997-01-29
DE19527604A1 (de) 1997-01-30
CN1148099A (zh) 1997-04-23
EP0756020B1 (de) 1998-12-02
DE59600890D1 (de) 1999-01-14
JPH09195048A (ja) 1997-07-29
US5652022A (en) 1997-07-29
KR100278826B1 (ko) 2001-01-15
CN1066780C (zh) 2001-06-06

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