KR950702313A - 컬러필터 및 그의 소재와 수지 - Google Patents

컬러필터 및 그의 소재와 수지

Info

Publication number
KR950702313A
KR950702313A KR1019940704648A KR19940704648A KR950702313A KR 950702313 A KR950702313 A KR 950702313A KR 1019940704648 A KR1019940704648 A KR 1019940704648A KR 19940704648 A KR19940704648 A KR 19940704648A KR 950702313 A KR950702313 A KR 950702313A
Authority
KR
South Korea
Prior art keywords
resin
color filter
color
filter
Prior art date
Application number
KR1019940704648A
Other languages
English (en)
Other versions
KR100228293B1 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP18476292A external-priority patent/JP2575572B2/ja
Priority claimed from JP35131392A external-priority patent/JP3148429B2/ja
Application filed filed Critical
Publication of KR950702313A publication Critical patent/KR950702313A/ko
Application granted granted Critical
Publication of KR100228293B1 publication Critical patent/KR100228293B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461—Unsaturated monoacids
    • C08G59/1466—Acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C08L67/06—Unsaturated polyesters
    • C08L67/07—Unsaturated polyesters having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Optical Filters (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
KR1019940704648A 1992-06-19 1993-04-26 컬러필터 및 그의 소재와 수지 KR100228293B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP18476292A JP2575572B2 (ja) 1992-06-19 1992-06-19 アルカリ現像型感光性カラーフィルター用インク及びそれを用いたカラーフィルター
JP1992-184762 1992-06-19
JP1992-351313 1992-12-07
JP35131392A JP3148429B2 (ja) 1992-02-04 1992-12-07 光重合性不飽和化合物及びアルカリ現像型感光性樹脂組成物
PCT/JP1993/000536 WO1994000801A1 (en) 1992-06-19 1993-04-26 Color filter, material thereof and resin

Publications (2)

Publication Number Publication Date
KR950702313A true KR950702313A (ko) 1995-06-19
KR100228293B1 KR100228293B1 (ko) 1999-11-01

Family

ID=26502699

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940704648A KR100228293B1 (ko) 1992-06-19 1993-04-26 컬러필터 및 그의 소재와 수지

Country Status (5)

Country Link
US (1) US5721076A (ko)
EP (1) EP0646845B1 (ko)
KR (1) KR100228293B1 (ko)
DE (1) DE69330028T2 (ko)
WO (1) WO1994000801A1 (ko)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8216770B2 (en) 2006-10-16 2012-07-10 Cheil Industries Inc. Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method
US8273270B2 (en) 2010-10-13 2012-09-25 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8298454B2 (en) 2010-12-10 2012-10-30 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8318053B2 (en) 2010-12-24 2012-11-27 Cheil Industries Inc. Photosensitive resin composition and color filter using the same
US8530537B2 (en) 2010-09-29 2013-09-10 Cheil Industries Inc. Black photosensitive resin composition and light blocking layer using the same
US8822110B2 (en) 2011-12-02 2014-09-02 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter including the same

Families Citing this family (39)

