KR960010432B1 - 펄스 비임 발생 방법 및 발생 장치 - Google Patents
펄스 비임 발생 방법 및 발생 장치 Download PDFInfo
- Publication number
- KR960010432B1 KR960010432B1 KR1019930008386A KR930008386A KR960010432B1 KR 960010432 B1 KR960010432 B1 KR 960010432B1 KR 1019930008386 A KR1019930008386 A KR 1019930008386A KR 930008386 A KR930008386 A KR 930008386A KR 960010432 B1 KR960010432 B1 KR 960010432B1
- Authority
- KR
- South Korea
- Prior art keywords
- sectional shape
- cross
- aperture
- pulse
- electron beam
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 9
- 238000005520 cutting process Methods 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 description 43
- 238000010586 diagram Methods 0.000 description 6
- 238000000465 moulding Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000007493 shaping process Methods 0.000 description 4
- 238000000605 extraction Methods 0.000 description 3
- 230000005405 multipole Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 241000269799 Perca fluviatilis Species 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/045—Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP92-124866 | 1992-05-18 | ||
JP4124866A JP3046452B2 (ja) | 1992-05-18 | 1992-05-18 | パルスビーム発生方法および発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930024280A KR930024280A (ko) | 1993-12-22 |
KR960010432B1 true KR960010432B1 (ko) | 1996-07-31 |
Family
ID=14896039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930008386A KR960010432B1 (ko) | 1992-05-18 | 1993-05-17 | 펄스 비임 발생 방법 및 발생 장치 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5406178A (ja) |
JP (1) | JP3046452B2 (ja) |
KR (1) | KR960010432B1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004037781A1 (de) * | 2004-08-03 | 2006-02-23 | Carl Zeiss Nts Gmbh | Elektronenstrahlgerät |
KR20240097977A (ko) | 2017-09-29 | 2024-06-27 | 에이에스엠엘 네델란즈 비.브이. | 하전 입자 빔 검사를 위한 샘플 사전-충전 방법들 및 장치들 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4075488A (en) * | 1974-09-06 | 1978-02-21 | Agency Of Industrial Science & Technology | Pattern forming apparatus using quadrupole lenses |
US4243866A (en) * | 1979-01-11 | 1981-01-06 | International Business Machines Corporation | Method and apparatus for forming a variable size electron beam |
DE3010815C2 (de) * | 1980-03-20 | 1982-08-19 | Siemens AG, 1000 Berlin und 8000 München | Hochstrom-Elektronenquelle |
US5180919A (en) * | 1990-09-18 | 1993-01-19 | Fujitsu Limited | Electron beam exposure system having the capability of checking the pattern of an electron mask used for shaping an electron beam |
-
1992
- 1992-05-18 JP JP4124866A patent/JP3046452B2/ja not_active Expired - Fee Related
-
1993
- 1993-05-14 US US08/061,003 patent/US5406178A/en not_active Expired - Lifetime
- 1993-05-17 KR KR1019930008386A patent/KR960010432B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5406178A (en) | 1995-04-11 |
JPH05325867A (ja) | 1993-12-10 |
KR930024280A (ko) | 1993-12-22 |
JP3046452B2 (ja) | 2000-05-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20030701 Year of fee payment: 8 |
|
LAPS | Lapse due to unpaid annual fee |