DE69506315D1 - Fotopolymerisierbare Zusammensetzung, Bildherstellungsverfahren, das diese Zusammensetzung benutzt und Farbfilter, der aus dieser Zusammensetzung hergestellt wird - Google Patents
Fotopolymerisierbare Zusammensetzung, Bildherstellungsverfahren, das diese Zusammensetzung benutzt und Farbfilter, der aus dieser Zusammensetzung hergestellt wirdInfo
- Publication number
- DE69506315D1 DE69506315D1 DE69506315T DE69506315T DE69506315D1 DE 69506315 D1 DE69506315 D1 DE 69506315D1 DE 69506315 T DE69506315 T DE 69506315T DE 69506315 T DE69506315 T DE 69506315T DE 69506315 D1 DE69506315 D1 DE 69506315D1
- Authority
- DE
- Germany
- Prior art keywords
- composition
- color filter
- imaging process
- filter made
- photopolymerizable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10126094A JPH07311462A (ja) | 1994-05-16 | 1994-05-16 | 光重合性組成物および画像形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69506315D1 true DE69506315D1 (de) | 1999-01-14 |
DE69506315T2 DE69506315T2 (de) | 1999-06-10 |
Family
ID=14295952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69506315T Expired - Fee Related DE69506315T2 (de) | 1994-05-16 | 1995-05-15 | Fotopolymerisierbare Zusammensetzung, Bildherstellungsverfahren, das diese Zusammensetzung benutzt und Farbfilter, der aus dieser Zusammensetzung hergestellt wird |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0683434B1 (de) |
JP (1) | JPH07311462A (de) |
KR (1) | KR950027496A (de) |
DE (1) | DE69506315T2 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002365798A (ja) * | 2001-06-12 | 2002-12-18 | Sumitomo Chem Co Ltd | 着色感光性樹脂組成物 |
KR101055187B1 (ko) * | 2003-12-18 | 2011-08-08 | 엘지디스플레이 주식회사 | 컬러필터 어레이 기판의 제조방법 |
WO2006077995A1 (en) | 2005-01-18 | 2006-07-27 | Fujifilm Corporation | Transparent film and method for manufacturing the same, polarized plate and image display device |
WO2008096673A1 (ja) * | 2007-02-06 | 2008-08-14 | Konica Minolta Medical & Graphic, Inc. | 感光性平版印刷版材料 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2033769B2 (de) | 1969-07-11 | 1980-02-21 | Ppg Industries, Inc., Pittsburgh, Pa. (V.St.A.) | Bis-<2-acryloxyäthyl)hexahydrophthalat enthaltende Gemische und Herstellungsverfahren |
JPS4841708B1 (de) | 1970-01-13 | 1973-12-07 | ||
JPS506034B1 (de) | 1970-08-11 | 1975-03-10 | ||
DE2064080C3 (de) | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
US3987037A (en) | 1971-09-03 | 1976-10-19 | Minnesota Mining And Manufacturing Company | Chromophore-substituted vinyl-halomethyl-s-triazines |
JPS5324989B2 (de) | 1971-12-09 | 1978-07-24 | ||
JPS5230490B2 (de) | 1972-03-21 | 1977-08-09 | ||
DE2363806B2 (de) | 1973-12-21 | 1979-05-17 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
JPS5311314B2 (de) | 1974-09-25 | 1978-04-20 | ||
ZA757984B (en) | 1974-10-04 | 1976-12-29 | Dynachem Corp | Polymers for aqueous processed photoresists |
US4147552A (en) | 1976-05-21 | 1979-04-03 | Eastman Kodak Company | Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers |
US4341860A (en) * | 1981-06-08 | 1982-07-27 | E. I. Du Pont De Nemours And Company | Photoimaging compositions containing substituted cyclohexadienone compounds |
JPS5815503A (ja) | 1981-07-20 | 1983-01-28 | Fuji Photo Film Co Ltd | 光重合性組成物 |
JPS5944615A (ja) | 1982-09-07 | 1984-03-13 | Furuno Electric Co Ltd | ジヤイロ装置 |
JPS5953836A (ja) | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
JPS5971048A (ja) | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
JPS62298304A (ja) | 1986-06-18 | 1987-12-25 | セイコーインスツルメンツ株式会社 | 腕時計用ブロツクバンド |
JPH02804A (ja) | 1987-12-18 | 1990-01-05 | Fuji Photo Film Co Ltd | カラーフィルター用多色パターンの形成方法 |
JPH02153353A (ja) * | 1988-07-25 | 1990-06-13 | Matsushita Electric Ind Co Ltd | 着色光重合組成物およびカラーフィルタ |
JP2873889B2 (ja) | 1991-01-29 | 1999-03-24 | 富士写真フイルム株式会社 | 感光性転写材料及び画像形成方法 |
-
1994
- 1994-05-16 JP JP10126094A patent/JPH07311462A/ja active Pending
-
1995
- 1995-03-15 KR KR1019950005357A patent/KR950027496A/ko not_active Application Discontinuation
- 1995-05-15 DE DE69506315T patent/DE69506315T2/de not_active Expired - Fee Related
- 1995-05-15 EP EP95107406A patent/EP0683434B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR950027496A (ko) | 1995-10-18 |
DE69506315T2 (de) | 1999-06-10 |
JPH07311462A (ja) | 1995-11-28 |
EP0683434B1 (de) | 1998-12-02 |
EP0683434A1 (de) | 1995-11-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
|
8339 | Ceased/non-payment of the annual fee |