ATE119294T1 - Staubschutzkörper mit hoher lichttransmission und verfahren zu seiner herstellung. - Google Patents

Staubschutzkörper mit hoher lichttransmission und verfahren zu seiner herstellung.

Info

Publication number
ATE119294T1
ATE119294T1 AT89313051T AT89313051T ATE119294T1 AT E119294 T1 ATE119294 T1 AT E119294T1 AT 89313051 T AT89313051 T AT 89313051T AT 89313051 T AT89313051 T AT 89313051T AT E119294 T1 ATE119294 T1 AT E119294T1
Authority
AT
Austria
Prior art keywords
refractive index
layer
index layer
light
low refractive
Prior art date
Application number
AT89313051T
Other languages
English (en)
Inventor
Tokinori Mitsui Petrochem Agou
Hiroaki Mitsui Petroc Nakagawa
Original Assignee
Mitsui Petrochemical Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63314612A external-priority patent/JPH02158735A/ja
Priority claimed from JP31461188A external-priority patent/JP2733483B2/ja
Application filed by Mitsui Petrochemical Ind filed Critical Mitsui Petrochemical Ind
Application granted granted Critical
Publication of ATE119294T1 publication Critical patent/ATE119294T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Laminated Bodies (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Surface Treatment Of Glass (AREA)
AT89313051T 1988-12-13 1989-12-13 Staubschutzkörper mit hoher lichttransmission und verfahren zu seiner herstellung. ATE119294T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP63314612A JPH02158735A (ja) 1988-12-13 1988-12-13 高光線透過性防塵体
JP31461188A JP2733483B2 (ja) 1988-12-13 1988-12-13 高光線透過性防塵体の製造方法

Publications (1)

Publication Number Publication Date
ATE119294T1 true ATE119294T1 (de) 1995-03-15

Family

ID=26567999

Family Applications (1)

Application Number Title Priority Date Filing Date
AT89313051T ATE119294T1 (de) 1988-12-13 1989-12-13 Staubschutzkörper mit hoher lichttransmission und verfahren zu seiner herstellung.

Country Status (7)

Country Link
US (1) US5246767A (de)
EP (1) EP0373923B1 (de)
KR (1) KR0151386B1 (de)
AT (1) ATE119294T1 (de)
CA (1) CA2005096C (de)
DE (1) DE68921444T2 (de)
MY (1) MY106942A (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2714450B2 (ja) * 1989-08-10 1998-02-16 ダイセル化学工業株式会社 防塵膜
FR2680245B1 (fr) * 1991-08-06 1994-03-25 Fabrication Instruments Mesure Detecteur photoelectrique a transfert de charges a qualite d'image amelioree.
JP2790946B2 (ja) * 1992-08-21 1998-08-27 信越化学工業株式会社 ペリクル膜の製造方法
KR970003593B1 (en) * 1992-09-03 1997-03-20 Samsung Electronics Co Ltd Projection exposure method and device using mask
US5882773A (en) * 1993-10-13 1999-03-16 The Regents Of The University Of California Optical coatings of variable refractive index and high laser-resistance from physical-vapor-deposited perfluorinated amorphous polymer
US5728508A (en) * 1994-03-14 1998-03-17 Shin-Etsu Chemical Co., Ltd. Method of forming resist pattern utilizing fluorinated resin antireflective film layer
KR20010086056A (ko) * 1999-09-30 2001-09-07 시마무라 기로 다층 박막을 갖는 광학소자 및 그것을 구비한 노광장치
KR100709045B1 (ko) 1999-11-05 2007-04-18 아사히 가라스 가부시키가이샤 자외 및 진공자외 영역의 반사방지 기초체
EP1248148A1 (de) * 2001-04-05 2002-10-09 Asm Lithography B.V. Lithographische Maske mit Schutzschicht
DE102004050371A1 (de) 2004-09-30 2006-04-13 Osram Opto Semiconductors Gmbh Optoelektronisches Bauelement mit einer drahtlosen Kontaktierung
JP4885241B2 (ja) * 2006-02-17 2012-02-29 フリースケール セミコンダクター インコーポレイテッド ペリクルを用いて層をパターニングする方法
JP2010152268A (ja) * 2008-12-26 2010-07-08 Seiko Epson Corp 液晶表示装置及びプロジェクター
CN115956224A (zh) * 2020-08-20 2023-04-11 旭化成株式会社 对准单元用的防尘构造体
CN115498127B (zh) * 2022-09-20 2026-01-09 合肥京东方卓印科技有限公司 防反射复合膜、显示面板和显示装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53135348A (en) * 1977-04-30 1978-11-25 Toshiba Corp Etching method for multilayer film
US4269916A (en) * 1978-07-03 1981-05-26 Polaroid Corporation Photographic prints utilizing lamellar pigment materials
US4333983A (en) * 1980-04-25 1982-06-08 Optical Coating Laboratory, Inc. Optical article and method
US4377613A (en) * 1981-09-14 1983-03-22 Gordon Roy G Non-iridescent glass structures
JPS60237450A (ja) * 1984-05-11 1985-11-26 Asahi Chem Ind Co Ltd 非反射性フオトマスク・レチクル用防塵カバ−体及びその製造方法
DE3425144A1 (de) * 1984-07-07 1986-01-16 Hochtemperatur-Reaktorbau GmbH, 4600 Dortmund In der kaverne eines druckbehaelters angeordnete kernreaktoranlage
JPS6153601A (ja) * 1984-08-24 1986-03-17 Asahi Chem Ind Co Ltd 高性能なフオトマスク・レチクル用防塵カバ−体
JPS61209449A (ja) * 1985-03-14 1986-09-17 Asahi Chem Ind Co Ltd 非反射性ペリクル体
US4704299A (en) * 1985-11-06 1987-11-03 Battelle Memorial Institute Process for low temperature curing of sol-gel thin films
US4759990A (en) * 1985-11-27 1988-07-26 Yen Yung Tsai Composite optical element including anti-reflective coating
JPS62288842A (ja) * 1986-06-09 1987-12-15 Tosoh Corp フオトマスク，レチクルの保護防塵体
JPS636553A (ja) * 1986-06-27 1988-01-12 Canon Inc レチクルの塵埃付着防止方法
JPS6358739A (ja) * 1986-08-29 1988-03-14 Hitachi Ltd 表示装置用面板
US4854670A (en) * 1986-12-17 1989-08-08 Gte Products Corporation Wide angle optical filters
JPS63262651A (ja) * 1987-04-21 1988-10-28 Seiko Epson Corp フオトマスク保護膜
US4769058A (en) * 1987-09-14 1988-09-06 Glasstech, Inc. Method of making a smooth silica glass body
JP2625453B2 (ja) * 1987-12-09 1997-07-02 セントラル硝子 株式会社 パターン膜形成法
US4929278A (en) * 1988-01-26 1990-05-29 United States Department Of Energy Sol-gel antireflective coating on plastics
US4977013A (en) * 1988-06-03 1990-12-11 Andus Corporation Tranparent conductive coatings
US4965121A (en) * 1988-09-01 1990-10-23 The Boc Group, Inc. Solar control layered coating for glass windows

Also Published As

Publication number Publication date
DE68921444D1 (de) 1995-04-06
EP0373923A3 (de) 1991-04-24
DE68921444T2 (de) 1995-06-29
KR0151386B1 (ko) 1998-12-15
CA2005096A1 (en) 1990-06-13
US5246767A (en) 1993-09-21
CA2005096C (en) 1999-03-23
EP0373923A2 (de) 1990-06-20
MY106942A (en) 1995-08-30
EP0373923B1 (de) 1995-03-01
KR900010426A (ko) 1990-07-07

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties