KR960031480U - 실리콘웨이퍼폐수의 재이용장치 - Google Patents
실리콘웨이퍼폐수의 재이용장치Info
- Publication number
- KR960031480U KR960031480U KR2019950006156U KR19950006156U KR960031480U KR 960031480 U KR960031480 U KR 960031480U KR 2019950006156 U KR2019950006156 U KR 2019950006156U KR 19950006156 U KR19950006156 U KR 19950006156U KR 960031480 U KR960031480 U KR 960031480U
- Authority
- KR
- South Korea
- Prior art keywords
- silicon wafer
- recycling device
- wastewater recycling
- wastewater
- wafer
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
- 238000004064 recycling Methods 0.000 title 1
- 229910052710 silicon Inorganic materials 0.000 title 1
- 239000010703 silicon Substances 0.000 title 1
- 239000002351 wastewater Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950006156U KR0124499Y1 (ko) | 1995-03-30 | 1995-03-30 | 실리콘웨이퍼폐수의 재이용장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950006156U KR0124499Y1 (ko) | 1995-03-30 | 1995-03-30 | 실리콘웨이퍼폐수의 재이용장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960031480U true KR960031480U (ko) | 1996-10-22 |
KR0124499Y1 KR0124499Y1 (ko) | 1998-08-17 |
Family
ID=19410384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950006156U KR0124499Y1 (ko) | 1995-03-30 | 1995-03-30 | 실리콘웨이퍼폐수의 재이용장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0124499Y1 (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020065106A (ko) * | 2001-02-05 | 2002-08-13 | 동안엔지니어링 주식회사 | 반도체 세정폐수 중 절삭공정 폐수의 재이용방법 |
KR101007522B1 (ko) * | 2010-11-12 | 2011-01-14 | 주식회사 시노펙스 | 멤브레인을 이용한 불산 폐수 처리시스템 및 처리방법 |
KR101142034B1 (ko) * | 2009-10-01 | 2012-05-22 | (주)에스엠텍 | 기판 식각 장치의 슬러지 필터 시스템 |
CN114341062A (zh) * | 2019-08-26 | 2022-04-12 | 懿华水处理技术有限责任公司 | 唑类的处理 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101336657B1 (ko) * | 2013-02-28 | 2013-12-04 | 차춘근 | 불산 폐액 재이용 멤브레인 시스템 및 재이용 방법 |
KR101641058B1 (ko) | 2015-09-21 | 2016-07-20 | 우진건설주식회사 | 분리막을 이용한 실리콘 웨이퍼 가공 폐수 재이용 시스템 |
-
1995
- 1995-03-30 KR KR2019950006156U patent/KR0124499Y1/ko not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020065106A (ko) * | 2001-02-05 | 2002-08-13 | 동안엔지니어링 주식회사 | 반도체 세정폐수 중 절삭공정 폐수의 재이용방법 |
KR101142034B1 (ko) * | 2009-10-01 | 2012-05-22 | (주)에스엠텍 | 기판 식각 장치의 슬러지 필터 시스템 |
KR101007522B1 (ko) * | 2010-11-12 | 2011-01-14 | 주식회사 시노펙스 | 멤브레인을 이용한 불산 폐수 처리시스템 및 처리방법 |
CN114341062A (zh) * | 2019-08-26 | 2022-04-12 | 懿华水处理技术有限责任公司 | 唑类的处理 |
Also Published As
Publication number | Publication date |
---|---|
KR0124499Y1 (ko) | 1998-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20070725 Year of fee payment: 10 |
|
LAPS | Lapse due to unpaid annual fee |