KR960008862A - 전도성 막 형성 재료, 이를 사용한 전도성 막 형성 방법 및 전자 방출 소자, 전자원 및 화상 형성 장치의 제조 방법 - Google Patents

전도성 막 형성 재료, 이를 사용한 전도성 막 형성 방법 및 전자 방출 소자, 전자원 및 화상 형성 장치의 제조 방법 Download PDF

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Publication number
KR960008862A
KR960008862A KR1019950023638A KR19950023638A KR960008862A KR 960008862 A KR960008862 A KR 960008862A KR 1019950023638 A KR1019950023638 A KR 1019950023638A KR 19950023638 A KR19950023638 A KR 19950023638A KR 960008862 A KR960008862 A KR 960008862A
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KR
South Korea
Prior art keywords
conductive film
film forming
emitting device
same
image forming
Prior art date
Application number
KR1019950023638A
Other languages
English (en)
Other versions
KR100200259B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of KR960008862A publication Critical patent/KR960008862A/ko
Application granted granted Critical
Publication of KR100200259B1 publication Critical patent/KR100200259B1/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G17/00—Electrographic processes using patterns other than charge patterns, e.g. an electric conductivity pattern; Processes involving a migration, e.g. photoelectrophoresis, photoelectrosolography; Processes involving a selective transfer, e.g. electrophoto-adhesive processes; Apparatus essentially involving a single such process
    • G03G17/04—Electrographic processes using patterns other than charge patterns, e.g. an electric conductivity pattern; Processes involving a migration, e.g. photoelectrophoresis, photoelectrosolography; Processes involving a selective transfer, e.g. electrophoto-adhesive processes; Apparatus essentially involving a single such process using photoelectrophoresis
    • G03G17/06—Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/316—Cold cathodes, e.g. field-emissive cathode having an electric field parallel to the surface, e.g. thin film cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/027—Manufacture of electrodes or electrode systems of cold cathodes of thin film cathodes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/02—Alignment layer characterised by chemical composition
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/02—Alignment layer characterised by chemical composition
    • C09K2323/021—Inorganic, e.g. glass or silicon oxide
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/316—Cold cathodes having an electric field parallel to the surface thereof, e.g. thin film cathodes
    • H01J2201/3165—Surface conduction emission type cathodes
KR1019950023638A 1994-08-01 1995-08-01 전도성 막 형성재료, 이를 사용한 전도성 막 형성방법 및 전자 방출 소자, 전자원 및 화상 형성 장치의 제조 방법 KR100200259B1 (ko)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP19713494 1994-08-01
JP94-197135 1994-08-01
JP94-197134 1994-08-01
JP19713594 1994-08-01
JP94-209382 1994-08-11
JP20938294 1994-08-11
JP95-208484 1995-07-25
JP20848495A JP3208526B2 (ja) 1994-08-01 1995-07-25 導電性膜形成用材料、該材料を用いる導電性膜の形成方法、及び、該形成方法を用いる液晶配向膜の形成方法

Publications (2)

Publication Number Publication Date
KR960008862A true KR960008862A (ko) 1996-03-22
KR100200259B1 KR100200259B1 (ko) 1999-06-15

Family

ID=27475856

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950023638A KR100200259B1 (ko) 1994-08-01 1995-08-01 전도성 막 형성재료, 이를 사용한 전도성 막 형성방법 및 전자 방출 소자, 전자원 및 화상 형성 장치의 제조 방법

Country Status (6)

Country Link
US (1) US6106906A (ko)
EP (1) EP0700064B1 (ko)
JP (1) JP3208526B2 (ko)
KR (1) KR100200259B1 (ko)
CN (2) CN1110832C (ko)
DE (1) DE69530960T2 (ko)

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TW378345B (en) * 1997-01-22 2000-01-01 Hitachi Ltd Resin package type semiconductor device and manufacturing method thereof
JPH10326559A (ja) * 1997-03-21 1998-12-08 Canon Inc プリント基板、電子放出素子、電子源、および画像形成装置の製造方法
JPH10313008A (ja) 1997-05-13 1998-11-24 Canon Inc 微細パターンの形成方法及び該微細パターンを有する電気素子
US6858423B1 (en) * 1998-06-05 2005-02-22 The Regents Of The University Of California Optical Amplification of molecular interactions using liquid crystals
JP4250345B2 (ja) 2000-02-08 2009-04-08 キヤノン株式会社 導電性膜形成用組成物、導電性膜の形成方法および画像形成装置の製造方法
JP3902995B2 (ja) 2001-10-11 2007-04-11 キヤノン株式会社 電子放出素子、電子源及び画像形成装置の製造方法
US8409674B2 (en) * 2003-08-08 2013-04-02 Merck Patent Gmbh Alignment layer with reactive mesogens for aligning liquid crystal molecules
JP2005189270A (ja) * 2003-12-24 2005-07-14 Chi Mei Electronics Corp 配向膜およびその配向膜を使用した液晶ディスプレイ
JP3809182B2 (ja) * 2004-01-08 2006-08-16 松下電器産業株式会社 電子放出材料とその製造方法ならびにこれを用いた電子放出素子
JP3740485B2 (ja) * 2004-02-24 2006-02-01 キヤノン株式会社 電子放出素子、電子源、画像表示装置の製造方法及び駆動方法
US7547620B2 (en) * 2004-09-01 2009-06-16 Canon Kabushiki Kaisha Film pattern producing method, and producing method for electronic device, electron-emitting device and electron source substrate utilizing the same
JP4435033B2 (ja) * 2005-06-16 2010-03-17 株式会社東芝 蛍光パターン形成物、記録媒体、セキュリティー媒体、及び記録方法
ES2272172B1 (es) * 2005-07-29 2008-04-01 Consejo Superior Investig. Cientificas Procedimiento para la obtencion de patrones en un sustrato organico conductor y material de naturaleza organica asi obtenido.
JP5443127B2 (ja) * 2009-10-28 2014-03-19 東京エレクトロン株式会社 プラズマ処理装置
US8801965B2 (en) * 2012-10-09 2014-08-12 Shenzen China Star Optoelectronic Technology co., Ltd. Liquid crystal medium composition and liquid crystal display panel manufactured with same
US10186342B2 (en) 2016-08-09 2019-01-22 Eastman Kodak Company Photosensitive reducible silver ion-containing compositions
US10314173B2 (en) 2016-08-09 2019-06-04 Eastman Kodak Company Articles with reducible silver ions or silver metal
US10311990B2 (en) 2016-08-09 2019-06-04 Eastman Kodak Company Photosensitive reducible silver ion-containing compositions
EP3497106B1 (en) * 2016-08-09 2020-05-13 Eastman Kodak Company Silver ion carboxylate primary alkylamine complexes
US10356899B2 (en) 2016-08-09 2019-07-16 Eastman Kodak Company Articles having reducible silver ion complexes or silver metal
US9718842B1 (en) * 2016-08-09 2017-08-01 Eastman Kodak Company Silver ion carboxylate primary alkylamine complexes
US10087331B2 (en) 2016-08-09 2018-10-02 Eastman Kodak Company Methods for forming and using silver metal

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Publication number Priority date Publication date Assignee Title
DE2939920C2 (de) * 1979-10-02 1982-09-23 W.C. Heraeus Gmbh, 6450 Hanau Verwendung eines Amins in einem Bad zum galvanischen Abscheiden von Palladium
US4835083A (en) * 1986-04-16 1989-05-30 Canon Kabushiki Kaisha Method for patterning electroconductive film and patterned electroconductive film
JPS63192874A (ja) * 1987-02-06 1988-08-10 Electroplating Eng Of Japan Co 金属被膜品の製造方法
JP2538043B2 (ja) * 1989-04-05 1996-09-25 松下電器産業株式会社 パタ―ン形成用材料とそれを用いたパタ―ン形成基板の作製方法
US5227223A (en) * 1989-12-21 1993-07-13 Monsanto Company Fabricating metal articles from printed images
US5225273A (en) * 1989-12-28 1993-07-06 Teijin Limited Transparent electroconductive laminate
US5149854A (en) * 1990-12-10 1992-09-22 Mooney Chemicals, Inc. Preparation of platinum group metal and rhenium carboxylates
DE69232874T2 (de) * 1991-09-20 2003-09-25 Hitachi Ltd Anzeige mit Antireflektionsschicht, Kathodenstrahlröhre und Flüssigkristallanzeige
FR2685340B1 (fr) * 1991-12-18 1994-02-04 Rhone Poulenc Films Compositions electroconductrices de polymeres contenant des composes amphiphiles polymerisables derives du pyrrole, leur obtention et leur utilisation.
JPH09102666A (ja) * 1995-07-31 1997-04-15 Ngk Insulators Ltd 膜形成方法

Also Published As

Publication number Publication date
CN1131328A (zh) 1996-09-18
JPH08104810A (ja) 1996-04-23
CN1110832C (zh) 2003-06-04
JP3208526B2 (ja) 2001-09-17
KR100200259B1 (ko) 1999-06-15
EP0700064B1 (en) 2003-06-04
DE69530960T2 (de) 2004-05-19
US6106906A (en) 2000-08-22
EP0700064A1 (en) 1996-03-06
DE69530960D1 (de) 2003-07-10
CN1379413A (zh) 2002-11-13

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