KR920008871A - 고광선 투과성 방진막 그 제조방법 및 방진체 - Google Patents

고광선 투과성 방진막 그 제조방법 및 방진체 Download PDF

Info

Publication number
KR920008871A
KR920008871A KR1019910018176A KR910018176A KR920008871A KR 920008871 A KR920008871 A KR 920008871A KR 1019910018176 A KR1019910018176 A KR 1019910018176A KR 910018176 A KR910018176 A KR 910018176A KR 920008871 A KR920008871 A KR 920008871A
Authority
KR
South Korea
Prior art keywords
gel
group
compound
sol
light permeable
Prior art date
Application number
KR1019910018176A
Other languages
English (en)
Other versions
KR950002949B1 (ko
Inventor
데쓰야 미야자끼
마유미 가와사끼
타카오 오오노
Original Assignee
다께바야시 쇼오고
미쓰이세끼유 가가꾸고오교오 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다께바야시 쇼오고, 미쓰이세끼유 가가꾸고오교오 가부시끼가이샤 filed Critical 다께바야시 쇼오고
Publication of KR920008871A publication Critical patent/KR920008871A/ko
Application granted granted Critical
Publication of KR950002949B1 publication Critical patent/KR950002949B1/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
    • C03C17/009—Mixtures of organic and inorganic materials, e.g. ormosils and ormocers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
    • C04B41/4535—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension
    • C04B41/4537—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application applied as a solution, emulsion, dispersion or suspension by the sol-gel process
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/02—Polysilicates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/212—TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/214—Al2O3
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/22—ZrO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/28—Other inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Ceramic Engineering (AREA)
  • Structural Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

내용 없음

Description

고광선 투과성 방진막 그 제조방법 및 방진체
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 방진체의 일예를 나타내는 단면도.
제2도는 본 발명의 고광선투과성 방진막의 몇가지예를 나타낸 단면도로, (A)는 겔막 단독으로 된것, (B)는 겔막에 단일의 반사방지층을 설비한것, (C)는 겔막에 고굴절율층과 저굴절층으로된 복합의 반사방지층을 설비한 것임.
제3도는 실시예1의 겔박막의 광선투과율을 나타낸 그래프.

Claims (16)

  1. 다가 금속의 산화물, 수산화물, 유기기함유 산화물 및 유기기 함유 수산화물로 구성된 군에서 선택된 적어도 1종의 투명한 겔로된 고광선 투과성 방진막.
  2. 제1항에 있어서, 상기 겔이 솔겔법에 의하여 형성된 것인 고광선 투과성 방진막.
  3. 제1항에 있어서, 상기 겔이 용매를 함유하는 것인 고광선 투과성 방진막.
  4. 제1항에 있어서, 금속이 규소, 알루미늄, 티타늄 및 지르코늄으로 된 군에서 선택된 적어도 1종인 고광선 투과성 방진막.
  5. 제1항에 있어서, 상기 겔이 식(1)
    Y-Rk 1… (1)
    식중, Y는 규소, 알루미늄, 티타늄, 및 지르코늄으로 된 군에서 선택된 금속원자이고, R1은 가수분해 가능한 1가기이고, k는 금속원자 y의 가수임, 의 화합물로 솔겔법으로 제조한 것인 고광성 투자성 방진막.
  6. 제1항에 있어서, 상기 겔이 규소, 알루미늄, 티타늄 및 지르코늄으로 된 군에서 선택된 금속의 알콕시드, 카복실레이트 질산염 또는 염화물으로 솔겔법으로 형성한 것인 고광선 투과성 방진막.
  7. 제1항에 있어서, 상기 겔이 미립자상의 산화물 또는 수산화물인 화합물로 솔겔법에 의하여 제조한 것인 고광선 투광성 방진막.
  8. 제1항에 있어서, 상기 겔이 실록산기, 실라놀기 및 오르가노 실릴기를 갖는 오르가노 실리카겔인 고광선 투과성 방진막.
  9. 제1항에 있어서, 상기 겔이(I)식(2)
    Rn-Y-R1 k-n…(2)
    식중 R는 1가의 탄화수소기 또는 치환탄화수소기이고, R1은 가수분해 가능한 1가의 기이고, Y는 규소, 알루미늄, 티타늄 및 지르코늄으로 된 군에서 선택한 금속원자이고, n은 1~k-1의 수이고, k는 금속원자 Y의 원자가수임. 화합물 또는 (Ⅱ)의 상기 (I)의 화합물 식(1)
    Y-R1 k…(1)
    식중, Y, R1및 k는 전술한 바와같음. 화합물의 조합으로 솔겔법으로 형성된 것인 고광선 투과성 방진막.
  10. 제9항에 있어서, 상기 겔이 식(2)Rn-Y-R1 k-a로 표시되는 화합물(I)및 식(1) YRI K로 표 TL되는 화합물(Ⅱ)를 가수분해 축합하여 얻어지는 올리고머 또는 폴리머를 원료로 하여 솔겔법으로 제조한 것인 고광선 투과성 방진막.
  11. 청구 제1항 기재의 겔 막위에 반사방지 막을 적층하여 된 고광선 투과성 방진막.
  12. 제11항에 있어서, 반사방지막이 비정질 퍼플루오로 불소수지로 된 것인 고광선 투과성 방진막.
  13. (I)식(1)
    Y-R1 k…(1)
    식중, Y는 규소, 알루미늄, 티타늄, 및 지르코늄으로 된 군에서 선택한 금속원자이고, R1은 가수분해 가능한 1가 기이고, k는 금속원자 Y의 원자기임.의 화합물 (Ⅱ)식(2)
    Rn-Y-R1 k-n…(2)
    식중 R는 1가의 탄화수소기 또는 치환탄화수소기이고, n은 1내지 k-1의 수이고, Y,R1및 k는 전술한 바와같음.의 화합물, 또는(Ⅲ)상기(I)의 화합물이 상기(Ⅱ)의 화합물과의 조합으로, 상기 화합물이 적어도 부분적으로 가수분해된 솔액을 제조하고 이 솔액을 상온 ~500℃의 온도에서 겔막으로 조막하는 것을 특징으로 하는 고광선 투과성 방진막의 제조방법.
  14. 제13항에 있어서, 겔막의 조막을 기판위에 솔액을 도포하고, 이 도포층을 상온 ~500℃의 온도에서 또한 솔액중의 액체 매체의 비등점보다도 낮은 온도에서 건조시키고, 이어서 기판에서 박리함으로써 행하는 고광선 투과성 방진막의 제조방법.
  15. 청구 제1항 기재의 고광성 투과성 방진막과 보지체가 일체화 되어서 된 방진체.
  16. 청구 제11항 기재의 고광성 투과성 방진막과 보지체가 일체화 되어서 된 방진체.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910018176A 1990-10-16 1991-10-16 고광선 투과성 방진막, 그 제조방법 및 방진체 KR950002949B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP90-277113 1990-10-16
JP1990-277113 1990-10-16
JP27711390 1990-10-16

Publications (2)

Publication Number Publication Date
KR920008871A true KR920008871A (ko) 1992-05-28
KR950002949B1 KR950002949B1 (ko) 1995-03-28

Family

ID=17578965

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910018176A KR950002949B1 (ko) 1990-10-16 1991-10-16 고광선 투과성 방진막, 그 제조방법 및 방진체

Country Status (8)

Country Link
US (2) US5674624A (ko)
EP (1) EP0482821B1 (ko)
KR (1) KR950002949B1 (ko)
AT (1) ATE171791T1 (ko)
CA (1) CA2053518A1 (ko)
DE (1) DE69130280T2 (ko)
ES (1) ES2124697T3 (ko)
TW (1) TW271002B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6190491B1 (en) 1995-12-21 2001-02-20 Lawrence J. Sifel et al. Organic shell blank and method for making same
KR20010086934A (ko) * 2000-03-04 2001-09-15 양용진 박판 자개시트칩을 이용한 후판 자개시트의 제조방법과,이 제조방법에 의해 제조된 후판 자개시트 및 이 후판자개시트를 컷팅하여 얻은 장식문양을 적용한 현악기

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2915744B2 (ja) * 1993-04-13 1999-07-05 信越化学工業株式会社 ペリクル
WO1995017347A1 (en) * 1993-12-23 1995-06-29 Ppg Industries, Inc. Silica aerogel produced under subcritical conditions
EP0891387B1 (en) * 1996-04-04 2004-05-26 Nanophase Technologies Corporation Siloxane star-graft polymers, ceramic powders coated therewith and method of preparing coated ceramic powders
GB9702171D0 (en) 1997-01-30 1997-03-26 Martinswerk Gmbh Aluminium hydroxide composite glass microspheres
KR20000064904A (ko) * 1997-02-13 2000-11-06 나까니시 히로유끼 자외선용 펠리클 필름 및 펠리클
US5993967A (en) * 1997-03-28 1999-11-30 Nanophase Technologies Corporation Siloxane star-graft polymers, ceramic powders coated therewith and method of preparing coated ceramic powders
JP2000012428A (ja) * 1998-06-19 2000-01-14 Canon Inc Ｘ線マスク構造体、該ｘ線マスク構造体を用いたｘ線露光方法、前記ｘ線マスク構造体を用いたｘ線露光装置、前記ｘ線マスク構造体を用いた半導体デバイスの製造方法、および該製造方法によって製造された半導体デバイス
DE19840525A1 (de) * 1998-09-06 2000-03-09 Inst Neue Mat Gemein Gmbh Verfahren zur Herstellung optischer Schichten von gleichmäßiger Schichtdicke
EP1190277B1 (en) 1999-06-10 2009-10-07 AlliedSignal Inc. Semiconductor having spin-on-glass anti-reflective coatings for photolithography
US6824879B2 (en) 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
DE19943789A1 (de) * 1999-09-13 2001-03-15 Fraunhofer Ges Forschung Verfahren zur Abscheidung von Zirkonoxid-Schichten unter Verwendung von löslichen Pulvern
JP2001100393A (ja) * 1999-09-28 2001-04-13 Toshiba Corp フォトマスク
US6538364B1 (en) * 1999-09-29 2003-03-25 Osram Sylvania Inc. Light diffusing coating for exterior bulb surfaces
US7000078B1 (en) * 1999-10-01 2006-02-14 Stmicroelectronics Ltd. System and method for maintaining cache coherency in a shared memory system
US6413647B1 (en) * 2000-02-28 2002-07-02 Jsr Corporation Composition for film formation, method of film formation, and silica-based film
US6627356B2 (en) * 2000-03-24 2003-09-30 Kabushiki Kaisha Toshiba Photomask used in manufacturing of semiconductor device, photomask blank, and method of applying light exposure to semiconductor wafer by using said photomask
CN1198316C (zh) * 2000-12-27 2005-04-20 三井化学株式会社 薄膜
US7351503B2 (en) * 2001-01-22 2008-04-01 Photronics, Inc. Fused silica pellicle in intimate contact with the surface of a photomask
US6524754B2 (en) 2001-01-22 2003-02-25 Photronics, Inc. Fused silica pellicle
JP2002372763A (ja) * 2001-04-10 2002-12-26 Mitsubishi Electric Corp 赤外線カメラ用光学窓およびそれを用いた赤外線カメラ並びに赤外線カメラ用光学窓の製造方法
US6594073B2 (en) 2001-05-30 2003-07-15 Micro Lithography, Inc. Antistatic optical pellicle
US6566021B2 (en) * 2001-07-26 2003-05-20 Micro Lithography, Inc. Fluoropolymer-coated photomasks for photolithography
JP4381143B2 (ja) 2001-11-15 2009-12-09 ハネウェル・インターナショナル・インコーポレーテッド フォトリソグラフィー用スピンオン反射防止膜
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US7267847B2 (en) * 2003-12-30 2007-09-11 Phonak Ag Hydrophobic coating of individual components of hearing aid devices
WO2007009543A1 (en) * 2005-07-18 2007-01-25 Carl Zeiss Smt Ag Pellicle for use in a microlithographic exposure apparatus
SG135142A1 (en) * 2006-02-22 2007-09-28 Air Prod & Chem Top coat for lithography processes
US20070196773A1 (en) * 2006-02-22 2007-08-23 Weigel Scott J Top coat for lithography processes
US7723704B2 (en) * 2006-11-10 2010-05-25 Globalfoundries Inc. EUV pellicle with increased EUV light transmittance
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
WO2008104825A1 (en) * 2007-02-28 2008-09-04 Corning Incorporated Strengthening glass using coatings
US8445774B2 (en) 2007-07-26 2013-05-21 Guardian Industries Corp. Method of making an antireflective silica coating, resulting product, and photovoltaic device comprising same
US8450594B2 (en) 2007-07-26 2013-05-28 Guardian Industries Corp. Method of making an antireflective silica coating, resulting product and photovoltaic device comprising same
US7988778B2 (en) * 2008-12-16 2011-08-02 Cheng Uei Precision Industry Co., Ltd. Method of making composite coating and product formed with the composite coating
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8617641B2 (en) 2009-11-12 2013-12-31 Guardian Industries Corp. Coated article comprising colloidal silica inclusive anti-reflective coating, and method of making the same
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9139737B1 (en) 2011-11-21 2015-09-22 Nanophase Technologies Corporation Multifunctional coated powders and high solids dispersions
TWI565732B (zh) 2012-06-13 2017-01-11 財團法人工業技術研究院 有機－無機金屬氧化物混成樹脂、其形成方法、及其形成的樹脂組成物
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
JP6729233B2 (ja) * 2016-09-20 2020-07-22 日本軽金属株式会社 ペリクル用支持枠及びペリクル並びにその製造方法
US10555892B1 (en) 2017-03-09 2020-02-11 Nanophase Technologies Corporation Functionalized siloxane or polysiloxane coated particles with enhanced light filtering properties
US10590278B2 (en) 2017-04-10 2020-03-17 Nanophase Technologies Corporation Coated powders having high photostability
RU2713004C1 (ru) * 2018-11-27 2020-02-03 Федеральное государственное бюджетное учреждение науки Институт металлоорганической химии им. Г.А. Разуваева Российской академии наук Способ получения покрытий из диоксида кремния на силикатном стекле при пониженной температуре отверждения 60-90C, обладающих повышенной твёрдостью

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2347733A (en) * 1941-06-06 1944-05-02 Bell Telephone Labor Inc Switching device
US3847583A (en) * 1969-08-13 1974-11-12 Jenaer Glaswerk Schott & Gen Process for the manufacture of multi-component substances
JPS521926B2 (ko) * 1974-03-25 1977-01-19
US4028085A (en) * 1976-02-03 1977-06-07 Owens-Illinois, Inc. Method for manufacturing silicate glasses from alkoxides
US4170690A (en) * 1977-03-18 1979-10-09 Rohm And Haas Company Process of coating weatherable, abrasion resistant coating and coated articles
US4186026A (en) * 1978-10-30 1980-01-29 American Optical Corporation Abrasion-resistant coating composition
US4282314A (en) * 1979-09-26 1981-08-04 Western Electric Co., Inc. Mask for selectively transmitting therethrough a desired light radiant energy
JPS5777044A (en) * 1980-10-30 1982-05-14 Central Glass Co Ltd Manufacture of glass from metallic alcoholate
EP0166363B1 (en) * 1984-06-26 1991-08-07 Asahi Glass Company Ltd. Low reflectance transparent material having antisoiling properties
GB2165534B (en) * 1984-10-05 1988-10-19 Suwa Seikosha Kk Method of preparing parent material for optical fibres
US4614673A (en) * 1985-06-21 1986-09-30 The Boeing Company Method for forming a ceramic coating
US4808315A (en) * 1986-04-28 1989-02-28 Asahi Kasei Kogyo Kabushiki Kaisha Porous hollow fiber membrane and a method for the removal of a virus by using the same
US4897457A (en) * 1987-08-14 1990-01-30 Asahi Glass Company Ltd. Novel fluorine-containing cyclic polymer
JP2535971B2 (ja) * 1987-11-05 1996-09-18 三井石油化学工業株式会社 ペリクル
US4929278A (en) * 1988-01-26 1990-05-29 United States Department Of Energy Sol-gel antireflective coating on plastics
US4966812A (en) * 1988-01-26 1990-10-30 The United States Of America As Represented By The Department Of Energy Sol-gel antireflective coating on plastics
US5061024C1 (en) * 1989-09-06 2002-02-26 Dupont Photomasks Inc Amorphous fluoropolymer pellicle films
US5204381A (en) * 1990-02-13 1993-04-20 The United States Of America As Represented By The United States Department Of Energy Hybrid sol-gel optical materials

