KR900010426A - 고투광성 방진체(high light-transmissive dust-proof body) 및 그의 제조방법 - Google Patents

고투광성 방진체(high light-transmissive dust-proof body) 및 그의 제조방법 Download PDF

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Publication number
KR900010426A
KR900010426A KR1019890018451A KR890018451A KR900010426A KR 900010426 A KR900010426 A KR 900010426A KR 1019890018451 A KR1019890018451 A KR 1019890018451A KR 890018451 A KR890018451 A KR 890018451A KR 900010426 A KR900010426 A KR 900010426A
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KR
South Korea
Prior art keywords
refractive index
film
index layer
layer
light
Prior art date
Application number
KR1019890018451A
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English (en)
Other versions
KR0151386B1 (ko
Inventor
도끼노리 아고우
히로아끼 나가가와
Original Assignee
다께바야시 쇼오고
미쓰이 세끼유 가가꾸 고오교오 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP31461188A external-priority patent/JP2733483B2/ja
Priority claimed from JP63314612A external-priority patent/JPH02158735A/ja
Application filed by 다께바야시 쇼오고, 미쓰이 세끼유 가가꾸 고오교오 가부시끼가이샤 filed Critical 다께바야시 쇼오고
Publication of KR900010426A publication Critical patent/KR900010426A/ko
Application granted granted Critical
Publication of KR0151386B1 publication Critical patent/KR0151386B1/ko

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

내용 없음

Description

고투광성 방진체(HIGH LIGHT-TRANSMISSIVE DUST-PROOF BODY) 및 그의 제조방법
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 고투광성 방진체의 일실시예의 횡단면도, 제2(a), 2(b) 및 2(c)도는 본 발명의 투광막의 제1실시예의 단면도, 제3(a) 및 3(b)도는 본 발명의 투광막의 제2실시예의 단면도.

Claims (8)

  1. 마스크기판상에 장착되는 지지프레임과, 이 지지프레임상에 투명투광막을 구비하며, 여기서 상기 투광막은 파장 240~500㎜의 투과광을 평균투과율 85% 이상으로 투과시킬 수 있는 두께 0.2㎛~10㎛의 무기막인 것이 특징인 고투광성 방진체.
  2. 제1항에서, 상기 무기막이 졸-겔법에 의해 제조되는 것이 특징인 고투과성 방진체.
  3. 제1항 또는 2항에서, 상기 무기막이 실리콘산화물을 주성분으로하여 조성된 것이 특징인 고투광성 방진체.
  4. 제1항, 제2항 또는 3항에서, 상기 무기막상에 반사방지막이 증착되는 것이 특징인 고투광성 방진체.
  5. 마스크기판상에 장착되는 지지프레임과, 이 지지프레임상에 투명투광막을 구비하며, 여기서 상기 투명투광막은(ⅰ) 저굴절률층/고굴절률층/기층(base layer)의 3층 구조, 또는 (ⅱ) 저굴절률층/고굴절률층/기층/고굴절률층/저굴절률층의 5층구조를 가지며, 여기서 상기 고굴절률층은 무기층이고, 상기 저굴절률층은 유기중합체인 것을 특징으로 하는 고투광성 방진체.
  6. 제5항에서, 상기 무기층이 PbCl2,PbF2, MgO, CsBr, TiO2, Sb2O3, Al2O3, In2O3, La2O3, CiO, ZrO2, SnO2, CeF3LaF3으로 이루어지는 그룹에서 선택된 적어도 하나의 화합물을 주성분으로 하는 것이 특징인 고투광성 방진체.
  7. 제1항에서, 상기 기층의 막두께가 0.5~10㎛인 것이 특징인 고투광성 방진체.
  8. 금속알콕시드의 가수분해에 의해 형성된 졸을 도포하여 막을 형성하는 공정, 이 막을 가열 및 소성하여 무기막을 형성함과 동시에 분해처리에 의해 유기막들을 제거하는 과정으로 구성된 제1항 기재의 고투광성 방진체의 제조방법.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019890018451A 1988-12-13 1989-12-13 고투광성 방진체 및 그의 제조방법 KR0151386B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP31461188A JP2733483B2 (ja) 1988-12-13 1988-12-13 高光線透過性防塵体の製造方法
JP88-314612 1988-12-13
JP63314612A JPH02158735A (ja) 1988-12-13 1988-12-13 高光線透過性防塵体
JP88-314611 1988-12-13

Publications (2)

Publication Number Publication Date
KR900010426A true KR900010426A (ko) 1990-07-07
KR0151386B1 KR0151386B1 (ko) 1998-12-15

Family

ID=26567999

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019890018451A KR0151386B1 (ko) 1988-12-13 1989-12-13 고투광성 방진체 및 그의 제조방법

Country Status (7)

Country Link
US (1) US5246767A (ko)
EP (1) EP0373923B1 (ko)
KR (1) KR0151386B1 (ko)
AT (1) ATE119294T1 (ko)
CA (1) CA2005096C (ko)
DE (1) DE68921444T2 (ko)
MY (1) MY106942A (ko)

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JP2790946B2 (ja) * 1992-08-21 1998-08-27 信越化学工業株式会社 ペリクル膜の製造方法
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US5882773A (en) * 1993-10-13 1999-03-16 The Regents Of The University Of California Optical coatings of variable refractive index and high laser-resistance from physical-vapor-deposited perfluorinated amorphous polymer
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Also Published As

Publication number Publication date
US5246767A (en) 1993-09-21
EP0373923A2 (en) 1990-06-20
ATE119294T1 (de) 1995-03-15
KR0151386B1 (ko) 1998-12-15
CA2005096C (en) 1999-03-23
EP0373923B1 (en) 1995-03-01
DE68921444T2 (de) 1995-06-29
CA2005096A1 (en) 1990-06-13
DE68921444D1 (de) 1995-04-06
MY106942A (en) 1995-08-30
EP0373923A3 (en) 1991-04-24

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