DE3856253D1 - Staubschutzschicht - Google Patents

Staubschutzschicht

Info

Publication number
DE3856253D1
DE3856253D1 DE3856253T DE3856253T DE3856253D1 DE 3856253 D1 DE3856253 D1 DE 3856253D1 DE 3856253 T DE3856253 T DE 3856253T DE 3856253 T DE3856253 T DE 3856253T DE 3856253 D1 DE3856253 D1 DE 3856253D1
Authority
DE
Germany
Prior art keywords
dust
line
proof film
protection layer
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE3856253T
Other languages
English (en)
Other versions
DE3856253T2 (de
Inventor
Muneyuki Matsumoto
Hiroaki Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP26988887A external-priority patent/JPH0798869B2/ja
Priority claimed from JP62290882A external-priority patent/JPH01133052A/ja
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Application granted granted Critical
Publication of DE3856253D1 publication Critical patent/DE3856253D1/de
Publication of DE3856253T2 publication Critical patent/DE3856253T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/308Chemical or electrical treatment, e.g. electrolytic etching using masks
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Inorganic Insulating Materials (AREA)
  • Fluid-Damping Devices (AREA)
DE3856253T 1987-10-26 1988-10-24 Staubschutzschicht Expired - Fee Related DE3856253T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP26988887A JPH0798869B2 (ja) 1987-10-26 1987-10-26 フォトマスク保護用防塵膜
JP62290882A JPH01133052A (ja) 1987-11-18 1987-11-18 防塵膜

Publications (2)

Publication Number Publication Date
DE3856253D1 true DE3856253D1 (de) 1998-10-29
DE3856253T2 DE3856253T2 (de) 1999-04-08

Family

ID=26548963

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3856253T Expired - Fee Related DE3856253T2 (de) 1987-10-26 1988-10-24 Staubschutzschicht

Country Status (10)

Country Link
US (1) US5028702A (de)
EP (1) EP0314418B1 (de)
KR (1) KR910009610B1 (de)
AT (1) ATE171550T1 (de)
CA (1) CA1330860C (de)
DE (1) DE3856253T2 (de)
ES (1) ES2124686T3 (de)
HK (1) HK1003950A1 (de)
MY (1) MY103629A (de)
SG (1) SG47433A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5339197A (en) * 1989-03-31 1994-08-16 Yen Yung Tsai Optical pellicle with controlled transmission peaking
DE69327286T2 (de) * 1992-09-24 2000-05-11 Daicel Chem Verfahren zur Herstellung eines Fettsäureesters von Cellulose
US5741576A (en) * 1995-09-06 1998-04-21 Inko Industrial Corporation Optical pellicle with controlled transmission peaks and anti-reflective coatings

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1119873A (en) * 1976-10-22 1982-03-16 Scott Paper Company Diazo composition containing an azo coupling component precursor, a light sensitive acid progenitor and a carboxylic anhydride
US4756007A (en) * 1984-03-08 1988-07-05 Codex Corporation Adaptive communication rate modem
GB2165545B (en) * 1984-10-16 1988-03-30 Du Pont Pellicle structure for transmission of mid ultraviolet light
JPS61130346A (ja) * 1984-11-28 1986-06-18 Daicel Chem Ind Ltd 樹脂薄膜
JPS6235359A (ja) * 1985-08-09 1987-02-16 Daicel Chem Ind Ltd コ−テツド薄膜の製造法
DE3750353T2 (de) * 1986-06-12 1994-12-08 Mitsui Petrochemical Ind Verfahren zur Herstellung von Celluloseesterfolien.

Also Published As

Publication number Publication date
DE3856253T2 (de) 1999-04-08
ATE171550T1 (de) 1998-10-15
KR890007395A (ko) 1989-06-19
US5028702A (en) 1991-07-02
CA1330860C (en) 1994-07-26
HK1003950A1 (en) 1998-11-13
MY103629A (en) 1993-08-28
ES2124686T3 (es) 1999-02-16
KR910009610B1 (ko) 1991-11-23
EP0314418B1 (de) 1998-09-23
EP0314418A3 (de) 1991-01-30
SG47433A1 (en) 1998-04-17
EP0314418A2 (de) 1989-05-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee