FI981802A - Ohutkalvo-elektroluminesenssi-laite ja menetelmä sen valmistamiseksi - Google Patents

Ohutkalvo-elektroluminesenssi-laite ja menetelmä sen valmistamiseksi Download PDF

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Publication number
FI981802A
FI981802A FI981802A FI981802A FI981802A FI 981802 A FI981802 A FI 981802A FI 981802 A FI981802 A FI 981802A FI 981802 A FI981802 A FI 981802A FI 981802 A FI981802 A FI 981802A
Authority
FI
Finland
Prior art keywords
making
thin film
film electroluminescence
electroluminescence apparatus
thin
Prior art date
Application number
FI981802A
Other languages
English (en)
Swedish (sv)
Other versions
FI981802A0 (fi
FI105643B (fi
Inventor
Gitte Haerkoenen
Kari Haerkoenen
Arto Pakkala
Tuomas Pitkaenen
Original Assignee
Planar Systems Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Planar Systems Oy filed Critical Planar Systems Oy
Priority to FI981802A priority Critical patent/FI105643B/fi
Publication of FI981802A0 publication Critical patent/FI981802A0/fi
Priority to DE1999139658 priority patent/DE19939658A1/de
Priority to JP11233749A priority patent/JP2000068072A/ja
Publication of FI981802A publication Critical patent/FI981802A/fi
Application granted granted Critical
Publication of FI105643B publication Critical patent/FI105643B/fi

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/14—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of the electroluminescent material, or by the simultaneous addition of the electroluminescent material in or onto the light source
    • H05B33/145—Arrangements of the electroluminescent material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
FI981802A 1998-08-21 1998-08-21 Ohutkalvo-elektroluminesenssilaite ja menetelmä sen valmistamiseksi FI105643B (fi)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FI981802A FI105643B (fi) 1998-08-21 1998-08-21 Ohutkalvo-elektroluminesenssilaite ja menetelmä sen valmistamiseksi
DE1999139658 DE19939658A1 (de) 1998-08-21 1999-08-20 Elektrolumineszente Dünnfilmvorrichtung und Verfahren zu deren Herstellung
JP11233749A JP2000068072A (ja) 1998-08-21 1999-08-20 薄膜エレクトロルミネッセンスデバイスとその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI981802 1998-08-21
FI981802A FI105643B (fi) 1998-08-21 1998-08-21 Ohutkalvo-elektroluminesenssilaite ja menetelmä sen valmistamiseksi

Publications (3)

Publication Number Publication Date
FI981802A0 FI981802A0 (fi) 1998-08-21
FI981802A true FI981802A (fi) 2000-02-22
FI105643B FI105643B (fi) 2000-09-15

Family

ID=8552342

Family Applications (1)

Application Number Title Priority Date Filing Date
FI981802A FI105643B (fi) 1998-08-21 1998-08-21 Ohutkalvo-elektroluminesenssilaite ja menetelmä sen valmistamiseksi

Country Status (3)

Country Link
JP (1) JP2000068072A (fi)
DE (1) DE19939658A1 (fi)
FI (1) FI105643B (fi)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6620723B1 (en) 2000-06-27 2003-09-16 Applied Materials, Inc. Formation of boride barrier layers using chemisorption techniques
US7732327B2 (en) 2000-06-28 2010-06-08 Applied Materials, Inc. Vapor deposition of tungsten materials
US7964505B2 (en) 2005-01-19 2011-06-21 Applied Materials, Inc. Atomic layer deposition of tungsten materials
US6551929B1 (en) 2000-06-28 2003-04-22 Applied Materials, Inc. Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques
US7405158B2 (en) 2000-06-28 2008-07-29 Applied Materials, Inc. Methods for depositing tungsten layers employing atomic layer deposition techniques
US6765178B2 (en) 2000-12-29 2004-07-20 Applied Materials, Inc. Chamber for uniform substrate heating
US6825447B2 (en) 2000-12-29 2004-11-30 Applied Materials, Inc. Apparatus and method for uniform substrate heating and contaminate collection
US6951804B2 (en) 2001-02-02 2005-10-04 Applied Materials, Inc. Formation of a tantalum-nitride layer
US6660126B2 (en) 2001-03-02 2003-12-09 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6878206B2 (en) 2001-07-16 2005-04-12 Applied Materials, Inc. Lid assembly for a processing system to facilitate sequential deposition techniques
US6734020B2 (en) 2001-03-07 2004-05-11 Applied Materials, Inc. Valve control system for atomic layer deposition chamber
US7211144B2 (en) 2001-07-13 2007-05-01 Applied Materials, Inc. Pulsed nucleation deposition of tungsten layers
US6916398B2 (en) 2001-10-26 2005-07-12 Applied Materials, Inc. Gas delivery apparatus and method for atomic layer deposition
US7780785B2 (en) 2001-10-26 2010-08-24 Applied Materials, Inc. Gas delivery apparatus for atomic layer deposition
US6729824B2 (en) 2001-12-14 2004-05-04 Applied Materials, Inc. Dual robot processing system
US6620670B2 (en) 2002-01-18 2003-09-16 Applied Materials, Inc. Process conditions and precursors for atomic layer deposition (ALD) of AL2O3
US6911391B2 (en) 2002-01-26 2005-06-28 Applied Materials, Inc. Integration of titanium and titanium nitride layers
US6998014B2 (en) 2002-01-26 2006-02-14 Applied Materials, Inc. Apparatus and method for plasma assisted deposition
US6827978B2 (en) 2002-02-11 2004-12-07 Applied Materials, Inc. Deposition of tungsten films
US6833161B2 (en) 2002-02-26 2004-12-21 Applied Materials, Inc. Cyclical deposition of tungsten nitride for metal oxide gate electrode
US6720027B2 (en) 2002-04-08 2004-04-13 Applied Materials, Inc. Cyclical deposition of a variable content titanium silicon nitride layer
US7279432B2 (en) 2002-04-16 2007-10-09 Applied Materials, Inc. System and method for forming an integrated barrier layer
CN100566480C (zh) * 2002-12-20 2009-12-02 伊菲雷知识产权公司 用于厚膜介电电致发光显示器的阻挡层

Also Published As

Publication number Publication date
FI981802A0 (fi) 1998-08-21
JP2000068072A (ja) 2000-03-03
FI105643B (fi) 2000-09-15
DE19939658A1 (de) 2000-03-23

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Legal Events

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PC Transfer of assignment of patent

Owner name: BENEQ OY

MA Patent expired