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JP3709565B2 (ja) * 1995-01-25 2005-10-26 三菱化学株式会社 カラーフィルター用重合組成物
JP3190251B2 (ja) * 1995-06-06 2001-07-23 太陽インキ製造株式会社 アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物
US5908721A (en) * 1996-02-09 1999-06-01 Sharp Kabushiki Kaisha Using light-shading colored ink capable of changing from hydrophilic to hydrophobic
KR100343754B1 (ko) * 1997-12-04 2004-07-07 제일모직주식회사 내열성, 내화성 및 접착성이 우수한 감광성 수지 조성물
KR19990047371A (ko) * 1997-12-04 1999-07-05 유현식 칼러 레지스트 수지 조성물
KR19990047372A (ko) * 1997-12-04 1999-07-05 유현식 칼러 레지스트 수지 조성물
KR19990047373A (ko) * 1997-12-04 1999-07-05 유현식 칼러 레지스트 수지 조성물
EP1026193B1 (en) * 1998-08-28 2004-02-11 Toray Industries, Inc. Colored polymer thin film, color filter, and liquid crystal display
US6753922B1 (en) * 1998-10-13 2004-06-22 Intel Corporation Image sensor mounted by mass reflow
US6342321B1 (en) 1998-12-25 2002-01-29 Canon Kabushiki Kaisha Method of drying resinous composition layer, method of manufacturing color filter substrate using the same drying method, and liquid crystal display device
EP1079262A3 (en) * 1999-08-05 2003-09-10 Canon Kabushiki Kaisha Method and apparatus for manufacturing a color filter
KR100550938B1 (ko) * 1999-12-28 2006-02-13 제일모직주식회사 광중합성 감광 수지 조성물
JP4558178B2 (ja) 2000-11-30 2010-10-06 新日鐵化学株式会社 光又は熱硬化性樹脂組成物及びプリント配線基板
JP2003057845A (ja) * 2001-08-16 2003-02-28 Sumitomo Chem Co Ltd 着色パターンの形成方法
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KR100909419B1 (ko) * 2002-12-27 2009-07-28 엘지디스플레이 주식회사 액정표시소자의 칼라필터 제조방법
WO2005015309A2 (en) * 2003-07-17 2005-02-17 Cytec Surface Specialties, S.A. Alkali-developable radiation curable composition
TW200530281A (en) * 2003-11-26 2005-09-16 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same
TWI285297B (en) * 2004-02-09 2007-08-11 Chi Mei Corp Light-sensitive resin composition for black matrix
TWI349677B (en) * 2004-03-30 2011-10-01 Nippon Steel Chemical Co Photosensitive resin composition and color filter using the same
US20060166114A1 (en) * 2004-06-21 2006-07-27 Chun-Hsien Lee Photosensitive resin composition for black matrix
JP4508928B2 (ja) * 2005-03-31 2010-07-21 新日鐵化学株式会社 感光性樹脂組成物及びそれを用いたカラーフィルター
US7460267B2 (en) * 2005-07-15 2008-12-02 Applied Materials, Inc. Green printing ink for color filter applications
US20070015847A1 (en) * 2005-07-15 2007-01-18 Applied Materials, Inc. Red printing ink for color filter applications
US7544723B2 (en) * 2005-07-15 2009-06-09 Applied Materials, Inc. Blue printing ink for color filter applications
JP2007131831A (ja) * 2005-11-09 2007-05-31 Cheil Industries Inc ベンゼン化合物で表面処理されたカーボンブラック及びこれを利用したカラーフィルター用ブラックマトリックスに用いるカーボンブラック分散液組成物
KR100655045B1 (ko) * 2005-12-30 2006-12-06 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙 매트릭스
US20080220372A1 (en) * 2006-03-23 2008-09-11 Chun-Hsien Lee Photosensitive resin composition for black matrix
TWI397769B (zh) * 2006-11-30 2013-06-01 Nippon Steel Chemical Co Alkali-soluble resin and method for producing the same, and a photosensitive resin composition, a hardened product and a color filter using an alkali-soluble resin
JP5224130B2 (ja) * 2008-03-10 2013-07-03 ナガセケムテックス株式会社 撥液性樹脂組成物
KR101148548B1 (ko) * 2008-09-30 2012-05-21 코오롱인더스트리 주식회사 감광성 수지 조성물
KR20140076320A (ko) 2012-12-12 2014-06-20 제일모직주식회사 감광성 수지 조성물 및 이를 이용한 블랙 스페이서
KR101664121B1 (ko) 2012-12-13 2016-10-10 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101609634B1 (ko) 2012-12-26 2016-04-06 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR102162595B1 (ko) 2013-03-21 2020-10-07 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 절연막용 감광성 수지 조성물 및 경화물
US9029052B1 (en) * 2013-12-05 2015-05-12 Chi Mei Corporation Photosensitive resin composition, color filter and method for manufacturing the same, and liquid crystal display apparatus
JP2016148874A (ja) * 2016-05-23 2016-08-18 日本化薬株式会社 反応性カルボキシレート化合物、それを用いた活性エネルギー線硬化型樹脂組成物、およびその用途
KR102071112B1 (ko) * 2017-10-11 2020-01-29 타코마테크놀러지 주식회사 바인더 수지 및 이를 포함하는 감광성 수지 조성물 또는 코팅 용액
JP2021161402A (ja) 2020-03-31 2021-10-11 日鉄ケミカル＆マテリアル株式会社 重合性不飽和基含有アルカリ可溶性樹脂、それを必須成分とする感光性樹脂組成物および当該組成物の硬化物

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8216770B2 (en) 2006-10-16 2012-07-10 Cheil Industries Inc. Resin composition comprising cardo resin, method for forming pattern using the resin composition and color filter using pattern formed by the method
US8530537B2 (en) 2010-09-29 2013-09-10 Cheil Industries Inc. Black photosensitive resin composition and light blocking layer using the same
US8273270B2 (en) 2010-10-13 2012-09-25 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8298454B2 (en) 2010-12-10 2012-10-30 Cheil Industries Inc. Photosensitive resin composition and light blocking layer using the same
US8318053B2 (en) 2010-12-24 2012-11-27 Cheil Industries Inc. Photosensitive resin composition and color filter using the same
US8822110B2 (en) 2011-12-02 2014-09-02 Cheil Industries Inc. Photosensitive resin composition for color filter and color filter including the same

Also Published As

Publication number Publication date
DE69330028D1 (de) 2001-04-19
EP0646845A4 (en) 1995-11-15
KR100228293B1 (ko) 1999-11-01
US5721076A (en) 1998-02-24
WO1994000801A1 (en) 1994-01-06
EP0646845B1 (en) 2001-03-14
DE69330028T2 (de) 2001-08-23
EP0646845A1 (en) 1995-04-05

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