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6190491B1 (en) 1995-12-21 2001-02-20 Lawrence J. Sifel et al. Organic shell blank and method for making same
US6432506B1 (en) 1995-12-21 2002-08-13 Lawrence J. Sifel Organic shell blank and method for making same
KR20010086934A (ko) * 2000-03-04 2001-09-15 양용진 박판 자개시트칩을 이용한 후판 자개시트의 제조방법과,이 제조방법에 의해 제조된 후판 자개시트 및 이 후판자개시트를 컷팅하여 얻은 장식문양을 적용한 현악기

Also Published As

Publication number Publication date
TW271002B (ko) 1996-02-21
ATE171791T1 (de) 1998-10-15
EP0482821B1 (en) 1998-09-30
ES2124697T3 (es) 1999-02-16
US5674624A (en) 1997-10-07
US5667726A (en) 1997-09-16
DE69130280D1 (de) 1998-11-05
EP0482821A1 (en) 1992-04-29
CA2053518A1 (en) 1992-04-17
DE69130280T2 (de) 1999-04-08
KR950002949B1 (ko) 1995-03-28

Similar Documents

Publication Publication Date Title
KR920008871A (ko) 고광선 투과성 방진막 그 제조방법 및 방진체
JP5766856B2 (ja) 透明物品およびその製造方法
US6623863B2 (en) Article coated with water-repellent film, liquid composition for coating with water-repellent film, and process for producing article coated with water-repellent film
EP0545201B2 (en) Durable water repellent glass surface
US3094436A (en) Transparent, conductive, reflection-reducing coatings on non-conductive objects and method
CN1152153C (zh) 用于制备光学基体上防水涂层的材料及方法
JPS61101949A (ja) 電球
GB1106066A (en) Improvements in or relating to anti-reflection coatings and optical assemblies employing same
YU218890A (sh) Zeleno staklo za apsorpciju infracrvenog i ultravioletnog zračenja i automobilska stakla izradjena od istog
ATE119857T1 (de) Sol-gel-verfahren zur herstellung von siliciumcarbid sowie eines substratschutzes.
UY23792A1 (es) Un metodo para reforzar un sustrato de oxido fragil de compuestos de base de silano y un sustrato de oxido fragil polimerizado, recubierto por siloxano eslabonado.
KR900010426A (ko) 고투광성 방진체(high light-transmissive dust-proof body) 및 그의 제조방법
KR101624830B1 (ko) 배리어 필름 및 그 제조 방법
WO2014171442A1 (ja) 太陽電池用カバーガラス及び該太陽電池用カバーガラスを備えた太陽電池モジュール並びに透明保護膜形成用塗布液及び透明保護膜の形成方法
KR910016897A (ko) 대전방지 및 방현성 화상표시 스크린
TW201313845A (zh) 被覆組成物及塗裝品
KR100347666B1 (ko) 투명한 대전방지 내마모성 피복 조성물 및 그의 제조방법
CN216761127U (zh) 一种pet复合膜
JP2671722B2 (ja) 透明撥水皮膜
CN104877620A (zh) 一种具有变色功能的改性有机硅胶
KR102357865B1 (ko) 신뢰성 개선을 위한 반사경의 표면 처리 방법
JP2668178B2 (ja) 撥水膜の形成方法
JPS5453549A (en) Multilayer thin film optical system
JP2535113B2 (ja) 紫外線吸収ガラス
CN105785590B (zh) 一种变色耐磨自清洁近视镜片的制备方法及产品

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
G160 Decision to publish patent application
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20000321

Year of fee payment: 6

LAPS Lapse due to unpaid annual fee