KR950027496A - 광중합조성물과 이를 이용한 화상형성방법 및 칼라필터 - Google Patents

광중합조성물과 이를 이용한 화상형성방법 및 칼라필터 Download PDF

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Publication number
KR950027496A
KR950027496A KR1019950005357A KR19950005357A KR950027496A KR 950027496 A KR950027496 A KR 950027496A KR 1019950005357 A KR1019950005357 A KR 1019950005357A KR 19950005357 A KR19950005357 A KR 19950005357A KR 950027496 A KR950027496 A KR 950027496A
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KR
South Korea
Prior art keywords
photopolymerization composition
image forming
forming method
water
photopolymerization
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KR1019950005357A
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English (en)
Inventor
케사나오 코바야시
Original Assignee
오오니시 미노루
후지샤신필림 카부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 오오니시 미노루, 후지샤신필림 카부시키가이샤 filed Critical 오오니시 미노루
Publication of KR950027496A publication Critical patent/KR950027496A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

분자양끝에 최소한 두개의 이중결합을 가지며 상압에서 끓는점이 100℃ 또는 그 이상을 가지는 광중합가능한 최소한 하나의 불포화합물, 함활성할로겐화합물과 3-아릴 치환 쿠말린의 결합으로 구성된 전자기파 조사에 의해 활성화되는 첨가중합개시제로 구성된 광중합조성물이 기술되어 있으며, 광중합조성물을 이용한 화상형성방법과 칼라필터에 관한 것도 기술되어 있다.

Description

광중합조성물과 이를 이용한 화상형성방법 및 칼라필터
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (9)

  1. 분자양끝에 최소한 두개의 이중결합을 가지며 상압에서 끓는점이 100℃ 또는 그 이상을 가지는 광중합가능한 최소한 하나의 불포화합물, 과함활성할로겐화합물과 3-아릴 치환 쿠말린의 결합으로 구성된 전자기파 조사에 의해 활성화되는 첨가중합개시제로 구성된 광중합조성물.
  2. 제1항에 있어서, 곁사슬의 한쪽에 수용성 원자단을 가지는 유기고분자를 포함한 광중합조성물.
  3. 제1항에 있어서, 유기염료를 포함한 광중합조성물.
  4. 제1항에 있어서, 곁사슬의 한쪽에 수용성 원자단을 가지는 유기고분자와 유기염료를 포함한 광중합조성물.
  5. 기판표면에 대한 광중합조성물의 피복단계와, 노출 및 현상단계로 구성되며, 상기한 광중합조성물이, 상압에서의 비틀림이 100℃ 이상이며, 2개 이상의 말단 에틸렌기를 갖는 1종 이상의 광중합 가능한 불포화합물과, 활성 전자기파의 조사에 의해 활성화되는 첨가중합개시제로 조성되며, 상기한 첨가중합개시제가 활성할로겐 화합물과 3-아릴 치환 쿠말린의 결합으로 조성되는 화상형성방법.
  6. 제5항에 있어서, 광중합조성물이 곁사슬의 한쪽에 수용성원자단을 가진 유기 고분자를 포함하는 화상형성방법.
  7. 제5항에 있어서, 광중합조성물이 유기염료를 포함하는 화상형성방법.
  8. 제5항에 있어서, 광중합조성물이 곁사슬의 한쪽에 수용성원자단을 가진 유기고분자와, 유기염료를 포함하는 화상형성방법.
  9. 곁사슬의 한쪽에 수용성 원자기가 있는 유기중합체와 유기 안료를 함유하는 광중합조성물을 투명기판 표면에 도포하는 단계와, 노출 및 현상하는 단계를 반복하여 생산되며, 상기한 단계를 반복하므로써, 투명기판의 표면에 적색, 녹색 및 청색 패턴을 형성하며,
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950005357A 1994-05-16 1995-03-15 광중합조성물과 이를 이용한 화상형성방법 및 칼라필터 KR950027496A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP94-101260 1994-05-16
JP10126094A JPH07311462A (ja) 1994-05-16 1994-05-16 光重合性組成物および画像形成方法

Publications (1)

Publication Number Publication Date
KR950027496A true KR950027496A (ko) 1995-10-18

Family

ID=14295952

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950005357A KR950027496A (ko) 1994-05-16 1995-03-15 광중합조성물과 이를 이용한 화상형성방법 및 칼라필터

Country Status (4)

Country Link
EP (1) EP0683434B1 (ko)
JP (1) JPH07311462A (ko)
KR (1) KR950027496A (ko)
DE (1) DE69506315T2 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002365798A (ja) * 2001-06-12 2002-12-18 Sumitomo Chem Co Ltd 着色感光性樹脂組成物
KR101055187B1 (ko) * 2003-12-18 2011-08-08 엘지디스플레이 주식회사 컬러필터 어레이 기판의 제조방법
WO2006077995A1 (en) 2005-01-18 2006-07-27 Fujifilm Corporation Transparent film and method for manufacturing the same, polarized plate and image display device
WO2008096673A1 (ja) * 2007-02-06 2008-08-14 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料

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Publication number Priority date Publication date Assignee Title
DE2033769B2 (de) 1969-07-11 1980-02-21 Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) Bis-<2-acryloxyäthyl)hexahydrophthalat enthaltende Gemische und Herstellungsverfahren
JPS4841708B1 (ko) 1970-01-13 1973-12-07
JPS506034B1 (ko) 1970-08-11 1975-03-10
DE2064080C3 (de) 1970-12-28 1983-11-03 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Gemisch
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
JPS5324989B2 (ko) 1971-12-09 1978-07-24
JPS5230490B2 (ko) 1972-03-21 1977-08-09
DE2363806B2 (de) 1973-12-21 1979-05-17 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
JPS5311314B2 (ko) 1974-09-25 1978-04-20
ZA757984B (en) 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
US4147552A (en) 1976-05-21 1979-04-03 Eastman Kodak Company Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4341860A (en) * 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPS5944615A (ja) 1982-09-07 1984-03-13 Furuno Electric Co Ltd ジヤイロ装置
JPS5953836A (ja) 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5971048A (ja) 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
JPS62298304A (ja) 1986-06-18 1987-12-25 セイコーインスツルメンツ株式会社 腕時計用ブロツクバンド
JPH02804A (ja) 1987-12-18 1990-01-05 Fuji Photo Film Co Ltd カラーフィルター用多色パターンの形成方法
JPH02153353A (ja) 1988-07-25 1990-06-13 Matsushita Electric Ind Co Ltd 着色光重合組成物およびカラーフィルタ
JP2873889B2 (ja) 1991-01-29 1999-03-24 富士写真フイルム株式会社 感光性転写材料及び画像形成方法

Also Published As

Publication number Publication date
DE69506315D1 (de) 1999-01-14
DE69506315T2 (de) 1999-06-10
JPH07311462A (ja) 1995-11-28
EP0683434A1 (en) 1995-11-22
EP0683434B1 (en) 1998-12-02

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