KR960025322U - 웨이퍼 에칭을 위한 씨너공급 장치 - Google Patents
웨이퍼 에칭을 위한 씨너공급 장치Info
- Publication number
- KR960025322U KR960025322U KR2019940034750U KR19940034750U KR960025322U KR 960025322 U KR960025322 U KR 960025322U KR 2019940034750 U KR2019940034750 U KR 2019940034750U KR 19940034750 U KR19940034750 U KR 19940034750U KR 960025322 U KR960025322 U KR 960025322U
- Authority
- KR
- South Korea
- Prior art keywords
- supply device
- wafer etching
- thinner supply
- thinner
- wafer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940034750U KR0132019Y1 (ko) | 1994-12-20 | 1994-12-20 | 웨이퍼 에칭을 위한 씨너공급 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019940034750U KR0132019Y1 (ko) | 1994-12-20 | 1994-12-20 | 웨이퍼 에칭을 위한 씨너공급 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR960025322U true KR960025322U (ko) | 1996-07-22 |
KR0132019Y1 KR0132019Y1 (ko) | 1999-02-01 |
Family
ID=19401956
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019940034750U KR0132019Y1 (ko) | 1994-12-20 | 1994-12-20 | 웨이퍼 에칭을 위한 씨너공급 장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0132019Y1 (ko) |
-
1994
- 1994-12-20 KR KR2019940034750U patent/KR0132019Y1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0132019Y1 (ko) | 1999-02-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20050822 Year of fee payment: 8 |
|
LAPS | Lapse due to unpaid annual fee |